The radiation defects induced by 85MeV 19F ion of 2.4×1015/cm2 and 2.2×1016/cm2 in N-type GaP, and of 1.6×1016/cm2 in P-type InP are investigated by positron annihilation lifetime technique respectively.
The n type GaAs substrates are used and their conductive type is changed to p type by tunnel junction for AlGaInP light emitting diodes(TJ LED),then n type GaP layer is used as current spreading layer.
报道了通过隧道结将衬底的导电类型从 n型转变到 p型 ,从而可以利用 n型 Ga P作为以 n型 Ga As为衬底的 Al Ga In P发光二极管的电流扩展层 .
The n type GaAs substrates are used and their conductive type is changed to p type by tunnel junction for AlGaInP light emitting diodes(TJ LED),then n type GaP layer is used as current spreading layer.
报道了通过隧道结将衬底的导电类型从 n型转变到 p型 ,从而可以利用 n型 Ga P作为以 n型 Ga As为衬底的 Al Ga In P发光二极管的电流扩展层 .
In this paper the n-type single crystal and P-type epitaxaxy layer doped nitrogen of Gap have been analysed by the electron spectrum. The constituent, electron construction chemicel shift of the materials are given, and the quality problems of the materials are discussed also.
Zinc was diffused at 850°C from ternary sources containing 1-20 atom percent Zn and 0.5-1.0 atom percent P in Ga into n-type GaP grown by liquid phase epitaxy (LPE) and the liquid encapsulated Czochralski (LEC) process.
The growth of liquid phase epitaxial (LPE) layers of n-type GaP on GaP substrates was investigated using a multi-wafer growth system constructed of fused quartz which had provisions for gas phase saturation and doping of the gallium melt.
In this paper the n-type single crystal and P-type epitaxaxy layer doped nitrogen of Gap have been analysed by the electron spectrum.The constituent, electron construction chemicel shift of the materials are given, and the quality problems of the materials are discussed also.
The radiation defects induced by 85MeV 19F ion of 2.4×1015/cm2 and 2.2×1016/cm2 in N-type GaP, and of 1.6×1016/cm2 in P-type InP are investigated by positron annihilation lifetime technique respectively. In irradiated N-type GaP,the monovacancies are created at both low and high fluence. and the concentration of defects gets higher as the fluence increases. For irradiated P-type InP, the defects are monovacancies,too.