Atomic partial densities of states,charge density distributions,and surface band structures are calculated and analyzed on both Ga terminated surface and N terminated surface.
分析了得到的各原子分态密度、面电荷密度分布以及表面能带结构等性质 ,比较了 Ga N(0 0 1)的 Ga端表面和 N端表面两种情况 .
The dynamic surface band bending of cleaved InP(110) sample was investegated using in situ XPS analysis and the causes of band bending was discussed acconiing to the experimental results. It was concluded that there is no intrinsic surface states in InP and neither the residual gas in UHV nor the X-Ray radiation causes the band bending, the band bending should be caused by the surface defects induced during the cleavage and lattice relaxation.
The surface energy band structure of (Ce, Ag)/TiO 2 nanometer photocatalystic materials for purifying environment was studied by scanning tunneling microscopy and tunneling spectroscopy (STM/STS).
It is found that submonolayer Ba coatings induce cardinal changes in the electronic properties of the surface with the formation of a charge accumulation layer in the region of the near-surface band bending.
It is shown that the reversible temperature-induced changes in the surface band bending and the work function of Si have a stepwise character in the temperature range 80-300 K.
A note on Transfer. Matrix Green Function (TMG) in the calculation of projected bulk band structure is presented. It is argued that the transfer matrix also contains the information of bulk as well as of surface. The projected bulk band structure in the direction of the surface can be provided when the transfer matrix has values eiδ (δ is real). As an illustrative example, the projected bulk band structure in the direction (111) of Silicon is calculated by means of tight-binding orbitals S and SP~3 separate...
Effect of annealing and light illumination on electrical and optical properties of undoped a-Si :H films were studied. The surface energy band bending is created by H20 adsorbats in order to compare the difference between annealing state and light illumination state. The results show that the density of gap state has been increased by light illumination.
UPS involving core level photoemission peaks (Ga 3d for GaAs and Si 2p for Si)is measured for the (111), (110), (111),and (001)surfaces of GaAs and Si using thelight from a helium lamp (21.2 eV and 40.8 eV) and from the Berlin synchrotron ra-diation source BESSY (108.6 eV),respectively.These surfaces are prepared by ion bo-mbardment and annealing on cylindrically shaped GaAs and Si crystals with [110] astheir axis.The GaAs cylinder is in addition prepared by molecular beam epitaxy yield-ing As-rich phases o...