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聚焦极
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  focus electrode
     This paper discussed the technique of self adjustment for focusing field emission arrays (FFEA). This method made etch gate and focus electrode in FEA very precise for fabrication of Spindt type FFEA.
     本文讨论了制造Spindt型聚焦场发射阵列FFEA过程中需要的对准技术 ,提出了具有自对准能力的刻蚀方法 ,满足了聚焦型发射阵列的聚焦极与门极的精确对准 .
短句来源
     Influence of focus electrode bias,focus hole size and grid electrode bias on the emission electron beams was discussed.
     分别讨论了聚焦极电位、聚焦极孔径以及栅极电位对发射电子束的影响。
短句来源
     The electrons focusing effect should be firstly taken into consideration in establishing focus electrode parameters,and the influence of the tip electric field should be also considered.
     因此在实际确立聚焦极参量时,应主要从聚焦极对电子束轨迹的会聚作用方面考虑,其次再考虑聚焦极对锥尖场强的影响。
短句来源
  focusing electrode
     Therefore, with EGUN code, simulating calculation of electron trajectories in the electronic gun is done. The influence of the relative size and position between the focusing electrode and the cathode on beam intensity and emittance is studied. The influence of distance between the cathode and the anode is studied too.
     为此,利用EGUN程序对电子枪的电子轨迹模拟计算,研究了聚焦极与阴极间相对尺寸与位置变化,以及阴极与阳极间距对束流与发射度的影响。
短句来源
     Based on the preliminary design parameters given by the synthesis method, a simulating calculation program, EGUN, was used in the numerical figure design of the focusing electrode and the anode.
     依据综合法给出电子枪的主要参数初值,由EGUN程序进行电子枪模拟计算,完成了聚焦极和阳极形状的设计。
短句来源
     The object of the CRT video processing circuit is to amplify output video signal of video card to sufficient amplitude and power,meet to polarity condition on some degree,provid control voltage for the filament of picture tube grid,accelerating anode,focusing electrode and high voltage anode to drive the picture tube to display the picture on the screen.
     视频处理电路主要作用是把显示卡输出视频信号放大到足够的幅度和功率,使之满足一定的极性条件,提供显像管灯丝、栅极、加速极、聚焦极、高压阳极工作电压、驱动显像管、图像重现在显示屏。
短句来源
  “聚焦极”译为未确定词的双语例句
     Auto-e-focus system means that voltage of focus polar can be auto adjusted. And auto-optics-focus system means that the optic system composed of screen of projection tube microscope and area CCD can be auto focus.
     自动电聚焦指对投影管聚焦极电压的自动调整,而自动光学聚焦系统是指对投影管发光屏—显微镜—CCD组成的光学系统的自动聚焦。
短句来源
     A distribution graph of electronic pot ential and track near microtip in FFEA was obtained by finite difference simulat ing three dimensions texture of double gate FFEA.
     采用有限差分法 ,对有聚焦极的垂直双门结构的 FEA进行了轴对称三维模拟计算 ,得到发射微尖附近的电位和电子束运动分布图。
短句来源
     The spatial electric potential distribution and the electron trajectory near the microtips in the double gate focus field emission array (FFEA)were simulated with finite difference technique.
     采用有限差分法 ,对有聚焦极的垂直双门结构的场发射阵列进行了轴对称三维模拟计算 ,得到发射微尖附近的电位和电子轨迹分布图。
短句来源
     Reduction of the focus hole diameter strongly affects the electrons with large emission angle but its influence on electron focusing is less markedly than the influence of the variations in potential.
     减小聚焦极孔径对大发散角的电子有影响 ,但对聚焦作用的影响不如改变电位明显。
短句来源
     A self? aligned lithography has been proposed for the fabrication of the focus grid in focusing field emission arrays.
     为用自对准技术制作聚焦型发射阵列 (FFEA)的聚焦极 ,要求FFEA的电阻层能透过光刻用近紫外光。
短句来源
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  focus electrode
The focus electrode compresses the beam so it can pass into the circuit.
      
  forming electrode
Validity of fixing a zero forming electrode at a non-Pierce angle for optimization of a highly compressed electron beam
      
  focusing electrode
The detector is slightly modified to operate the outermost focusing electrode of the detector at a lower potential for predetection acceleration.
      


The structure and characteristics of the electronic gun used in the 9MeV travelling wave electron linear accelerator for Custom container inspecting system are introduced. Properties of initial electron beam provided by the electronic gun influence on parameters of magnetic field of focus coils for the accelerate tube. The electronic gun must give 300mA beam current for producing high x ray dose and ensuring resolution of the inspecting pictures. Therefore, with EGUN code, simulating calculation of electron...

