正入射 normal incidence(39)   normal incidence      Study on 18～20 nm Broadband Multilayer at Normal Incidence      18～20nm正入射宽带多层膜的研究 短句来源      We report a new material combination,C/Si,for normal incidence multilayer mirrors in the 28.4nm and 30.4nm wavelength.      我们报道了一种新的材料组合C／Si用于28．4nm（43．65eV）和30．4nm （40．78eV）波段的多层膜反射镜，并且用离子束溅射装置制备了正入射条件下的C／Si多层膜反射镜。 短句来源      The C/Al soft X ray multilayer,fabricated by magnetron sputtering,was characterized by grazing incidence X ray diffraction. And the reflectance of C/Al soft x ray multilayer is 22%±4% at normal incidence.      磁控溅射法制备的C／Al多层膜样品，用X射线小角衍射法对其结构进行了测试，并测得C／Al软X射线多层膜的正入射反射率22％ ±4％ 。 短句来源      At normal incidence, the BRDF of the ground aluminium changes about 11% over 15°～40° scattering angle range.      在正入射情况下,双向反射比分布函数在15°～40°范围内偏差优于11%。 短句来源      X ray Normal Incidence Microscope and Its Application in ICF      X 射线正入射显微镜及其在 ICF 中的应用 短句来源 更多          “正入射”译为未确定词的双语例句      The VUV spectrum of Zn Ⅱ, Zn Ⅲ, Zn Ⅳ in the wavelength region 55.0 to 200.0 nm is reported.      本文报道用1m正入射真空紫外光谱仪,在55.0～200.0nm范围内拍摄的ZnⅡ、ZnⅢ和ZnⅣ光谱。 短句来源      The Filters for a 18.2 nm Normal-incidence Microscopic Imaging System      18.2nm正入射显微成像系统滤光片的研究 短句来源      NormalIncidence Mo/B4C Soft X-Ray Multilayer      正入射Mo/B_4C软X射线多层膜 短句来源      Fabrication of Normal Incident Cr/C High-Reflecting Mirror for 4.48nm Soft X-Ray Laser      4.48nm正入射软X射线激光用Cr/C多层膜高反射镜的研制 短句来源      The telescope has four individual channels of multilayer coating normal incident optics with working wavelengths of 12.9 nm, 17.1 nm, 19.5 nm and 30.4 nm. The field of view and angular resolution are 02° and 0.5″, respectively.      该望远镜由四个不同波长的多层膜正入射望远镜组成,工作波长分别为12.9nm、17.1nm、19.5nm和30.4nm,视场角为8.5′×8.5′,设计角分辨率为0.5″。 短句来源 更多          相似匹配句对      Multi-Layer Plane Shields for Normally Incident Plane Wave      正入射平面波的多层平板屏蔽 短句来源      A grating diffraction experiment in non-normal incidence condition      非正入射条件下的光栅衍射实验 短句来源 查询“正入射”译词为用户自定义的双语例句     我想查看译文中含有：的双语例句 为了更好的帮助您理解掌握查询词或其译词在地道英语中的实际用法，我们为您准备了出自英文原文的大量英语例句，供您参考。   normal incidence The improved MoM-PO technique is validated by comparison with exact solutions for a right-angled perfectly conducting wedge at normal incidence. 例句来源       In this paper, we discuss the theoretical advantages of QDIPs including the normal incidence response, lower dark current, higher responsivity and detectivity, etc. 例句来源       For the case of normal incidence, the analytical expressions for the wavefunction of the electron are presented; it is predicted that the Rashba spin-orbit coupling can induce a current perpendicular to the normal incident direction of the electron. 例句来源       Normal incidence of a plane acoustic wave on a rigid wall covered with a thin compressible layer 例句来源       The amount and degree of detail of the initial information are analyzed as applied to the new method of ocean bottom mapping on the basis of the fine structure of the bottom-reflected sound field at normal incidence. 例句来源       更多                    Argon ion sputter yield round robin of the silicon dioxide has been performed for the SiO_2 standard sample provided by the American Society for Testing and Material by using four sets of electron spectrometers.At the ion energies of 1KeV,3KeV and 5KeV,the sputtering rates are proportional to the ion beam current densities.The sputter yields are in- creased with the beam energies within the range of 1—5KeV.At the incident angle of 52°, the argon ion sputter yield of the silicon dioxide are 0.94,1.09 and 1.2...             对美国测试与材料学会提供的二氧化硅标准样品,用四台电子能谱仪进行了氩离子对二氧化硅的溅射产额的会测。在1KeV、3KeV 和5KeV 离子能量下,溅射速率均与离子流密度成线性关系。而溅射产额与离子能量的关系在1～5KeV 的范围内是随能量增加而增大。在入射角为52°的情形,氩离子对二氧化硅的产额值是:0.94分子/离子(1KeV)、1.09分子/离子(3KeV)和1.25分子/离子(SKeV)。在1KeV 的情况下,52°入射角时的产额约为正入射时的2.4倍。 文摘来源          Ruth and Hirth had calculated flux distributions using their model, but the distributions were only valid for fluxes perpendicular to the substrates. Svensson and Andersson had approximately calculated the oblique flux on the base of R ＆ H model. However, only the flux distribution on central line could be found and S ＆ A method was not satisfied to explain the experimental data: In this paper, oblique fluxes over whole surface of the substrate have been deriveted from R ＆ H model without assumptions of app...             Ruth和Hirth用自己的模型计算了束流分布,但该分布只限于在正入射条件下使用。Svensson和Andersson用R＆H模型计算了斜入射下的分布,因用的是近似方法,只能计算衬底表面中心线上的束流值,且不能满意解释实验结果。本文也采用R＆H模型,但不附加近似假定,直接计算斜入射下整个衬底而上的束流分布,获得较满意的结果。 文摘来源          This paper presents a method to study the propagation of electromagneticwaves in a non-uniform plasma stratified media by inequable segmented model,which gives the formulae of power transmissive and reflective coeffcients ofelectromagnetic waves by using the invariant bedding principle.This method hasbeen used in the research of the propagative characteristics of both normalincidence and oblique incidence cases,and the effect of a stable magnetic fieldon propagation.             本文介绍研究非均匀等离子体分层介质中电磁波传播的不等分多段模式,采用不变量镶嵌原理,得出电磁波的功率透射系数和功率反射系数等计算公式,并研究了正入射、斜入射电磁波的传播特性,以及外加恒稳磁场对电磁波传播的影响。这一方法的物理思想清晰直观,公式简明,既可用于理论研究,又可用于实际计算。 文摘来源   << 更多相关文摘         相关查询: 非正入射 正入射吸收 正入射吸收系数 近正入射 x射线正入射显微镜  对查询结果不满意

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