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清洗阈值
相关语句
  cleaning threshold
     The result obtained was that the cleaning threshold of Si substrate is 0.2J/cm ̄2,while the damage threshold of it is 1.2J/cm ̄2.
     从实验中得到硅片的激光清洗阈值为0.2J/cm ̄2,损伤阈值为1.2J/cm ̄2。
短句来源
     The experimental research which uses the excimer laser (308 nm, 28 ns)to clean the substrate is studied and the reason why there are laser cleaning threshold and damage threshold is discussed.
     讨论了采用波长为308nm,脉冲宽度为28ns的准分子激光清洗基片的实验研究,分析了激光清洗过程中清洗阈值和损伤阈值存在的原因,并对它们进行了定量性推导。
短句来源
     Study of laser cleaning threshold and damage threshold
     激光清洗阈值和损伤阈值的研究
短句来源
     There exist cleaning threshold and damage threshold in laser cleaning.
     激光清洗存在着清洗阈值和损伤阈值。
短句来源
     When the laser fluences are between complete cleaning threshold and damage threshold, cleaning percentage keeps up 100% and no damage is found on substrate surface.
     在完全清洗阈值与损伤阈值之间 ,基体表面清洁率保持 10 0 %而且不受任何损伤。
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  “清洗阈值”译为未确定词的双语例句
     Paint removal experiment is executed by using high power pulse TEA CO2 laser.
     选用高功率脉冲TEA CO2激光器,对不同颜色不同种类的油漆进行了清洗实验,运用数码照片分析程序计算出清洁率,找出了完全清洗阈值和损伤阈值。
短句来源
     The adhesion force between the particle and the substrate and cleaning force acting on the particles were calculated,and the theoretical threshold of laser cleaning 1 μm Al_2O_3 is 60mJ·cm~(-2).
     通过理论计算,量化了颗粒所受到的清洗力以及其与硅片表面之间的粘附力,理论预测出1μm Al2O3颗粒的激光清洗阈值为60 mJ/cm2。
短句来源
     Then, the removing force acting on the particles is presented in laser dry cleaning and the advantages and disadvantages of it are discussed.
     在此基础上首先建产了干式清洗时去除力大小的计算模型,结合对吸附力的研究,得到了激光干式清洗超光滑光学基片表面吸附杂质微粒的清洗阈值,并且讨论了干式清洗的局限性。
短句来源
  相似匹配句对
     Study of laser cleaning threshold and damage threshold
     激光清洗阈值和损伤阈值的研究
短句来源
     Cleaning of hydraulic system
     液压系统的清洗
短句来源
     There exist cleaning threshold and damage threshold in laser cleaning.
     激光清洗存在着清洗阈值和损伤阈值
短句来源
     Cleaning for Outer Wall of Building
     建筑物外墙清洗
短句来源
     Nerve Threshold Value Detector
     神经阈值探测仪
短句来源
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  cleaning threshold
We report measurements of the cleaning threshold for different particle sizes.
      
Investigations of laser induced liquid evaporation showed that the cleaning threshold coincides with the fluence necessary for the onset of explosive vaporization.
      
Furthermore the cleaning threshold is independent of the particle size.
      
Above the cleaning threshold, we again obtain a similar behavior for all three sets of laser parameters.
      
For all particles investigated the cleaning threshold was identical with the damage threshold.
      
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This paper reported the experiment that used excimer laser(308nm,28ns)to clean the surface of Si substrate. The influnce of laser energy density on laser cleaning was studied. During the test,the energy density irrated on the substrate surface was altered by changing the size of the light beam or adjusting the output energy of the laser.The result obtained was that the cleaning threshold of Si substrate is 0.2J/cm ̄2,while the damage threshold of it is 1.2J/cm ̄2.

本文报道了采用输出激光波长为308nm,脉冲宽度为28ns的准分子激光直接清洗硅片上油脂的实验研究,通过改变光束大小或调节激光输出能量来改变基片表面上的激光能量密度,研究激光能量密度对激光清洗效果的影响。从实验中得到硅片的激光清洗阈值为0.2J/cm ̄2,损伤阈值为1.2J/cm ̄2。

The temperature distribution on a substrate surface during laser cleaning is investigated with the finite element method and the reason why there exist a cleaning threshold and a damage threshold is studied. The theoretical results of the cleaning threshold and the damage threshold of Si substrate surface with grease are obtained when the substrate is cleaned with the excimer laser of a wavelength of 308 nm and a pulse width of 28 ns. The cleaning threshold is found to be between 0.672 ×10 7 W/cm 2 and...

The temperature distribution on a substrate surface during laser cleaning is investigated with the finite element method and the reason why there exist a cleaning threshold and a damage threshold is studied. The theoretical results of the cleaning threshold and the damage threshold of Si substrate surface with grease are obtained when the substrate is cleaned with the excimer laser of a wavelength of 308 nm and a pulse width of 28 ns. The cleaning threshold is found to be between 0.672 ×10 7 W/cm 2 and 0.93×10 7 W/cm 2 while the damage threshold, 3.875×10 7 W/cm 2. They are in concordance with the experimental results.

采用有限元方法分析了激光清洗过程中基片表面的温度分布,研究了激光清洗过程中清洗阈值和损伤阈值存在的原因,推导出使用波长为308nm,脉宽为28ns的准分子激光清洗硅片表面油脂的清洗阈值和损伤阈值,并进行了实验验证,其理论清洗阈值与实验结果是符合的

The experimental research which uses the excimer laser (308 nm, 28 ns)to clean the substrate is studied and the reason why there are laser cleaning threshold and damage threshold is discussed.

讨论了采用波长为308nm,脉冲宽度为28ns的准分子激光清洗基片的实验研究,分析了激光清洗过程中清洗阈值和损伤阈值存在的原因,并对它们进行了定量性推导。

 
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