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x射线反射     
相关语句
  x-ray reflectivity
     Using the X-ray reflectivity,the structure information of Si/C 20 multilayers sample was gotten.
     利用设备采用X射线反射法,在不破坏样品的情况下得到了Si/C多层膜的结构信息;
短句来源
     Grazing incident X-ray scattering techniques,including the methods of the grazing incident X-ray diffraction,grazing incident X-ray reflectivity,the random grazing incident X-ray scattering,have been reviewed in this article.
     描述了掠入射X射线散射的基本方法,包括掠入射X射线衍射、掠入射X射线反射和掠入射X射线漫散射方法。
短句来源
     As the two inner interfaces of the core Co/Cu/Co sandwich are doped with the NNL at the same time, the inverse MR can also be observed because of difference in scattering spin asymmetry at the two doped interfaces, which is indi-cated in the low-angle X-ray reflectivity measurement.
     通过小角X射线反射研究了Co/Cu/Co两内界面在掺杂前的结构,表明以上两不同界面掺杂微结构确实不同。 2)在三明治外界面掺杂时,由于掺杂界面不是赝自旋阀Cu/Co/Cu/Co/Cu的核心界面,所以,它只降低了正常磁电阻,而不能把正常磁电阻改变为反常磁电阻。
短句来源
     Density changing with substrate negative bias of tetrahedral amorphous carbon (ta-C) films deposited by filter cathode vacuum arc (FCVA) system was studied by X-ray reflectivity technique.
     利用过滤阴极真空电弧系统制备了不同衬底偏压下非晶金刚石薄膜,分别采用X射线反射法测定了相应的非晶金刚石膜密度,分析了薄膜密度与沉积能量之间的变化规律,建立了薄膜密度随衬底偏压的变化曲线。
短句来源
     Synchrotron radiation induced surface etching characterized by X-ray reflectivity
     同步辐射光刻的X射线反射谱表征
短句来源
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  x-ray reflection
     Study of Ge Thin Heterostructures by Synchrotron Radiation X-Ray Reflection
     Ge薄层异质结构的同步辐射X射线反射法研究
短句来源
     SYNCHROTRON RADIATION X-RAY REFLECTION TECHNIQUE AND ITS APPLICATION IN MEASUREMENT OF ATOMIC DEPTH DISTRIBUTION IN δ-DOPED Si CRYSTALS
     同步辐射X射线反射技术及其在测量δ掺杂晶体中原子表层深度分布的应用
短句来源
     Synchrotron radiation X-ray reflection method is used to study the depth distribution of Ge atoms in Si crystals caused by surface segregation during the MBE growth.
     用X射线反射方法研究了分子束外延技术生长的Si中Ge薄层异质结构的Ge原子分布特性 .
短句来源
     The distribution of Ge atoms in Si crystal is found to have asymmetric exponential shape by simulating the experimental reflectivity based on X-ray reflection theory and Parratt method. The distribution decay lengths forward and backward along the growth direction are obtained as 8? and 3?
     根据X射线反射理论及Parratt数值计算方法对实验反射曲线的模拟 ,得到不同厚度的Ge薄层异质结构样品中Ge原子的深度分布为非对称指数形式 :在靠近样品表面一侧的衰减长度为 8埃 ,而在靠近样品衬底一侧的衰减长度为 3埃 ,且分布形式与Ge原子层的厚度无关。
短句来源
     X-ray reflection and diffraction, electronic probe and photoluminescence analysis were used to characterize the multiple quantum wells (MQWs).
     利用X射线反射、X射线衍射、电子探针,光致荧光光谱等表征技术,研究了ZnO/MgO多量子阱的结构、成份和光致荧光特性.
短句来源
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  x ray reflection
     Error Effect in Depth of Diffraction Pattern of X Ray Reflection Zone Plate
     X射线反射式波带片衍射图形的深度误差效应
短句来源
     Error effect in depth of diffraction pattern of X ray reflection zone plate has been studied.
     研究 X 射线反射式波带片衍射图形制造过程中的深度误差效应。
短句来源
     This paper studies the natural fractures and the past and present ground stress distribution of Fuyang Reservoir in the peripheral part of Daqing using core fracture archaeomagnetic orientation, X ray reflection method, difference strain and sidewall sloughing Then it proposes some advices for the application of fractures and ground stress in oil field development
     应用岩心裂缝古地磁定向、X射线反射法、差应变、井壁崩落等方法对大庆外围油田扶、杨油层天然裂缝及古今地应力分布特征进行了研究 ,指出裂缝、地应力发育特征对油田注水开发的影响。
短句来源
  “x射线反射”译为未确定词的双语例句
     The Relation Between Reflective Intensity and Temperature of X-ray
     X射线反射强度与温度的关系
短句来源
     The synchrotron radiation(SR) etching of oxides were in situ measured by X-ray reflectance(XRR) spectra. The results showed that the monochromatic X-ray with a wavelength of 0.154nm could etch MgO and Cr_2O_3 thin films slightly.
     采用X射线反射(XRR)谱对同步辐射导致的氧化物薄膜的刻蚀进行了在位测试,结果表明波长为0.154nm的单色X光在室温下可对MgO和Cr2O3产生轻微的刻蚀。
短句来源
     Design and fabrication of the X-ray supermirror have been proposed, which is used as the high mirror in X-ray imaging telescope.
     介绍了一种可用于X射线成像望远镜中的高能X射线反射元件的设计和制备。
短句来源
     Review on Highly Reflecting Mirrors for Vacuum Ultraviolet and X-ray
     真空紫外~X射线反射膜研究现状
短句来源
     Development of Preparing Technique of X-ray Reflective Film for Hyperbolic and Paraboloid Mirrors by Columnar Target in Magnetical Sputter System
     应用圆柱形磁控溅射技术制备X射线反射
短句来源
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  x-ray reflectivity
The characterization technique is a combination of x-ray reflectivity and x-ray diffraction in coplanar and noncoplanar arrangements.
      
