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   镀膜参数 的翻译结果: 查询用时:0.486秒
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镀膜参数
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  deposition parameters
     Effect of Deposition Parameters on the c BN Content in the BN Films by IBED
     镀膜参数对离子束增强沉积氮化硼薄膜中立方相含量的影响
短句来源
     This paper introduces the formation of boron nitride(BN) thin films on Si substrates by ion beam enhanced deposition(IBED) and the experimental study of the effect of deposition parameters on the cubic boron nitride(c BN) content in the BN films. The effect of the bombardment ion beam density, the deposition rate, the percentage of argon in the bombardment gas and the substrate temperature was investigated.
     本文介绍用离子束增强沉积(IBED)法在硅片上制备氮化硼(BN)薄膜及镀膜参数对膜中立方氮化硼(c-BN)含量的影响的试验研究,主要研究轰击离子束密、镀膜速率、轰击束中氩气的含量及衬底温度的影响。
短句来源
     Under the optimal deposition parameters, the amount and size of titanium microdroplets can be reduced effectively, therefor, the adhesion between the TiN and matrix can be improved obviously .
     通过优化镀膜参数 ,可以有效地减少 Ti液滴的数量和尺寸 ,提高Ti N薄膜 /工件基体之间的结合力
短句来源
  “镀膜参数”译为未确定词的双语例句
     We get the film reflectivity of fiber-optic Fabry-Perot cavity by calculation, and designed a experimental device to observe white-light interferometry.
     通过理论计算得到了构成光纤FP腔的光纤端面的镀膜参数要求,深入的分析了白光干涉仪光纤FP传感器的模型,并设计出了一套观察白光干涉现象的实验装置。
短句来源
     The experiment results show that TiN film on chamber surface with proper characteristics can be achieved at 80~90 Pa and 160~180 ℃ of coated surface temperature.
     实验结果表明,在压强为80~90 Pa、基体温度为160~180℃的镀膜参数下,不锈钢管道内壁能获得符合加速器物理要求的TiN薄膜.
短句来源
     According to the upper analysis, we optimize the depositionparameters successfully, and improve the normal梚ncidencereflectance of Mo/Si multiplayer up to 60% at l3nm.
     通过对上述工作的总结,我们有的放矢地优化了镀膜参数,制作的Mo/Si多层膜在13nm处的正入射反射率达到60%。
短句来源
     In order to effectively solve high power CO 2 laser's HR-coating infrared output-coupler absorbing laser energy generate thermal effect problem,over coating parameters and working characteristic analysis, the infrared output-coupler thermal model is built.
     为了有效地解决高功率CO2 激光器高反膜红外耦合窗吸收谐振腔内激光能量产生热效应问题 ,通过对红外耦合窗镀膜参数和工作特性分析 ,建立了红外耦合窗热模型。
短句来源
     Thus, a maximum continuous wave(CW) output power of 43 W at 1 319 nm was acquired. Based on the 1 319 nm laser, an intracavity frequency-doubling laser of 660 nm was also demonstrated by using KTP crystal and an acousto-optically Q-switch. A Quasi-CW red light output power of 2 W at 660 nm was acquired, and accordingly, dual-wave output was realized.
     文中分析了波长1319nm激光的辐射跃迁能级,论述了抑制1064nm激光的生成从而提高1319nm激光输出等关键技术,研究了光学镜片的镀膜参数与腔型结构,实现1319nm激光连续输出最高功率43W,以1319nm激光为基频,置入KTP晶体内腔倍频,并设置声光Q开关,获得660nm红光准连续输出2W,实现1319nm与660nm双波长输出.
短句来源
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  相似匹配句对
     Main technological parameters which affectthe quality of coating are also discussed.
     探讨了影响镀膜的主要工艺参数
短句来源
     MEASUREMENT OF PLASMA PARAMETERS IN A DIAMOND COATING DEVICE
     金刚石镀膜装置中的等离子体参数测量
短句来源
     design factors;
     设计参数;
短句来源
     Scattering Parameter
     散射参数
短句来源
     Ion-aided Coating Technique
     离子辅助镀膜
短句来源
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  deposition parameters
The effect of two deposition parameters (the substrate temperature and the deposition rate) on the film morphology, the film crystallinity, and the density of nuclei growing on a (0001) sapphire substrate are investigated.
      
It is found that as the energy-deposition parameters are increased, these objects increasingly resemble ball lightning.
      
Optical spectroscopy was used to study the high-energy region of the fundamental absorption edge in films of amorphous hydrogenated carbon obtained for various deposition parameters.
      
A correlation is established between the slope of the absorption edge, the deposition parameters, and the structure of the films.
      
By optimizing the deposition parameters the device quality μc-Si:H films have been achieved with a high deposition rate of 7.8 ?/s at a high pressure.
      
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Multi - coating availably solves the problem of matching between basic material and coating, but the technology of multi - coating seriously affects the adhesion. This paper studies the adhesion between base* electroplating and ion plating by methed combining quality statistical data and technical analysis. The auther approves that the blisteres are mainly resulted from using brightener in electroplating and are related to cleaning and the parameters of ion plating. The fault of shown base is contradictory with...

