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trimming
相关语句
  微调
    Utilization of Ar + laser for resistance trimming
    Ar~+激光器用于电阻微调的研究
短句来源
    Application of Laser Trimming to the Research and Manufacture of Waveguide Devices
    激光微调在光通讯波导器件研制中的应用
短句来源
    The Precision Control During Chip Resistor Laser Trimming
    片式电阻激光微调过程中的调阻精度控制
短句来源
    A Simple Trimming Method Used in Power IC
    一种用于集成电路的片上微调方法
短句来源
    The reason is that firstly, input stage adopts two key techniques: Bias-Current -Cancellation Technique, Offset Trimming Techniques.
    同时考虑了输入级的设计,采用基流自举补偿技术和偏置微调技术来分别降低偏置电流和失调电压。
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  “trimming”译为未确定词的双语例句
    High Speed 12-Bit Digital-to-Analog Converters Without Laser Trimming
    不用激光修调的高速12位D/A转换器
短句来源
    Application of Laser on IC Trimming
    激光用于集成电路调阻
短句来源
    Laser Functional Trimming Technique on HIC
    混合集成电路激光功能调值技术
短句来源
    This paper investigates the trimming method by the shorter wavelength laser and compares the result with traditional 1 μm wavelength laser-trimming technology.
    本文研究了用更短波长的激光进行电阻修调,并将结果与传统的1m波长的修调技术作了比较。
    Adaptive correction of multi-range measuring errors of laser resistor trimming machine
    激光调阻机多档测量误差的软件自适应校正
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  trimming
Emphasis is placed on the determination of the trimming angles of attack for different positions of the center of rotation and the static and dynamic stability coefficients (the model oscillation damping coefficient).
      
A method for sensitivity trimming during testing of welds by the bottom signal is recommended.
      
Use of laser trimming for the development of a project for accuracy-normalization of the resistance of resistors in hybrid integ
      
The possibilities for laser trimming are studied, the disadvantages of this method are revealed, and the ways of developing this approach on the basis of computer-aided design and modeling are proposed.
      
Although, profile machining is very essential for making trimming and flange dies, it seldom brought into focus.
      
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The state-of-the-arts of reactive ion etching (R1E) is reviewed with 71 references. The mechanism of RLE is briefly described. The etching directionality, selectivity, uniformity and reproducibility, the detection of the end-point,the radiation damage and contamination etc. are discussed. The RIE technique of various semiconductors, metals and dielectrics are tabulated. The new applications of RIE such as the cleaning, surface treatment and the frequency trimming of SAW devices...

The state-of-the-arts of reactive ion etching (R1E) is reviewed with 71 references. The mechanism of RLE is briefly described. The etching directionality, selectivity, uniformity and reproducibility, the detection of the end-point,the radiation damage and contamination etc. are discussed. The RIE technique of various semiconductors, metals and dielectrics are tabulated. The new applications of RIE such as the cleaning, surface treatment and the frequency trimming of SAW devices are alsopresented.

本文综述了反应离子刻蚀技术的概况,引用了文献71篇。对反应离子刻蚀的机理作了简单介绍,并对刻蚀的方向性、选择性、均匀性和重复性,刻蚀终点的检测以及辐射损伤和污染等问题进行了讨论。列举了各种半导体金属和电介质材料的反应离子刻蚀方法以及这种技术在清洗表面加工及声表面波频率微调等方面的应用。

The slale-of-crts of the plasma chemislry is reviewed in the paper. Besides the fabricatiori of the fine-line pattern,the reactive ion etching can be used for the cleaning and surface treatmenl of electronic malerials, the frequency trimming of the narrow-band SAW devices etc.The plasma development, anodization , polym-erization and PCVD are discussed briefly.By virtue of various salient features revealed inherently by these iow-temperature plasma technique such asenergy-saving, material-saving,contaminalion...

The slale-of-crts of the plasma chemislry is reviewed in the paper. Besides the fabricatiori of the fine-line pattern,the reactive ion etching can be used for the cleaning and surface treatmenl of electronic malerials, the frequency trimming of the narrow-band SAW devices etc.The plasma development, anodization , polym-erization and PCVD are discussed briefly.By virtue of various salient features revealed inherently by these iow-temperature plasma technique such asenergy-saving, material-saving,contaminalion reducing and lower cost,a broad diversity of new applications, have been devited. Undoubtly, this is a promising technique for the solid state electronics.

本文回顾了低温等离子体技术的现况,介绍了反应离子刻蚀在材料表面加工、清洗及SAW窄带器件调频等方面的应用.本文还对等离子体显影、阳极化、聚合及PCVD等作了简要讨论.因为低温等离子体技术具有省能、省料、污染少、设备简单等优点,其应用将日益广泛,这是一种对固体电子学有重要意义的技术.

Traditional integrated 12-bit digital-to-analog converters require the use of precise thin-film resistor networks and laser trimming of the resistors. A sectional design technique is described in the paper, which. combined with the conventional high-speed bipolar digital IC technology, can ensure the monotonicity of D-A converters by using diffused resistors,eliminating the need for laser trimming. By using this technique .more uniform step size has been achieved than 12-bit D-A converters with laser...

Traditional integrated 12-bit digital-to-analog converters require the use of precise thin-film resistor networks and laser trimming of the resistors. A sectional design technique is described in the paper, which. combined with the conventional high-speed bipolar digital IC technology, can ensure the monotonicity of D-A converters by using diffused resistors,eliminating the need for laser trimming. By using this technique .more uniform step size has been achieved than 12-bit D-A converters with laser trimmed R-2R thin-film resistor networks. The requirement for the resistor accuracy is elaxed by a factor of 8,compared with that for R-2R resistor networks. The settling time for the converter is 80~ 100ns since the configuration of an ECL circuit is adopted for its internal structure. which features fast operating speed.

传统的集成12位D/A转换器要求用精密的薄膜电阻网络和电阻的激光修调技术。本文介绍的分段设计技术只需要采用常规的高速双极数字IC工艺,采用扩散电阻方法,不需要微调技术,就能保证其D/A的单调性。它比用激光修调的R—2R薄膜电阻网络结构的12位D/A转换器具有更均匀的台阶尺寸,其电阻的精度要求也比后者放宽了8倍;由于内部采用了ECL电路的结构形式,工作速度快,其建立时间在80~100ns。

 
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