The combined use of high-resolution x-ray diffraction and x-ray reflectivity has made it possible to reliably identify structural-parameter profiles for both the quantum well and the Mn delta layer.
      
A new experimental scheme for the measurement of the x-ray reflectivity R from a liquid-solid interface in the range of angles of total external reflection is proposed.
      
The interface and magnetic properties of sputter-deposited FeCoV/NiO(tNiO)/FeCoV trilayers were analyzed by X-ray reflectivity, bulk magnetization, and polarized neutron reflectivity measurements.
      
Investigation of nanometer-scale films using low angle X-ray reflectivity analysis in IPOE
      
更多          
  x-ray reflection
Some practical recommendations for phase analysis and precision determination of the lattice parameters of weakly absorbing objects studied by X-ray "reflection" method have been given.
      
The methods of triple-crystal X-ray diffractometry and the total external X-ray reflection are used to study porous silicon films on a p-type single crystal Si(111) substrate.
      
The parameters of the heterostructure layers were determined by simultaneous analysis of the X-ray reflection curves for the (004) and (113) crystallographic planes.
      
X-ray reflection was used to determine the parameters of the porous silicon films.
      
After deposition of ~5 nm of Sm, the ionic conductivity σ of the samples decreases from σ0 to ≈0.9 σ0, and the SE lattice parameter, from 11.24 to ≈11.15 ?, with the x-ray reflection halfwidth increasing from 0.5 to 0.8°.
      
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Inhomogeneities in heavily Te-doped and boat-grown GaAs crystals (n>1x10~(18) cm~(-3) have been investigated by metallurgical microscope, X-ray anomalous transmission, X-ray reflection and infrared microscope technique. Impurity precipitates and inclusion in heavily Te-doped GaAs crystal are observed. Impurity segregative striation are observed by X-ray anomalous transmission. Formation of these defectes relats to level of heavily Te-doped and pulling technique during crystal growth.

采用金相显微镜,X射线异常透射,X射线反射和红外显微镜技术研究了舟生长的重掺Te—GaAs体单晶(n>10~(18)cm~(-3))的不均匀性。观察到了重掺Te-CaAs体单晶中杂质沉淀和夹杂物。用X射线异常透射观察到了杂质分凝的辉纹。这些缺陷的形成和重掺Te的程度以及晶体生长期间的拉晶工艺有关。

Based on the bydrodynamio model the reflectance behavior of the TE waves on the metallic superlattioes is discussed by making use of the transfei matrix method, and the analytic formula of the reflectivity is presented in the case of ω>ωp. The interesting numerical results is shown for the special model of AB and ACBC structures, which provides an available new ways for studying and making of soft X-rays and extreme ultraviolet reflectors.

本文在流体动力学模型基础上,用转移矩阵方法讨论了TE波在金属超晶格薄膜上的反射行为,给出了ω>ω_p时反射率的解析表达式.并通过对AB型金属超晶格和ACBC型金属超晶格的数值计算,得到了关于软X射线反射光谱行为的许多有意义的结果.

Surface damages of Te solvent and Bridgman grown HgCdTe wafers have beenstudied with X-ray reflection topography. The different surface damages between variousprocessing methods are compared. Experiments show that mechanical scratches on waferswith carefully lapping and polishing are the main damages. An incomplete surface damagemodel is Suggested. Surface damage depths of well lapped and polished HgCdTe wafersare measured by X-ray topography. Expandments show that there is a high dislocationdensity in the lattice...

Surface damages of Te solvent and Bridgman grown HgCdTe wafers have beenstudied with X-ray reflection topography. The different surface damages between variousprocessing methods are compared. Experiments show that mechanical scratches on waferswith carefully lapping and polishing are the main damages. An incomplete surface damagemodel is Suggested. Surface damage depths of well lapped and polished HgCdTe wafersare measured by X-ray topography. Expandments show that there is a high dislocationdensity in the lattice strain area around mechanical scratchs. The ratio of the highdislocation density area to the observable damage area is about five under certainconditions. Finally, effects of the damage death on detector properties are diSscussed.

X射线反射形貌术研究了磨抛工艺在用Te溶剂法和布里奇曼法生长的碲镉汞晶片表面引入的损伤,发现精磨精抛的HgCdTe晶片表面的损伤结构与切割、粗磨造成的损伤结构明显不同。根据实验结果分析,认为机械划痕是精磨精抛过程中的主要损伤结构,并提出一个新的表面损伤模型──表面不完全损伤模型。用X射线形貌相测出了精磨精抛HgCdTe晶片表面的平均损伤和最大损伤深度。结合压痕实验,确定了机械划痕周围的晶格应变区是高密度位错增殖区;在特定条件下,测出两者之间的比值约为5。最后讨论了最大损伤深度和平均损伤深度对探测器性能的影响。

 
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