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波前工程
相关语句
  wavefront engineering
     Wavefront Engineering and Optical Super Resolution
     波前工程与光学超分辨
短句来源
     Resolution above 50nm can be realized using 193nm lithography combined with wavefront engineering or interferometric lithography.
     5 0nm以上分辨力可以用 193nm光刻结合波前工程和干涉光刻实现 .
短句来源
     Based on the theory of partial coherent diffraction and FRT, an approach for Fractional Fourier Domain Filtering is presented as a new wavefront engineering method to improve the image quality in photolithography.
     基于部分相干成像理论和分数傅立叶变换滤波等理论,我们提出了利用分数傅立叶域滤波改善光刻成像质量的波前工程新思想和新方法。
短句来源
  “波前工程”译为未确定词的双语例句
     The Wave Front of Optical Lithograptly
     光学光刻的波前工程
短句来源
     For the coordination of the contradictory, the wavefront technique has been regarded as an effective method to improve the image quality in photolithography by optimizing the image of the mask. It includes: pupil filtering, phase shift mask, off-axis illumination, optical proximity correction, and so on.
     为了协调这种矛盾,利用波前工程来改善光刻图形的质量以提高光刻分辨率,已广泛地应用于光学光刻中,如:瞳孔滤波、相移掩模、离轴照明、光学邻近效应校正等。
短句来源
     We build a fire-new, applied partially coherent model describing digital gray lithography process, and present serial digital image designing method of properly modulating scanning-velocity, row space, digital image numbers, gray configuration and image alignment space based on the model and the thought of wavefront project of optimizing substract exposure dose distribution. It supplies basis for micro-optical element fabrication and deeply development of digital lithography technology.
     建立适用于描述数字灰度光刻过程的全新、实用的部分相干理论模型,并基于该模型和优化设计基片曝光剂量分布的波前工程思想,提出合理调控扫描速度、扫描行间距、数字图形幅数、灰度结构和图形排列间距的系列数字图形设计方法,对实验工作的展开具有指导意义。
短句来源
     In this paper,the achievements in scientific research for the wave front of optical lithoyraphy in home are introduced. It includes The new ntase-shift mask and combined simulation for the optical prox-imity effects of projection optical lithography and mask processing.
     介绍了国内研究光学光刻波前工程的一些成果,如新型移相掩模、投影光刻的邻近效应和掩模加工的邻近效应的组合模拟等。
短句来源
  相似匹配句对
     The Wave Front of Optical Lithograptly
     光学光刻的波前工程
短句来源
     Wavefront Engineering and Optical Super Resolution
     波前工程与光学超分辨
短句来源
     South North Water Transfer Project
     南水北调工程
短句来源
     engineering seismology;
     工程地震;
短句来源
     Wavefront Reconstructor
     波前重构器
短句来源
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  wavefront engineering
Examination of the history of RET and recent developments shows that only 3 of the 4 independent variables available for wavefront engineering have been utilized.
      
The terms wavefront engineering and resolution enhancing techniques have often been used to describe these methods.
      


This paper introduces the recent progress of optical lithography,including the concept of wavefront engineering.Some fundamental ways for optical super resolution are discussed.

对光学曝光技术的主要进展、波前工程概念和实现光学超分辨的基本途径等进行了论述。

Nanoscale science and technology will become a key issue of the new information century. Nanoscale structures provide an important foundation for studying the microscopic quantum world, thus their fabrication is a task that needs to be addressed urgently.The methods and key issues of several nanolithography technologies are reviewed, with detailed discussions on wavefront engineering and lithographies based on e beams, ion beams, X rays, atoms and interferometry, as well as extreme UV(EUV),157nm and 126nm...

Nanoscale science and technology will become a key issue of the new information century. Nanoscale structures provide an important foundation for studying the microscopic quantum world, thus their fabrication is a task that needs to be addressed urgently.The methods and key issues of several nanolithography technologies are reviewed, with detailed discussions on wavefront engineering and lithographies based on e beams, ion beams, X rays, atoms and interferometry, as well as extreme UV(EUV),157nm and 126nm wavelength lithographies.As next generation lithographies, they all can be used to fabricate nanoscale patterns, but each has its resolution limit. Resolution above 50nm can be realized using 193nm lithography combined with wavefront engineering or interferometric lithography. For 50nm or so resolutions, EUV, 157nm or 126nm lithography can be used whereas e\|beam, ion beam, X ray, or atom lithography can be used to fabricate structures of several nanometers. However, these technologies can only be perfected after other problems relating to the optical system, resist compound and precision control are solved. Future prospects are finally discussed.

纳米科学技术将成为新世纪信息时代的核心 .纳米量级结构作为研究微观量子世界的重要基础之一 ,其制作技术是整个纳米技术的核心基础 ,已成为当前世界科学研究急需解决的问题 .文章针对目前的科技发展情况 ,介绍了几种纳米光刻技术的实现新途径、发展现状和关键问题 .详细阐述了波前工程、电子束光刻、离子束光刻、X射线光刻、原子光刻、干涉光刻、极紫外光刻以及 15 7光刻的原理和实现难点 .作为下一代各种光刻技术 ,它们都有望实现纳米量级的图形 ,但各种技术可实现的分辨力极限有所不同 .5 0nm以上分辨力可以用 193nm光刻结合波前工程和干涉光刻实现 .5 0nm左右的分辨力可用极紫外光刻、15 7光刻和 12 6nm光刻实现 .而电子束光刻、离子束光刻、X射线光刻、原子光刻则可望实现几个纳米的分辨力 .但是这些技术的完善还有待于诸如光学系统、抗蚀剂、精密控制等等相关技术的成熟 .文章还讨论了纳米光刻技术的应用前景 .

The basic theory of the phaseshifting filtering technique for improving photolithographic resolution of projection imaging is studied in detail. The theoretical model is given and the simulation calculation is carried out. The different optimized filters are made with different mask patterns designs. The contrast photolithographic experiments are carried out and a number of experimental results have been obtained. The research results show that the phaseshifting filtering can significantly improve photolithographic...

The basic theory of the phaseshifting filtering technique for improving photolithographic resolution of projection imaging is studied in detail. The theoretical model is given and the simulation calculation is carried out. The different optimized filters are made with different mask patterns designs. The contrast photolithographic experiments are carried out and a number of experimental results have been obtained. The research results show that the phaseshifting filtering can significantly improve photolithographic resolution of partially coherent imaging system and enlarge its focal depth. It can improve light utilization ratio and photolithography production rate. It is an effective wavefront engineering technique for improving photolithographic resolution and focal depth.

详细研究了提高投影成像光刻分辨力的相移滤波技术的基本理论 ,给出了理论模型 ,进行了模拟计算 .对不同掩模图形设计制作的不同优化滤波器进行光刻对比实验并取得实验结果 .研究表明 ,相移滤波能显著提高部分相干成像系统光刻分辨力和增大焦深 ,同时能提高光能利用率 ,有利于提高光刻生产率 ,是一种有效提高光刻分辨力和焦深的波前工程技术 .

 
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