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  x-ray reflectivity
The characterization technique is a combination of x-ray reflectivity and x-ray diffraction in coplanar and noncoplanar arrangements.
      
The combined use of high-resolution x-ray diffraction and x-ray reflectivity has made it possible to reliably identify structural-parameter profiles for both the quantum well and the Mn delta layer.
      
A new experimental scheme for the measurement of the x-ray reflectivity R from a liquid-solid interface in the range of angles of total external reflection is proposed.
      
The interface and magnetic properties of sputter-deposited FeCoV/NiO(tNiO)/FeCoV trilayers were analyzed by X-ray reflectivity, bulk magnetization, and polarized neutron reflectivity measurements.
      
Investigation of nanometer-scale films using low angle X-ray reflectivity analysis in IPOE
      
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  x-ray reflectivity
The characterization technique is a combination of x-ray reflectivity and x-ray diffraction in coplanar and noncoplanar arrangements.
      
The combined use of high-resolution x-ray diffraction and x-ray reflectivity has made it possible to reliably identify structural-parameter profiles for both the quantum well and the Mn delta layer.
      
A new experimental scheme for the measurement of the x-ray reflectivity R from a liquid-solid interface in the range of angles of total external reflection is proposed.
      
The interface and magnetic properties of sputter-deposited FeCoV/NiO(tNiO)/FeCoV trilayers were analyzed by X-ray reflectivity, bulk magnetization, and polarized neutron reflectivity measurements.
      
Investigation of nanometer-scale films using low angle X-ray reflectivity analysis in IPOE
      
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Chromium oxide films grown by molecular beam epitaxy on MgO(001) substrates were characterized by x_ray diffraction (XRD) and x_ray reflectivity (XRR) measurements. The absence of random oriented peaks in the θ—2θ spectra indicated that the thin films were a single phase. Reciprocal space mapping (2θ/ω-Δψ) revealed a (3×1) rectangular superstructure along MgO(110) plane, resulting in a body-centred orthorhombic unit cell with a=0.8940±0.0003 nm, b=0.298 nm, c=0.3897±0.0002 nm, measured by conventional reciprocal...

Chromium oxide films grown by molecular beam epitaxy on MgO(001) substrates were characterized by x_ray diffraction (XRD) and x_ray reflectivity (XRR) measurements. The absence of random oriented peaks in the θ—2θ spectra indicated that the thin films were a single phase. Reciprocal space mapping (2θ/ω-Δψ) revealed a (3×1) rectangular superstructure along MgO(110) plane, resulting in a body-centred orthorhombic unit cell with a=0.8940±0.0003 nm, b=0.298 nm, c=0.3897±0.0002 nm, measured by conventional reciprocal space mapping (2θ/ω vs. Δω) and θ—2θ scans. -scan showed two domains apart by 90° with one domain aligned to the MgO substrate as: a∥ MgO(110), c∥ MgO(001). The electron density of the film deduced by the unit cell volume was in good agreement with that from the XRR fittings, indicating that the chemical component of the films were Cr_2O_3. The crystal structure of the films were equivalent to a NaCl-type CrO with 1/3 Cr atoms vacancy along MgO(110) direction in an ordered way.

采用分子束外延技术 (MBE)在MgO(0 0 1)基板上沉积了氧化铬薄膜 ,并利用x射线衍射 (XRD)和x射线反射谱(XRR)对薄膜的晶体结构进行了表征 .θ— 2θ扫描和倒易空间图 (RSM)揭示出薄膜为单相c轴外延生长 ,晶体结构为体心正交 ,晶胞常数a ,b ,c分别为 0 894 0± 0 0 0 0 3,0 2 98± 0 0 0 0 2和 0 3897± 0 0 0 0 2nm .扫描表明薄膜在面内具有 90°孪晶 ,取向关系为a∥MgO〈110〉 ,c∥MgO(0 0 1) .XRR谱测得薄膜的电子密度为 135 0± 2 0nm- 3,与由晶胞体积计算得到的电子密度非常吻合 ,表明薄膜的化学成分为Cr2 O3 该物质在结构上等同于沿MgO〈110〉方向存在着1 3有序的Cr空位 ,具有NaCl结构的CrO

 
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