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阴极斑
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  cathode spot
     Metal ion can be obtained by cathode spot vacuum arc, and gas ion by gas coellective arc discharge. power: voltage 10-80kV, pulse strength of gas and metal ion 0.25 A and 0.50 A, operabion frequency 10-50Hz, beam spot area 200cm2. In the paper, ion injection application of ion source is described.
     利用阴极斑真空弧可以获得金属离子,利用气体集中弧放电获得 气体离子,引出电压为 10~80kV,气体和金属离子脉冲流强分别为 0.25A 和 0.50A, 工作频率为 10~50 Hz,束斑面积 200 cm2。 本文并对该离子源的离子注入应用做了介 绍。
短句来源
     The evolvement of cathode spot on hydrogen-impregnated electrode was captured by high-speed photography, and the emission spectra of cathode spot at different pulse currents were analyzed.
     拍摄了离子源放电瞬间吸氢电极上阴极斑的形成过程,分析了不同放电电流时阴极斑的发射光谱。
短句来源
     The experimental results show that in most cases, only one cathode spot can be found in the discharge zone of vacuum arc ion source, and the spot moves a little during the same discharge.
     实验结果表明,当脉冲工作电流为 101—102 A 时,真空弧离子源放电区一般只有单个阴极斑,阴极斑的位置在同一次放电中的变化很小;
短句来源
     In this paper, the physical character and break-down performance of quartz insulator were investigated, and the microcosmic images near and far from cathode spot were observed by metalloscope after many times discharge, furthermore, the plasma emission spectrums and beam current stability of vacuum arc ion source assembled in different insulator were tested and compared.
     文中对石英片的物理性质和击穿特性进行了研究,采用金相显微镜观察了阴极斑附近和远区的微观图像,对使用不同绝缘介质的真空弧离子源的放电等离子体发射光谱和引出束流强度的稳定性进行了测量和比对。
  “阴极斑”译为未确定词的双语例句
     Attempts have been made to solve this problem by steering the cathode spots by a magnetic field, and by removing the droplets by a magnetic filter.
     为解决这个问题,可采用轴对称磁场约束阴极斑,磁过滤器过滤等离子体出束中的液滴。
短句来源
  相似匹配句对
     ANALYSIS ON THE MECHANISM OF ARC DISCHARGE WITH CATHODE SPOTS
     阴极放电的机理分析
短句来源
     The characteristics of cathode spots arc were introduced in this paper.
     介绍了阴极放电的基本特征。
短句来源
     CATHODE PROTECTION
     阴极保护
短句来源
     RARE EARTH METAL COMPOUNDS AS THERMIONIC CATHODE MATERIAL
     稀土金属化合物阴极
短句来源
     oil spot corrosion
     油腐蚀
短句来源
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  cathode spot
It is demonstrated that a magnetic field with a transverse (relative to the discharge axis) component has a significant effect on the shape of plasma column and on the rate of expansion of the cathode spot region.
      
Also discussed is the mechanism associated with retrograde motion of cathode spot in view of the effect of azimuthal magnetic field on the axial component of current and of the effect of axial magnetic field on the azimuthal component of current.
      
It is found that a cathode spot of SEC may have various shapes and structures (regular circle, horseshoes, filamentary spots, and so on).
      
A plasma stream with a cross section of 150×10 cm2 and a density of ~1010 cm-3 at a pressure of 0.1-1 Pa is generated at a discharge current of up to 60 A without a cathode spot.
      
An ecton mechanism for the operation of the cathode spot and the concept of a deep nonstationary potential well are used as the basis to propose a model of collective ion acceleration at the spark stage of a vacuum discharge.
      
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TITAN ion source is a new ion source which can produce strong metal and gas ion beam. Use .it,Al.Ti,Ta,Cr,Fe,Co,Ni,Zn, Sn, Y, C, Si, He, N, Ar etc gas and metal element ion beam can be obtained. Metal ion can be obtained by cathode spot vacuum arc, and gas ion by gas coellective arc discharge. power: voltage 10-80kV, pulse strength of gas and metal ion 0.25 A and 0.50 A, operabion frequency 10-50Hz, beam spot area 200cm2. In the paper, ion injection application of ion source is described.

TITAN离子源是一种新的能够同时产生强金属和气体离子束流的离子源。利 用它我们已经得到了 Al、Ti、Ta、Cr、Fe、Co、Ni、Zn、Sn、Y、C、Si、He、N、Ar等气 体和金属元素离子束。利用阴极斑真空弧可以获得金属离子,利用气体集中弧放电获得 气体离子,引出电压为 10~80kV,气体和金属离子脉冲流强分别为 0.25A 和 0.50A, 工作频率为 10~50 Hz,束斑面积 200 cm2。本文并对该离子源的离子注入应用做了介 绍。

Cathode vacuum arc discharge plasma deposition is a promising technique for the production of thin films. Along with the plasma, droplets of size up to some microns are produced at the cathode spots. Contammation of the films by droplets represents a major obstade to broad application of cathode vacuum are discharge plasma deposition. Attempts have been made to solve this problem by steering the cathode spots by a magnetic field, and by removing the droplets by a magnetic filter. Results show that droplets have...

Cathode vacuum arc discharge plasma deposition is a promising technique for the production of thin films. Along with the plasma, droplets of size up to some microns are produced at the cathode spots. Contammation of the films by droplets represents a major obstade to broad application of cathode vacuum are discharge plasma deposition. Attempts have been made to solve this problem by steering the cathode spots by a magnetic field, and by removing the droplets by a magnetic filter. Results show that droplets have been filtered out at the magnetic filter's exit, and the ion beam current here has reached 120 mA.

阴极真空孤放电产生高密度等离子体的同时,也产生了尺寸可达微米量级的液滴,液滴对膜层的污染限制了它的应用。为解决这个问题,可采用轴对称磁场约束阴极斑,磁过滤器过滤等离子体出束中的液滴。结果表明液滴在磁过滤器出口处已基本上被过滤掉了,该处离子束流达到120mA。

Discharge behavior of the vacuum arc ion source working in pulse mode was investigated using high-speed photography and spectrum diagnosis. The evolvement of cathode spot on hydrogen-impregnated electrode was captured by high-speed photography, and the emission spectra of cathode spot at different pulse currents were analyzed. The experimental results show that in most cases, only one cathode spot can be found in the discharge zone of vacuum arc ion source, and the spot moves a little during the same discharge....

Discharge behavior of the vacuum arc ion source working in pulse mode was investigated using high-speed photography and spectrum diagnosis. The evolvement of cathode spot on hydrogen-impregnated electrode was captured by high-speed photography, and the emission spectra of cathode spot at different pulse currents were analyzed. The experimental results show that in most cases, only one cathode spot can be found in the discharge zone of vacuum arc ion source, and the spot moves a little during the same discharge. Temperature of the cathode spot may rise while the discharge current increases, and ultimately the density of hydrogen ion will be increased. At the same time, sputtering of the electrode is enhanced and the quality of ion plasma will be reduced.

采用高速摄影和光谱诊断的方法研究了真空弧离子源脉冲工作瞬间的放电行为。拍摄了离子源放电瞬间吸氢电极上阴极斑的形成过程,分析了不同放电电流时阴极斑的发射光谱。实验结果表明,当脉冲工作电流为 101—102 A 时,真空弧离子源放电区一般只有单个阴极斑,阴极斑的位置在同一次放电中的变化很小;较大的脉冲工作电流有利于提高阴极斑的温度,并最终导致氢离子浓度的增加,但也会使阴极材料的溅射更加严重,造成离子源等离子体品质下降。

 
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