Multi - coating availably solves the problem of matching between basic material and coating, but the technology of multi - coating seriously affects the adhesion. This paper studies the adhesion between base* electroplating and ion plating by methed combining quality statistical data and technical analysis. The auther approves that the blisteres are mainly resulted from using brightener in electroplating and are related to cleaning and the parameters of ion plating. The fault of shown base is contradictory with the blisteres, but there exists the same problem of adhesion. The faults are mainly resulted from cleaning. Meanwhile they are related to electroplating and the parameters of ion plating. In production of multi-coating by ion plating the statistical quality control must he strenthened.

复合涂层可有效地解决基膜的匹配性,但多层涂镀工艺对涂层间附着性等质量问题有重要影响.采用生产质量统计数据和技术分析相结合的方法.对基材、水电镀层、离子镀的复合涂层间产生起泡和露白等附着性问题进行了研究,认为起泡主要因水电镀采用光亮剂而引起,同时与其它工艺如清洗、真空镀膜参数有关;而露白现象则与起泡现象相矛盾.但同属附着性问题,它主要与清洗质量关系密切,同时与水电镀工艺和真空镀膜参数相关.离子镀复合涂层工艺必须加强生产统计质量管理.

This paper introduces the formation of boron nitride(BN) thin films on Si substrates by ion beam enhanced deposition(IBED) and the experimental study of the effect of deposition parameters on the cubic boron nitride(c BN) content in the BN films. The effect of the bombardment ion beam density, the deposition rate, the percentage of argon in the bombardment gas and the substrate temperature was investigated. The thin films were analyzed by infrared spectroscopy(IR). The results showed that:(1) The content of...

This paper introduces the formation of boron nitride(BN) thin films on Si substrates by ion beam enhanced deposition(IBED) and the experimental study of the effect of deposition parameters on the cubic boron nitride(c BN) content in the BN films. The effect of the bombardment ion beam density, the deposition rate, the percentage of argon in the bombardment gas and the substrate temperature was investigated. The thin films were analyzed by infrared spectroscopy(IR). The results showed that:(1) The content of c BN in the BN films bombarded by the ion beam with a given energy and density varied with deposition rate and there was an optimum value of deposition rate. (2) When the ion beam density increased, the value of optimum deposition rate also increased. (3) The deposition rate decreased with increasing the bombardment ion beam density and the percentage of argon in the bombardment gas. (4) When the substrate temperature was below 400℃, the c BN percentage in the films increased with enhancing the substrate temperature.

本文介绍用离子束增强沉积(IBED)法在硅片上制备氮化硼(BN)薄膜及镀膜参数对膜中立方氮化硼(c-BN)含量的影响的试验研究,主要研究轰击离子束密、镀膜速率、轰击束中氩气的含量及衬底温度的影响。用红外(IR)谱对膜进行了分析,结果指出:(1)在给定的轰击束能量与束密下氮化硼薄膜中立方相的含量是随镀膜速率而变化的,且存在一个最佳镀膜速率值;(2)提高离子轰击束密,则此最佳镀膜速率值也相应增大;(3)镀膜速率又是随轰击束密及轰击束中氩气含量的增大而减小的;(4)衬底温度在400℃以下时,膜中c-BN相的含量随温度提高而增加。

Several technical schemes of constructing a injection kicker magnet and its vacuum chambers are firstly reviewed and discussed. A method of using ferrite kicker magnets with ceramic chambers inside is adopted in HLS new injection system. The inner surfaces of these ceramic chambers are coated with a metallic layer to meet the requirements of both the penetration of pulse magnetic field and small beam coupling impedance. The loss factors and wake fields of the ceramic chambers with and without coating are measured....

Several technical schemes of constructing a injection kicker magnet and its vacuum chambers are firstly reviewed and discussed. A method of using ferrite kicker magnets with ceramic chambers inside is adopted in HLS new injection system. The inner surfaces of these ceramic chambers are coated with a metallic layer to meet the requirements of both the penetration of pulse magnetic field and small beam coupling impedance. The loss factors and wake fields of the ceramic chambers with and without coating are measured. Broadband impedance parameters of these ceramic chambers are obtained by fitting the measured data. Combining the results of magnetic field studies, an improved coating scheme is proposed for the new ceramic chambers.

介绍了电子储存环注入凸轨冲击磁铁及其真空室常采用的几种技术方案。合肥电子储存环新凸轨注入系统选择了铁氧体磁铁内置陶瓷真空室的方式。为了同时满足脉冲磁场穿透性能及束流耦合阻抗的要求 ,陶瓷真空室的内壁须镀 1层金属薄膜。对已制备的镀膜和无镀膜陶瓷真空室尾场函数及损失因子进行了测量 ,并对结果进行了拟合计算 ,得到陶瓷真空室宽带阻抗模型的有关参数。结合已进行的脉冲磁场穿透性能的结果 ,确立了改进的镀膜参数

 
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