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聚焦电压
相关语句
  focusing voltage
    An stable ion beam with 178 μA is obtained under the condition of the plate voltage of 580 V, the gas pressure of 8×10~(-4) Pa, the extraction voltage of 1.65 kV and the focusing voltage of 21 kV.
    在580V板压、8×10-4Pa气压1、. 65kV引出电压和21kV聚焦电压的状态下,得到了束流为178μA的稳定离子束.
短句来源
    By comprehensive debugging, an stable ion beam with 178μA is obtained under the condition of the plate voltage of 580 V, the gas pressure of 8×10 -4 Pa, the extraction voltage of 1.65kV and the focusing voltage of 21kV.
    经综合调试,在580V板压、8×10-4Pa气压、1.65kV引出电压和21kV聚焦电压的状态下,得到了束流为178μA的稳定离子束.
短句来源
    A stable ion beam,which intensity is 169μA and the proton ratio is 88%,is obtained under the condition of the plate voltage of 575 V,the gas pressure of 7.7×10~(-4)Pa,the extraction voltage of 1.6kV and the focusing voltage of 21kV.
    在575V板压、7.7×10-4Pa气压、1.6kV引出电压和21kV聚焦电压的状态下,得到了束流为169μA、质子比为88%的稳定离子束.
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  “聚焦电压”译为未确定词的双语例句
    A stable ion beam of 169μA intensity and 88% proton ratio is obtained under the condition of 575 V plate voltage,7.7×10~(-4) Pa gas pressure,1.6kV extraction voltage and 21kV focusing(voltage.)
    结果表明,在575 V板压、7.7×10-4Pa气压、1.6 kV引出电压和21 kV聚焦电压的状态下,可得到束流为169μA、质子比为88%的稳定离子束.
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A RF ion source has been successfully developed for the electrostatic accelerator.Various factors affecting the ion beam,in cluding extraction voltage,focusing voltage and gas pressure,were discussed to optimize the operating performance of the ion source.

研制了一台高频离子源 ,通过实验调试取得了引出电压、聚焦电压及放电气压对引出束流影响的变化曲线 ,从而获得高频离子源的最佳工作条件 ,并测定了引出束流的束径包络

RF driven ion source has been developed for the ion beam bioengineering. As used in an electrostatic accelerat or, the ion source was specially designed considering the structure, weight and the power supplies. The size of the extracting electrode was calculated in d etail. The extracting beam characteristics of the ion source depending on extracting voltage, focusing voltage and gas pressure were obtained by experiments. The variation of the beam radius along th e axis was measured. Factors producing the...

RF driven ion source has been developed for the ion beam bioengineering. As used in an electrostatic accelerat or, the ion source was specially designed considering the structure, weight and the power supplies. The size of the extracting electrode was calculated in d etail. The extracting beam characteristics of the ion source depending on extracting voltage, focusing voltage and gas pressure were obtained by experiments. The variation of the beam radius along th e axis was measured. Factors producing the beam instability were generally discussed, and effective t echniques were used to reduce the beam instability. Experimental results show that the extracting ch aracteristics agree well with the theoretical expectation. The maximum beam curr ent was obtained when the extracting voltage was 1 600—1 800V and the gas pressure was (4—8)×10 -4 Pa. The div erging angle of the beam was 4— 7° at different measuring points, which well satisfies the requirement of ion beam bioengineering.

根据离子束生物工程的需要 ,设计和研制了一台用于静电加速器的小型高频离子源。针对使用环境从理论上确定了离子源的结构和尺寸。通过实验调试取得了引出束流与引出电压、聚焦电压以及放电气压之间的变化特性曲线 ,测定了引出束流的束径包络 ,对束流的不稳定性进行了分析 ,在设计中采取了有效的措施抑制束流不稳定性。结果表明 ,离子源的最佳工作条件为引出电压 1 60 0~ 1 80 0 V,放电气压在 ( 4~ 8)× 1 0 -4 Pa范围 ,此时离子源可引出最大束流 3 0 μA。束流大小及其稳定性均达到预期要求。

A RF ion source for an electrostatic accelerator is designed and debugged. The influence of various factors on the RF ion source discharging is studied. Relationships between ion beam intensity and some parameters including plate voltage of the oscillator, gas pressure and extraction voltage are determined and analysed. An stable ion beam with 178 μA is obtained under the condition of the plate voltage of 580 V, the gas pressure of 8×10~(-4) Pa, the extraction voltage of 1.65 kV and the focusing voltage of 21...

A RF ion source for an electrostatic accelerator is designed and debugged. The influence of various factors on the RF ion source discharging is studied. Relationships between ion beam intensity and some parameters including plate voltage of the oscillator, gas pressure and extraction voltage are determined and analysed. An stable ion beam with 178 μA is obtained under the condition of the plate voltage of 580 V, the gas pressure of 8×10~(-4) Pa, the extraction voltage of 1.65 kV and the focusing voltage of 21 kV.

设计和调试了一台4MV静电加速器用高频离子源;研究了诸因素对离子源起弧的影响;测试并分析了束流与振荡器板压、离子源气压和引出电压的关系;在580V板压、8×10-4Pa气压1、.65kV引出电压和21kV聚焦电压的状态下,得到了束流为178μA的稳定离子束.

 
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