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金刚石厚膜的
相关语句
  diamond thick film
     Study on the Depositing High Quality Diamond Thick Film by the Combustion Flame Method
     燃焰法沉积高质量金刚石厚膜的研究
短句来源
     The influences of gas flow ratio,O 2/C 2H 2,on the depositing diamond thick film by the combustion flame method have been investigated,the uniform and compact and high quality diamond thick film which is light yellow and transparent has been deposited at a fairly high rate,50μm/h.
     研究了气体流量比 (O2 /C2 H2 )对燃焰法沉积金刚石厚膜的影响 ,并以约 5 0 μm /h的较高速率沉积出了均匀、致密呈淡黄色透明状的高质量金刚石厚膜
短句来源
     Technical Study of Cutting CVD Diamond Thick Film Using Laser Technology
     激光切割CVD金刚石厚膜的工艺研究
短句来源
     Studies for quality and thickness uniformity of diamond thick film synthesized by the EA-CVD method
     用EA-CVD方法制备的大尺寸金刚石厚膜的品质和膜厚均匀性的研究
短句来源
     Study on the Thermal Stress of CVD Diamond Thick Film based on ANSYS
     基于ANSYS的HFCVD金刚石厚膜的热应力分析
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  diamond thick films
     In addition, the optimize parameter for the deposition of large area diamond thick films in the high-power HFCVD systems were obtained, especial for the life of hot filament and the uniform substrate temperature.
     最后,设计研制了一台10kW级大功率热丝CVD设备,解决了沉积大面积金刚石厚膜过程中灯丝寿命和衬底表面温度均匀等关键问题,探索了沉积大面积金刚石厚膜的工艺。
短句来源
     Preparation and Application of Large Size CVD Diamond Thick Films
     大尺寸CVD金刚石厚膜的制备及应用
短句来源
     The growth behavior and internal stress of diamond thick films synthesized by hot-cathode DC-PCVD
     热阴极DC-PCVD方法制备的金刚石厚膜的生长特性和内应力
短句来源
     Etching of CVD Diamond Thick Films by Rare-earth Compound Ink
     稀土化合物浆料对CVD金刚石厚膜的刻蚀
短句来源
     Etching of CVD diamond thick films by rare-earth compound ink
     CVD金刚石厚膜的稀土化合物浆料刻蚀(英文)
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  “金刚石厚膜的”译为未确定词的双语例句
     Study on Laser Processing and Machining of CVD Diamond Thick-Film
     CVD金刚石厚膜的加工技术研究
短句来源
     Preparation of Thick CVD Diamond Film on Copper Substrate
     铜基体上CVD金刚石厚膜的制备
短句来源
     Synthesis of CVD Thick Diamond Films and Manufacturing Technology of Thick Diamond Film Tools
     CVD金刚石厚膜的制备及厚膜刀具制造技术
短句来源
     Preparation of Large Area Thick Diamond Films
     大面积金刚石厚膜的制备
短句来源
     Polycrystalline diamond films are etched at different etching parameters in oxygen plasma produced by DC glow discharge.
     在直流辉光放电等离子体装置上,利用不同直流功率和工作气压下产生的氧等离子体对CVD金刚石厚膜的表面进行了刻蚀。
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A diamond thick film(0.1-2mm thick )has been grown by electron assistant hot filament CVDmethod. The wear resistivity and thermal conductivity of the diamond thick film are investigated,anddiamond film brazed cutting tools and heat sinks of diamond film have been made using the diamond thickfilm.

用电子增强热灯丝CVD(化学汽相沉积)方法制备出膜厚为0.1-2mm的金刚石厚膜,研究了金刚石厚膜的耐磨性和热导特性,用它制作了金刚石膜焊接刀具和半导体激光器用金刚石膜热沉。

Thick diamond film is prepared by using hot cathod glow discharge plasma assisted chemical vapor deposition and investigated by scanning electron microscopy.The growth mechanism of the diamond is studied.

对用热阴极辉光PACVD方法合成的金刚石厚膜,采用扫描电子显微镜进行了观察,研究了金刚石的生长机制.

An effective method for polishing thick free standing diamond films based on the reaction of veryreactive rare earth metals (e. g. La) with carbon (diamond) was studied.It was found that the rate of diamond removal by La largely depended on the polishing temperature. High diamond removal rate was achieved at polishing temperatures higher than 900℃. Removal rate as high as 34m/h was observed at 940℃, and the surface roughness was decreased from its original value of Ra 12μm to as low as 1. 6μm.This level of smoothness...

An effective method for polishing thick free standing diamond films based on the reaction of veryreactive rare earth metals (e. g. La) with carbon (diamond) was studied.It was found that the rate of diamond removal by La largely depended on the polishing temperature. High diamond removal rate was achieved at polishing temperatures higher than 900℃. Removal rate as high as 34m/h was observed at 940℃, and the surface roughness was decreased from its original value of Ra 12μm to as low as 1. 6μm.This level of smoothness is idea for subsequent final polishing by mechanical polishing or other method,and is capable of making the most tedious process more effective and economical.

研究开发了一种快速有效地抛光化学气相沉积(CVD)金刚石厚膜的技术。该技术利用化学活性很强的稀土金属镧(La)与金刚石(碳)的化学反应,在一定的工艺条件下可对金刚石膜进行有效的抛光。抛光速率的高低与抛光温度有关,在温度大于900℃时抛光效率较高,可达34μm/h,表面粗糙度可从原来的Ra12μm降至Ra1.6μm,如用于后续的精抛光,可大大减少抛光的时间和提高抛光效率,使表面十分粗糙的金刚石厚膜的精抛光能得以经济地进行。

 
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