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曝光     
相关语句
  exposure
     DOUBLE EXPOSURE INTERFEROMETRY USING MEMORY EFFECT OF THE PHOTOCONDUCTIVE THERMOPLASTIC FILM
     利用记忆效应在光导热塑片上进行二次曝光
短句来源
     Application of double exposure laser holography——nondestructive testing of tyres with the way of vacuum and increased pressure
     应用双曝光激光全息照相术—真空加载法进行轮胎无损检验
短句来源
     Accurate Control and Measurement of Exposure Time in a Large Aperture Shutter for Optical Calibrated Device of Laser Energy Calorimeter
     激光能量计光校准装置中大口径快门曝光时间的精确控制与测量
短句来源
     Vacuum Ultraviolet Spectroanalysis of High-ailoy steel by Timing Controlled Exposure
     真空紫外区定时曝光法分析高组份合金
短句来源
     X-ray automatic exposure control
     X线自动曝光控制
短句来源
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  lithography
     Research of SU-8 Resist Lithography Using Ultraviolet Laser
     紫外激光曝光光刻SU-8胶的工艺研究
短句来源
     DY2001A Electron Beam Lithography System (EBLS) is developed as a practical miniature EBLS.
     DY2001A型电子束曝光机是作为实用化的小型曝光系统而研制的。
短句来源
     A Study of Electron Beam Lithography on UV3 Positive Resists
     电子束曝光UV3正性抗蚀剂的工艺研究
短句来源
     Based on Grune formula, the dependence of electrons'penetration depth on different electron energy has been analyzed theoretically, and an experimental lithography investigation has been carried out on homemade resist Suzhou-2 in SDS-2 Electron Beams System at 5 keV, 10 keV,15 keV, 20 keV, 25 keV, 30 keV.The relation of energ/etching depth is obtained.
     根据Grune公式就电子束能量对抗蚀剂刻蚀深度的影响进行了理论分析,并在SDS-2电子束曝光机上分别采用5keV、10keV、15keV、20keV、25keV、30keV等能量的电子束对国产胶苏州2号进行了曝光实验,得出了能量/刻蚀深度关系曲线。
短句来源
     Software System Design of 2001A Electron Beam Lithography System
     DY2001A型电子束曝光机软件系统设计
短句来源
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  exposing
     This paper describes the design of a new type of working table of photolithographic equipment, with the exposing area up to 356 mm ×356 mm, the alignment accuracy of ±2 μm, and the exposing clearance of 0~25 μm.
     论述曝光面积达356mm×356mm,套刻精度为±2μm,接近式(0~251μm)液晶显示面版光刻机的新型工作台设计。
短句来源
     This paper describes the design on a new type of working table of photolithographic equipment,which is possessed of the exposing area up to 336. 5 mm ×336. 5 mm,the alignment accuracy of ± 2 μm, and the exposing clearance of 0~25 μm.
     论述曝光面积可达335.6mm×355.6mm(4″×14″),套刻精度为±2μm,接近式(0~25μm)液晶面版光刻机的新型工作台设计。
短句来源
     Methods 26 patients with lung metastasis were selected to scan by CT with four kinds of different protocols , including 195 mAs /6.5mm ( exposing dose/scan thickness ) ,195 mAs/3.2 mm,50 mAs/3.2 mm,30 mAs/3.2 mm in all,then the number,size,position of nodules detected with dfferent dose were calculated respectivly.
     方法 选择肺转移瘤 2 6例 ,分别应用 195mAs / 6.5mm(剂量 /层厚 ) ,195mAs/ 3 .2mm ,5 0mAs/ 3 .2mm ,3 0mAs/ 3 .2mm 4种方案扫描肺部 ,统计在不同曝光剂量条件下检出的肺结节的数量、大小、部位。
短句来源
     Results The total number of lung nodules detected with 195 mAs/3.2 mm,50 mAs/3.2 mm and 30 mAs/3.2 mm were no significant difference,but when classificated according to their size,as the exposing dose decreased,the number of nodules under 2 mm or 5 mm was detected decreasingly,morever,the noise of image increased.
     结果  195mAs/ 3 .2mm ,5 0mAs/ 3 .2mm ,3 0mAs/ 3 .2mm组之间的肺结节检出数在总体上无显著差异 ,但按肺结节大小分类分析时 ,随曝光剂量的降低 ,对 <2mm和 5mm的肺结节的检出数有所减少 ,并且低剂量下 ,图像噪声明显增加。
短句来源
     To establishing optimum exposing time of the X-ray film, gradient exposing time, namely 7.5, 15, 30, 60 and 120minute, also were applied.
     设置7.5、15、30、60、120分钟X胶片曝光时间梯度,筛选最佳曝光时间;
短句来源
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  exposal
     The parameters of disqualification are: electrical current(52.8%),exposal time(35.9%),voltage(27.%).
     不合格参数主要为:管电流(占52.8%)、曝光时间(占35.9%)和管电压(占27.8%)。
短句来源
     with fixed exposal time and increasing laser power, the depth of exposal increases linearly and can be express by the equation: y =40. 5x0.151y = 0 .238x+44.454. Finally, microstructures of SU-8 photoresist with difference thickness are manufactured according to previous experimental results.
     当固定曝光时间,不断增加曝光功率时,曝光深度程线性趋势增加,可表示为y =40. 5x0.151y = 0 .238x+44.454。
短句来源
     With the third harmonic 355nm Nd:YAG laser as the exposal source, the lithography of SU-8 photoresist is studied.
     本文采用波长为355nm的三倍频Nd:YAG激光作为曝光光源,对SU-8光刻胶进行光刻研究。
短句来源
     Methods Choroidal neovascularization was induced in 20 Brown Norway (BN) rats (40 eyes) by diode laser (wavelength: 810 nm; exposal time: 0.1 second; facular diameter:100 μm; energy: 120 mW), and the rats were divided randomly into experimental and control group with 10 rats (20 eyes) in each group.
     方法应用半导体激光(波长810nm,曝光时间0.1s,光斑直径100μm,能量120mW)光凝诱导20只BrownNorway(BN)大鼠20只眼的脉络膜新生血管(CNV)模型。
短句来源
     Experimental Study on the Visual Adaptability under Low Lighting after Exposal
     曝光后低照度下视觉适应性的实验研究
短句来源
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  exposure
Their cytotoxic properties were determined by a 3-day continuous exposure MTT assay with murine melanoma B16 cells.
      
