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衬底温度场
相关语句
  substrate temperature distribution
     Numerical Analysis of Substrate Temperature Distribution in Diamond Film Growth by Hot-Filament Chemical Vapor Deposition
     优化HFCVD系统内衬底温度场的数值研究
短句来源
     The substrate temperature distribution and the radiation density distribution were numerically analyzed with consideration given to the lateral heat conduction of the substrates.
     本文基于辐射传热基本原理 ,并考虑变热物性衬底的横向热传导 ,改进了衬底温度场的计算模型。
短句来源
  “衬底温度场”译为未确定词的双语例句
     THE STUDY OF THE TEMPERATURE FIELD OF SUBSTRATE IN LASER THERMAL DEPOSITION MICROLENS
     激光热解沉积微透镜中衬底温度场的研究
短句来源
     Study on Self-adjust Fuzzy-PID Controller in CVD Diamond Substrate Temperature Field
     CVD金刚石衬底温度场的自调整模糊PID控制器研究
短句来源
     Modeling and Analyzing the Substrate Temperature Field in the Large Area HotFilament CVD System
     大面积HFCVD系统衬底温度场建模与分析
短句来源
     the temperature field distribution on the substrate in the reaction apparatus was computed; the role of the temperature field distribution and relevant factors in diamond film deposition quality and speed is analyzed; and the deposition process is optimized based on the inspect results and data of the diamond deposition experiments conducted in the lab.
     1、对热丝CVD沉积金刚石薄膜的非平衡热力学耦合模型和动力学模型进行研究,重点分析热丝CVD沉积金刚石膜系统中衬底温度场分布及相关因素对于薄膜沉积质量和速率的影响,同时结合实验室所进行的金刚石薄膜制备实验中所获得的实验数据和检测结果,优化金刚石薄膜沉积工艺。
短句来源
     Object regarded as the CVD diamond substrate temperature field system, it shows a double-model control system by using a composite fuzzy controller, and the control technique and algorithms.
     以CVD金刚石衬底温度场为控制对象 ,采用复合型模糊控制器 ,建立一种双模控制系统。
短句来源
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  相似匹配句对
     Oscillatory Temperature Fields
     振荡的温度
短句来源
     the redistribution of the temperature fields.
     温度的重新分布
短句来源
     THE STUDY OF THE TEMPERATURE FIELD OF SUBSTRATE IN LASER THERMAL DEPOSITION MICROLENS
     激光热解沉积微透镜中衬底温度的研究
短句来源
     Numerical Analysis of Substrate Temperature Distribution in Diamond Film Growth by Hot-Filament Chemical Vapor Deposition
     优化HFCVD系统内衬底温度的数值研究
短句来源
     T is temperature, ℃.
     T为温度,℃。
短句来源
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  substrate temperature distribution
The study focuses particularly on the fluid and substrate temperature distribution within the PCR chip and the droplet residence times in critical temperature zones.
      
Hence the nonuniformity in the substrate temperature distribution must have stemmed almost solely from the substrate geometry.
      


Numerical simulations were used to investigate the influence of various hot filaments and other deposition parameters on substrate temperature field which affects significantly the growth and quality of diamond films by hot-filament chemical vapor deposition(HFCVD). It was found that the homogenous substrate temperature region 76 mm × 76 mm with the maximum temperature fluctuation no more than 5% could be obtained by a 80 mm×80 mm filamentary heater and it could be improved to 100 mm × 100 mm under the...

Numerical simulations were used to investigate the influence of various hot filaments and other deposition parameters on substrate temperature field which affects significantly the growth and quality of diamond films by hot-filament chemical vapor deposition(HFCVD). It was found that the homogenous substrate temperature region 76 mm × 76 mm with the maximum temperature fluctuation no more than 5% could be obtained by a 80 mm×80 mm filamentary heater and it could be improved to 100 mm × 100 mm under the condition of supplementary hot filaments with appropriate parameters. ll of these theoretical results provided the basis for optimizing the technological parameters to deposit high quality and uniform diamond films over large area.

对热丝化学气相沉积(HFCVD)生长金刚石膜过程中影响衬底温度场的热丝几何参数及其他相关沉积参数进行了模拟计算.结果表明,通过优化参数,用80mm ×80mm的热丝阵列可以获得76mm × 76 mm面积的均匀衬底温度区,进一步利用辅助热丝则可将均温区面积扩大到 100mm×100mm.这些结果可以为沉积高质量、大面积金刚石膜的工艺参数提供理论依据.

Irradiation of the hot filament significantly affects the surface temperature distribution,or temperature field of the substrates,in the diamond film growth by hot filament chemical vapor deposition (HFCVD).The substrate temperature distribution and the radiation density distribution were numerically analyzed with consideration given to the lateral heat conduction of the substrates.The results show that lateral heat conduction improves the uniformity of the substrate temperature distribution.The influence of...

Irradiation of the hot filament significantly affects the surface temperature distribution,or temperature field of the substrates,in the diamond film growth by hot filament chemical vapor deposition (HFCVD).The substrate temperature distribution and the radiation density distribution were numerically analyzed with consideration given to the lateral heat conduction of the substrates.The results show that lateral heat conduction improves the uniformity of the substrate temperature distribution.The influence of various factors,such as temperature of the surroundings,filament height,filament number and their spacing,etc.,on the distributions of irradiation and temperature were also discussed.Geometry and position of the filament were optimized to ensure a uniform temperature distribution for a 8 cm×8 cm silicon substrate on the basis of our numerical calculation.

热丝对衬底的辐射是决定热丝化学气相沉积金刚石薄膜系统内衬底表面温度分布的主要因素。本文基于辐射传热基本原理 ,并考虑变热物性衬底的横向热传导 ,改进了衬底温度场的计算模型。数值模拟了衬底表面所受辐射热流密度分布和温度分布 ,结果表明辐射热流密度分布与辐射热平衡得到的温度分布形状一致 ,而衬底横向热传导提高了温度分布的均匀性。进一步计算并讨论了环境温度和热丝高度、数目、间距等几何参数对衬底表面所受辐射热流密度分布和温度分布的影响 ,给出获得 8cm× 8cm大面积均温区对应的热丝几何参数

Object regarded as the CVD diamond substrate temperature field system, it shows a double-model control system by using a composite fuzzy controller, and the control technique and algorithms. The adjustment can real-time respond with self-adjust fuzzy-PID algorithm, the fuzzy language rule and synthesis reasoning. The controller has excellent adaptation capability under parameter variation and outside disturbance. The results show that the control system has high robustness

以CVD金刚石衬底温度场为控制对象 ,采用复合型模糊控制器 ,建立一种双模控制系统。详细介绍了控制思路及实现算法 ,并在模糊控制系统中引入自调整模糊PID算法 ,实现模糊语言规则及综合推理的实时调节 ,从而获得较强的适应能力 ,可在系统参数变化或存在扰动的情况下 ,保证控制系统具有较好性能。结果表明该控制系统具有较强的鲁棒性。

 
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