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   金刚石膜的生长特性 的翻译结果: 查询用时:0.016秒
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金刚石膜的生长特性
相关语句
  growth characteristics of diamond films
     The growth characteristics of diamond films are analyzed by means of SEM and Raman spectroscopy.
     用扫描电镜和拉曼光谱等测试手段对金刚石膜的生长特性进行了分析
短句来源
  growth of diamond thin films
     Growth of Diamond Thin Films by Thermal Chemical Vapor Deposition
     用热解CVD方法制备金刚石膜的生长特性
短句来源
  “金刚石膜的生长特性”译为未确定词的双语例句
     Distribution of the Diamond Film Synthesised by a Combustion Flame Methods
     燃烧火焰法沉积金刚石膜的生长特性
短句来源
     Thecharacteristics of DC glow discharge at high pressure were researched in this thesis.
     研究了金刚石膜的生长特性,完善了高导热、高磨耗比的金刚石膜制备工艺和金刚石膜工具的制备技术。
短句来源
     The diamond thin films have been synthesized on St,Ge, Cu, Mo, WC and graphite substrates with thermal CVD from mixture gaseous of CH4, and H2, and polycrystalline diamond films with an area of more than 20 X 20 mm2, and growth features of diamond thin film is studied.
     本文采用热解化学气相沉积方法,以甲烷和氢的混合气体为原料,在单晶硅和锗、 铜、钼、石英玻璃、碳化钨和石墨基板上合成金刚石薄膜,而且在单晶硅基板上合成出其面积大于20×20mm2的比较均匀的金刚石膜,同时对金刚石膜的生长特性进行了研 究。
短句来源
     A high quality diamond film which has a high growth velocity has been synthe-sized on Si substrates by means of the electron assisted chemical vapor deposion method. The max-imum growth velocity is 7μm/h and the growth areas of diamond film is φ40 mm. Thegrowthing charactristics of the high quality diamond film were studied.
     采用EACVD方法在Si衬底上制备出生长速率高的优质金刚石膜,其生长速率最大可达7μm/h,成膜范围φ40mm,并对优质金刚石膜的生长特性进行了研究。
短句来源
     The growth property of diamond film was characterized by using Raman spectrum and scan transmission electron microscopy(SEM).
     使用Raman,SEM等手段对金刚石膜的生长特性进行了表征。
短句来源
  相似匹配句对
     Distribution of the Diamond Film Synthesised by a Combustion Flame Methods
     燃烧火焰法沉积金刚石膜的生长特性
短句来源
     Growth Characteristics of Synthetic Carbon
     人造卡邦金刚石生长特性
短句来源
     The CVD techniques,characteristics and growth mechanisms of diamond film are fully discussed.
     详细讨论了金刚石膜的化学气相沉积方法、特性生长机理。
短句来源
     Growth of Diamond Thin Films by Thermal Chemical Vapor Deposition
     用热解CVD方法制备金刚石膜的生长特性
短句来源
     Layer Growth in Thick Diamond Film Prepared by Hot Cathod Glow Discharge Plasma Asisted Chemical Vapor Deposition
     热阴极辉光PACVD金刚石膜的生长特性
短句来源
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  growth of diamond thin films
Growth of diamond thin films by chemical vapour deposition
      
Enhanced nucleation and growth of diamond thin films using a nanodiamond monolayer
      


The diamond thin films have been synthesized on St,Ge, Cu, Mo, WC and graphite substrates with thermal CVD from mixture gaseous of CH4, and H2, and polycrystalline diamond films with an area of more than 20 X 20 mm2, and growth features of diamond thin film is studied.

本文采用热解化学气相沉积方法,以甲烷和氢的混合气体为原料,在单晶硅和锗、 铜、钼、石英玻璃、碳化钨和石墨基板上合成金刚石薄膜,而且在单晶硅基板上合成出其面积大于20×20mm2的比较均匀的金刚石膜,同时对金刚石膜的生长特性进行了研 究。

A high quality diamond film which has a high growth velocity has been synthe-sized on Si substrates by means of the electron assisted chemical vapor deposion method.The max-imum growth velocity is 7μm/h and the growth areas of diamond film is φ40 mm.Thegrowthing charactristics of the high quality diamond film were studied.

采用EACVD方法在Si衬底上制备出生长速率高的优质金刚石膜,其生长速率最大可达7μm/h,成膜范围φ40mm,并对优质金刚石膜的生长特性进行了研究。

Diamond films were deposited with hot cathode DC\|PCVD method in this paper. The methanol addition influences on discharge state and diamond film growth characteristics were studied. The research results show that a proper amount of methanol addition is beneficial to the stability of glow discharge. It can keep the cathode surface clean and improve the film quality. The growth characteristics of diamond films are analyzed by means of SEM and Raman spectroscopy.

采用热阴极 DC-PCVD方法制备了金刚石膜 ,研究了甲醇对放电状态和金刚石膜生长特性的影响 .结果表明 ,通入适量的甲醇有利于稳定辉光放电状态 ,保持阴极清洁 ,提高膜的生长质量 .用扫描电镜和拉曼光谱等测试手段对金刚石膜的生长特性进行了分析

 
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