coli) and photo-bacteria were used as samples, the antibacterial effect of stainless steel was very weak, while the percentage of bacteria dying from exposure to metallic copper for 30 min was over 90%.
      
popularis increased markedly over the increase of the duration of exposure to salinity, and culminated after 28 days of salt stress.
      
Good control over the grating's reflectivity and the separation of the two Bragg wavelengths is enabled by adjusting the stretch, the length of the grating, and the exposure.
      
According to the percentage of damaged DNA with tail and its TL/D (tail length to diameter of nucleus) value, the relationship between DNA damage degree and heavy metal dose and exposure time was determined.
      
更多          
  lithography
Polyimide liquid crystal alignment layers prepared by soft-lithography
      
The fabrication process mainly includes lithography, sputtering, electroplating, etching, sacrifice-layer technology, etc.
      
Nanopositioning and Nonlinearity Compensation for Step Imprint Lithography Tool
      
A nano-scale alignment method for imprint lithography
      
A novel nano-scale alignment technique based on moiré signal for room-temperature imprint lithography in the submicron realm is proposed.
      
更多          
  exposing
Thin films of the hyperbranched azo polymers were used to fabricate surface-relief-gratings (SRGs) by exposing them to an interference pattern of Ar+ laser beam at modest intensities (150 mW/cm2).
      
S-Nitrosocompounds were not formed when exposing low-molecular-weight thiols to ultrasound in atmospheres of N2 or CO.
      
A relative channel monitoring stability of 1.2 × 10-3 was achieved upon exposing the spectrometer to a beam for a period of 100h.
      
The technique has been tested at the Iskra-5 facility by exposing Al and Fe targets to second-harmonic laser radiation.
      
The hepatitis B virus core antigen (HBcAg) is a promising protein carrier for exposing the epitopes of various human and animal pathogens.
      
更多          
  exposal
Under conditions of lacking or excessive exposal, the gray image may limit within the small scope.
      
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