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聚焦离子源
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  focused ion source
     Successful development of liquid metal ion source offers a small dimension, highbrightness and high stability focused ion source part for Focused Ion Beam apparatus, which makethe development of focused ion beam technology quicker.
     液态金属离子源(Liquid Metal Ion Source-LMIS)的研制成功为FIB技术提供了一个小尺寸、高亮度、高稳定度的聚焦离子源部分,使得FIB技术的发展更加迅速。
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  相似匹配句对
     Focus
     聚焦
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     Study of focused ion beam column with microwave ion source
     微波离子源聚焦离子束光学系统的研究
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     Focus on Colored Chinese Painting
     聚焦彩墨画
短句来源
     Progress in the Research of Liquid Metal Ion Source and Focused Ion Beam
     液态金属离子源聚焦离子束的研制进展
短句来源
     dry temperature: 350 C;
     离子源温度:350℃;
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This paper describes a new multi ion and electron beam system for preparing optic thin films. It can be used for preparing thin films by sputter coating, and also for general vapor deposition with ion beam assisted. The ions can be inert or reactive gaseous element. The feature of this system is that any element which is compatible with vacuum environment can be used as target material for preparing thin film by sputter coating or electron beam vapor deposition. In this system, A 10cm diameter ion source is...

This paper describes a new multi ion and electron beam system for preparing optic thin films. It can be used for preparing thin films by sputter coating, and also for general vapor deposition with ion beam assisted. The ions can be inert or reactive gaseous element. The feature of this system is that any element which is compatible with vacuum environment can be used as target material for preparing thin film by sputter coating or electron beam vapor deposition. In this system, A 10cm diameter ion source is used for assisted deposition. Two special designed focusing ion sources are used for sputter coating, and a new type low energy broad beam electron source which has no contamination to film during deposition is used for ion beam neutralization when insulator sample or target is used. The feature of this system, and the performace and characteristics of these ion and electron sources are presented in the paper. By using this system, good results for preparing special optic thin films such as TiO x, ZrO x and multilayer ZrO 2/SiO 2 etc. have been obtained.

本文介绍一种新型的光学薄膜制备用多离子束电子束系统。该系统既可采用聚焦离子束溅射沉积,也可采用传统的电子束蒸发沉积薄膜,并辅助以低能离子轰击,离子可以是惰性元素也可以是反应气体离子。系统的特征是:任何与真空相容的材料均可用作靶材,制备薄膜。系统采用一台10cm直径宽束离子源作为辅助沉积;二台特殊设计的聚焦离子源用于溅射沉积。为了能对绝缘样品或在沉积绝缘薄膜时对离子束进行有效而无污染的中和,系统还配置了一台新型的宽束电子源。文中对装置的特点,各个离子源、电子源的性能及特性进行了较详细的描述。利用该系统已制备了如TiOx、ZrOx和多层ZrO2/SiO2等特殊的光学薄膜,并取得了良好的结果

 
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