The structure and characteristics of the electronic gun used in the 9MeV travelling wave electron linear accelerator for Custom container inspecting system are introduced. Properties of initial electron beam provided by the electronic gun influence on parameters of magnetic field of focus coils for the accelerate tube. The electronic gun must give 300mA beam current for producing high x ray dose and ensuring resolution of the inspecting pictures. Therefore, with EGUN code, simulating calculation of electron trajectories in the electronic gun is done. The influence of the relative size and position between the focusing electrode and the cathode on beam intensity and emittance is studied. The influence of distance between the cathode and the anode is studied too. The reason for changing some parts and shortenning the gap between the focusing electrode and the cathode is given. And the reference size of assembly position is offered.

介绍了海关集装箱检测系统用9MeV行波电子直线加速器上电子枪的结构与特点。电子枪提供的初始电子束流性能直接影响到加速管上聚焦磁场的参数要求,为保证加速器出口处电子束打靶产生的x射线剂量满足阵列探测器检测图象清晰度的要求,电子枪必须提供300mA束流。为此,利用EGUN程序对电子枪的电子轨迹模拟计算,研究了聚焦极与阴极间相对尺寸与位置变化,以及阴极与阳极间距对束流与发射度的影响。提供了更换部件,缩小聚集极与阴极间隙及装配尺寸的参考尺寸与理论依据。

A two lens FIB system used for sub microfabrication is introduced.By theoritical calculation and computer simulation,the fluctuations of ion beam diameter caused by ion source voltage, extractor voltage and focusing voltage, which determine the optics system characteristics,are analyzed from aberration and misfocussing aspects.The results indicate that the fluctuation coefficient of these voltages should not be more than 10 -5 ,if the beam diameter is smaller than 0.2μm.Finally,the method of making...

A two lens FIB system used for sub microfabrication is introduced.By theoritical calculation and computer simulation,the fluctuations of ion beam diameter caused by ion source voltage, extractor voltage and focusing voltage, which determine the optics system characteristics,are analyzed from aberration and misfocussing aspects.The results indicate that the fluctuation coefficient of these voltages should not be more than 10 -5 ,if the beam diameter is smaller than 0.2μm.Finally,the method of making high stability high voltage source is described briefly.

介绍了应用于亚微米微细加工的2级透镜聚焦离子束系统,从象差和散焦的角度利用理论分析和模拟计算,研究了决定光学系统性能的离子源、离子引出极、预聚焦极聚焦极等高压电源的稳定度对离子束径的影响,得到了束径小于0.2μm时电源必须达到的稳定度(纹波系数小于10-5),最后提及了所研制的高稳定度高压电源。

In order to produce an ion beam diameter smaller than 0.2μm in our two lens FIB system and to perform microfabrication stably, we analyzed the factors which influence the size and stability of ion beam. More particularly, from aspects of aberration, misfocussing and drifting, with theory calculation and computer simulation, we researched the fluctuations of ion beam diameter caused by high voltage powers including ion energy voltage, extractor voltage and focusing voltage, which control the optical column...

In order to produce an ion beam diameter smaller than 0.2μm in our two lens FIB system and to perform microfabrication stably, we analyzed the factors which influence the size and stability of ion beam. More particularly, from aspects of aberration, misfocussing and drifting, with theory calculation and computer simulation, we researched the fluctuations of ion beam diameter caused by high voltage powers including ion energy voltage, extractor voltage and focusing voltage, which control the optical column characteristics, and low voltage powers including alignment voltage, astigmator voltage and deflector voltage. The results indicate that when the beam diameter is smaller than 0.2μm, the fluctuation coefficient of the high voltages is 1×10 -4 ~1×10 -5 and that of the low voltages is 6×10 -4 ~1×10 -4 .

为了在所研制的二级透镜聚焦离子束系统中获得直径小于0.2μm的稳定束斑,并进行亚微米微细加工,分析了影响束斑大小及稳定性的因素,并着重从像差、散焦和漂移的角度,利用理论分析和模拟计算,研究了决定系统光学性能的离子源、离子引出极、预聚焦极聚焦极所用高压电源及电对中、消像散透镜、偏转器所用低压电源的稳定度对离子束径的影响,得到了束直径小于0.2μm时电源必须达到的稳定度,即高压电源的纹波系数1×10-4~1×10-5,低压电源的纹波系数6×10-4~1×10-4。

 
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