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模型及计算
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The actual wind speed power model and calculation method of a wind farm made up of many wind turbine units are discussed.
      
We present a theoretical model and calculation for the production of autoionizing resonances through laser assisted dielectronic recombination process in He, and its possible application to radiation amplification of UV light.
      
A comparison of calculations using this three-dimensional model with results of the Reyleigh-Plesset bubble model shows that the three-dimensional model and calculation method in this paper is practical.
      
Description of the model and calculation of double-shell liners
      
Based on the experimental results, a physical model of the process, i.e., eddy gas flow in the channel of the dead-end cavity with energy transfer from the external flow, and a mathematical model and calculation methods of the process are developed.
      
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According to the principle of phase—locked toops with a fractional-N,this paper analyses the causes of spurious outputs in a fractional-N loop,and presentsthe linearized model of the PLL and the formulas to calculate the spurious outputs.Someresults of experiment in a practical fractional-N loop are given,which are consistent withtheoretical proof.Finally,the ways to compensate spurious outputs in a fractiona—Nloop are proposed.

根据小数分频锁相环的工作原理,分析了小数分频杂散产生的机理,给出了分析小数分频杂散的环路线性化模型及计算公式,讨论了抑制小数分频杂散的途径,对一个实际的小数分频锁相环进行了测试,其结果与理论分析基本一致。

A new rotary column double magnetron sputtering target is introduced.It has the advantage of the planar magnetron sputtering target.On the basis of its structure and operation principle,a kind of the math model and the calculating formula of the magnetic field strength of the target is presented.By the method,the calculation about the concrete target using the computer program has been finished and the distributied curve of the magnetic field of the target has been drawn too.The calculating results are given,the...

A new rotary column double magnetron sputtering target is introduced.It has the advantage of the planar magnetron sputtering target.On the basis of its structure and operation principle,a kind of the math model and the calculating formula of the magnetic field strength of the target is presented.By the method,the calculation about the concrete target using the computer program has been finished and the distributied curve of the magnetic field of the target has been drawn too.The calculating results are given,the magnetic field of the rotary column double magnetron sputtering target is comparative even and the intensity can satisfy the need of the magnetron sputtering functions.The target etching angle is nearly 40°,so that the deposition rate is increased and the coating area is enhanced obviously.The homogeneity of the deposited films and the lifetime of the target,which are the general troubles with conventional cylinder magnetron sputtering target,have been greatly improved.A large area of homogeneous films can be deposited by the sides of the target.

本文提出一种新型的圆柱旋转双面矩形磁控溅射靶 ,它具有平面磁控溅射靶的优点。根据靶的结构与工作原理 ,给出了圆柱双面矩形磁控靶磁场强度计算数学模型及计算公式。依据该计算方法 ,对具体的靶进行了计算机编程计算 ,并根据计算结果绘制出了靶磁场分布曲线。计算结果表明 :圆柱双面矩形磁控靶的磁场分布比较均匀 ,磁场强度满足磁控溅射功能的需要 ,其靶的溅射刻蚀区可宽达 4 0°角的范围。从而提高了膜层的沉积速率及膜层沉积范围 ,改善了同轴圆柱形磁控靶由于环状磁场所引起的膜层不够均匀及靶材利用率低的问题 ,可以在靶磁场两侧的大面积平面基片上沉积出膜厚均匀的涂层。

 
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