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x射线反射谱
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  “x射线反射谱”译为未确定词的双语例句
     Chromium oxide films grown by molecular beam epitaxy on MgO(001) substrates were characterized by x_ray diffraction (XRD) and x_ray reflectivity (XRR) measurements.
     采用分子束外延技术 (MBE)在MgO(0 0 1)基板上沉积了氧化铬薄膜 ,并利用x射线衍射 (XRD)和x射线反射谱(XRR)对薄膜的晶体结构进行了表征 .
短句来源
     The curve was gotten that the reflective intensity changed with temperature. The experimental result was analyzed from theory. And last the conclusion was drawn that the reflective intensity of X-ray weakened with the temperature raising,but the sharpeness of lines did not lose with the temperature raising.
     由实验测出铝的X射线反射谱线的强度,得到其反射强度随温度变化的曲线,并从理论上对实验结果作了分析,得到了X射线反射强度随温度的增高而减弱,而谱线的锐度却不随温度升高而受到损失的结论.
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  相似匹配句对
     X ray Diffraction Spectrum of Heroin
     海洛因的X射线衍射
短句来源
     The x-ray spectra of hollow atoms
     空心原子的K-x射线
短句来源
     AN UNDERSTANDING OF ROENTGEN RAY'S LINE SPECTRUM
     对X射线标识的理解
短句来源
     X-ray Spectral Properties for Blazars
     Blazar的X射线性质(英文)
短句来源
     Electroreflectance Spectra of Schottky Barriers
     肖特基势垒的电反射
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  x-ray reflectivity
The characterization technique is a combination of x-ray reflectivity and x-ray diffraction in coplanar and noncoplanar arrangements.
      
The combined use of high-resolution x-ray diffraction and x-ray reflectivity has made it possible to reliably identify structural-parameter profiles for both the quantum well and the Mn delta layer.
      
A new experimental scheme for the measurement of the x-ray reflectivity R from a liquid-solid interface in the range of angles of total external reflection is proposed.
      
The interface and magnetic properties of sputter-deposited FeCoV/NiO(tNiO)/FeCoV trilayers were analyzed by X-ray reflectivity, bulk magnetization, and polarized neutron reflectivity measurements.
      
Investigation of nanometer-scale films using low angle X-ray reflectivity analysis in IPOE
      
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Si/SiO 2 superlattice structure was designed and prepared by rf magnetron sputtering technique. The high pure polycrystal Si was taken as sputtering target. SiO 2 film was obtained by using Ar+O 2 as sputtering atmosphere; Si film was obtained by using Ar as sputtering atmosphere; Si/SiO 2 superlattice structure was prepared by shutting off O 2 or openning O 2 repeatedly. The thicknesses of Si and SiO 2 layers were controlled by sputtering power or velocity of moving substrate in front of target....

Si/SiO 2 superlattice structure was designed and prepared by rf magnetron sputtering technique. The high pure polycrystal Si was taken as sputtering target. SiO 2 film was obtained by using Ar+O 2 as sputtering atmosphere; Si film was obtained by using Ar as sputtering atmosphere; Si/SiO 2 superlattice structure was prepared by shutting off O 2 or openning O 2 repeatedly. The thicknesses of Si and SiO 2 layers were controlled by sputtering power or velocity of moving substrate in front of target. The periodic structure of superlattice was demonstrated by TEM and low angle X ray reflection spectra. The optical transparence spectra showed that the optical absorption edge shifted to shorter wavelength when thickness of Si layer was decreased. Laser Ramman spectra of the samples before and after annealing gave the evidence of existence of Si quantum dots in Si layer and the size of Si quantum dots. Blue green ACEL from Si/SiO 2 superlattice with double insulating layers structure was obtained for the first time. There were several emission bands in EL spectrum. When the thickness of Si layer is decreased, the intensity of the shorter wavelength emission band increased quickly.

设计并用磁控溅射方法制备了非晶 Si/Si O2 超晶格结构 ,以高纯多晶 Si为靶材 ,当以 Ar+O2 为溅射气氛时 ,得到 Si O2 膜 ,仅以 Ar为气氛时 ,得到 Si膜。重复地开和关 O2 气 ,便交替地得到 Si O2 和 Si膜。衬底在靶前往返平移 ,改变平移的速度或者改变溅射的功率 ,可以控制膜的厚度。通过透射电镜的照片可以看出 Si O2 和 Si膜具有均匀的周期结构 ,用低角 X-射线反射谱表征了超晶格的周期结构和各层的厚度。透射光谱表明 ,光学吸收边随 Si层厚度的减小向短波方向移动 ;从退火前和退火后样品的喇曼光谱的变化可判断硅量子点的存在及其尺寸。利用双绝缘层的交流电致发光器件结构 ,首次获得非晶 Si/Si O2 超晶格的蓝绿色电致发光 ,在发射光谱中存在几个分立的发光谱带 ,随 Si层厚度的减小 ,短波发光谱带的相对强度增加。

Chromium oxide films grown by molecular beam epitaxy on MgO(001) substrates were characterized by x_ray diffraction (XRD) and x_ray reflectivity (XRR) measurements. The absence of random oriented peaks in the θ—2θ spectra indicated that the thin films were a single phase. Reciprocal space mapping (2θ/ω-Δψ) revealed a (3×1) rectangular superstructure along MgO(110) plane, resulting in a body-centred orthorhombic unit cell with a=0.8940±0.0003 nm, b=0.298 nm, c=0.3897±0.0002 nm, measured by conventional reciprocal...

Chromium oxide films grown by molecular beam epitaxy on MgO(001) substrates were characterized by x_ray diffraction (XRD) and x_ray reflectivity (XRR) measurements. The absence of random oriented peaks in the θ—2θ spectra indicated that the thin films were a single phase. Reciprocal space mapping (2θ/ω-Δψ) revealed a (3×1) rectangular superstructure along MgO(110) plane, resulting in a body-centred orthorhombic unit cell with a=0.8940±0.0003 nm, b=0.298 nm, c=0.3897±0.0002 nm, measured by conventional reciprocal space mapping (2θ/ω vs. Δω) and θ—2θ scans. -scan showed two domains apart by 90° with one domain aligned to the MgO substrate as: a∥ MgO(110), c∥ MgO(001). The electron density of the film deduced by the unit cell volume was in good agreement with that from the XRR fittings, indicating that the chemical component of the films were Cr_2O_3. The crystal structure of the films were equivalent to a NaCl-type CrO with 1/3 Cr atoms vacancy along MgO(110) direction in an ordered way.

采用分子束外延技术 (MBE)在MgO(0 0 1)基板上沉积了氧化铬薄膜 ,并利用x射线衍射 (XRD)和x射线反射谱(XRR)对薄膜的晶体结构进行了表征 .θ— 2θ扫描和倒易空间图 (RSM)揭示出薄膜为单相c轴外延生长 ,晶体结构为体心正交 ,晶胞常数a ,b ,c分别为 0 894 0± 0 0 0 0 3,0 2 98± 0 0 0 0 2和 0 3897± 0 0 0 0 2nm .扫描表明薄膜在面内具有 90°孪晶 ,取向关系为a∥MgO〈110〉 ,c∥MgO(0 0 1) .XRR谱测得薄膜的电子密度为 135 0± 2 0nm- 3,与由晶胞体积计算得到的电子密度非常吻合 ,表明薄膜的化学成分为Cr2 O3 该物质在结构上等同于沿MgO〈110〉方向存在着1 3有序的Cr空位 ,具有NaCl结构的CrO

 
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