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    A HIGH REPETITION-RATE HIGH VOLTAGE PULSEGENERATOR
    高重复频率高压脉冲发生器
    EXPERIMENTAL STUDY OF THE EFFECT OF ELECTRON CYCLOTRON FREQUENCY ON PARAMETERS OF CRM-MONOTRON
    关于电子回旋频率对单腔回旋管参数影响的实验研究
    Graphical Method for Computing Resonant Frequency of Cylindrical Dielectric Resonators
    圆柱形介质谐振器谐振频率的图解法
    FREQUENCY CHARACTERISTICS OF RESONANCE JOSEPHSON TUNNEL JUNCTIONS (Ⅰ)
    谐振型Josephson隧道结的频率特性(I)
    FREQUENCY RESPONSE OF n~+-p(Hg,Cd)Te PHOTODIODE
    n~+-P型(Hg,Cd)Te光电二极管的频率响应
    Pre-eontrol protection of high repetition rate YAG laser power supply
    高重复频率YAG激光器电源的预控保护
    A transverse Zeeman laser with 5×10-11 frequency stability has been developed
    频率稳定性达5×10~(-11)的横向塞曼稳频激光器研制成功
    A Frequency Standard of S and X Band
    S和X波段频率标准
    Fast Acquisition Phas-Locked Loops for Frequency Agile Pulsed Radar Systems
    频率捷变脉冲雷达用快速捕获锁相环路
    Frequency-temperature compensation of a Gunn VCO in 13GHz band
    13GHz频段体效应VCO的频率—温度补偿
    FREQUENCY CHARACTERISTICS OF SUSPENDED MICROSTRIP LINE
    悬置微带线的频率特性
    Development of mixed microcircut of CMOS frequence synthesis dividing unit
    CMOS频率合成分频单元的混合微电路研制
    MODEL PG-Ⅱ SYNTHESIZED FREQUENCY PULSE GENERATOR
    PG—Ⅱ型频率合成脉冲发生器
    The New Measurement Method of Open Loop Frequency Response for PLL Under Lock State
    锁相环在锁定状态下测试开环频率特性的新方法
    A SECOND-ORDER BANDPASS ACTIVE FILTER WITH HIGH Q AND ITS FREQUENCY COMPENSATION
    高Q二次带通有源滤波器及其频率补偿
    Improving Short-Term Stability of Frequency Synthesizer by Noise Negative Feedback
    利用噪声反馈改善频率综合器短稳
    A SECOND-ORDER BANDPASS ACTIVE FILTER WITH HIGH Q AND ITS FREQUENCY COMPENSATION
    高Q二次带通有源滤波器及其頻率补偿
    PHASE LOCKED LOOP FOR FREQUENCY MODULATOR
    鎖相环频率調制器
    Study of Upper Frequency Limit and Noise Output Power Characteristics for Microwave Solid State Noise Diodes
    微波固体噪声二极管频率上限和噪声输出功率性能的研究
    Frequency Dependence of Capacitance Derivative in MOS Capacitor——A New Method for Determineg the Densities and Capture Cross Section of the Surface State at the Si-SiO_2 Interface
    MOS电容微分量的频率特性——确定Si/SiO_2界面态密度分布及俘获截面的一种新方法
 

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