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hot filament chemical
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  热丝cvd
     In the present work, diamond thin films were deposited on the cobalt-cemented tungsten carbide (WC-6%Co and WC-3%Co) by Hot Filament Chemical Vapor Deposition (HFCVD).
     本研究采用热丝CVD法在YG3硬质合金(WC-3%Co)和YG6硬质合金(WC-6%Co)基体上沉积了金刚石薄膜。
短句来源
     Intrinsic stress in diamond films growth by hot filament chemical vapor deposition was studied as a function of CH 4 concentration (0 4%~1 2%) and growth temperature (800~1000 ℃).
     研究了热丝CVD法金刚石薄膜本征内应力随甲烷的体积分数(04%~12%)、生长温度(800℃~1000℃)等生长工艺参数的变化关系。
短句来源
     C N thin films have been deposited on si(111) substrate by hot filament Chemical vapour deposition in gas mixture of methane、nitrogen and hydrogen.
     用热丝 CVD法 ,以甲烷、氮气和氢气为气源 ,在 Si( 1 1 1 )衬底上沉积了C- N薄膜。
短句来源
     Three sets of Co-eemented tungsten carbide (94 wt.%WC-6wt.%Co) blades with different average grain size (0.5, 1.5 and 3 μm) were used as substrates placed in the electron aided hot filament chemical vapor deposition (EACVD) reactor to fabricate diamond thin films.
     采用电子增强热丝CVD法,在三种不同WC晶粒度的硬质合金衬底表面(牌号为YG6,晶粒度分别为0.5,1.5和3μm)上涂覆一层金刚石薄膜。
     Diamond films have been synthesized by hot filament chemical vapordeposition(CVD)method on the WC Co substrate.
     在硬质合金WC—Co基体上,用热丝CVD法,人工合成出金刚石薄膜。
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  “hot filament chemical”译为未确定词的双语例句
     Nanocrystalline SiC films have been synthesized on Si(111) substrate by hot filament chemical vapor deposition(HFCVD) technique with CH4 and SiH4 as reaction gases.
     采用热丝化学气相沉积(HFCVD)技术以甲烷(CH4)和硅烷(SiH4)作为源反应气体在Si(111)衬底上合成了纳米晶态SiC薄膜。
短句来源
     Diamond film was deposited on the ceramic substrates of Si_3N_4, AIN, and sialon by hot filament chemical vapor deposition (HFCVD).
     用热丝法在Si_3N_4,AlN,sialon陶瓷基材上沉积了金刚石薄膜。
短句来源
     (110)&(100) Texture diamond films were deposited on cemented carbide(WC-6%Co)substrate by Hot filament chemical vapor deposition (HFCVD), using the gas mixture of methane and hydrogen.
     以CH4和H2为反应气体,用热丝化学气相沉积(HFCVD)法在YG6(WC-6%Co)硬质合金基体上沉积了具有(110)和(100)织构的金刚石薄膜。
短句来源
     In this paper,the microstructure and film-substrate interface of diamond film deposited on Si_3N_4-SiC_w,AlN ceramics by hot filament chemical vapor deposition(HFCVD)were investigated by using transition electron microscopy.
     用透射电子显微镜研究了用热丝法在Si_3N_4-SiC_w,AlN陶瓷基材上生长的金刚石薄膜的显微结构和金刚石膜-基片界面。
短句来源
     β C 3N 4 research is one of the hottest topics in condensed matter physics and materials sciences. By using bias hot filament chemical vapor deposition,for the first time,we have synthesized β C 3N 4 single crystasl 1 3μm in length and 300 500nm in cross section. Its lattice parameters are a =6 24 and c= 2 36 with N∶C=1 30 1 40.
     βC3N4的研究是近年来凝聚态物理和材料科学研究的热门课题之一.我们利用偏压辅助热解化学气相沉积方法,首次获得长1—3μm,横截面尺寸在300—500nm的βC3N4六棱体.其晶格常数a=624和c=236.N∶C=130—140.
短句来源
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  相似匹配句对
     HOT
     热报!
短句来源
     R & D of Miniature Hot Filament CVD System
     热丝化学气相沉积系统的小型化研究与开发
短句来源
     The Accurate Replacement of the Filament Winding of the Colour Television HOT
     彩电行输出变压器灯丝绕组的准确置换
短句来源
     HOT POINT
     数位热点
短句来源
     Nucleation of Diamond by Biased Hot Filament Chemical Vapor Deposition
     负衬底偏压热灯丝CVD金刚石膜成核的研究
短句来源
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  hot filament chemical
We studied the use of carbon nanotubes as a seeding layer for the nucleation of diamond on Si (100) substrate by using a hot filament chemical vapor deposition (HFCVD) system.
      
Nucleation of diamond over nanotube coated Si substrate using hot filament chemical vapor deposition (CVD) system
      
A study of diamond synthesis by hot filament chemical vapor deposition on Nc coatings
      
Depositions of hot filament chemical vapor-deposited diamond on cobalt-cemented tungsten carbide (WC-Co) rotary cutting dental burs are presented.
      
For biomedical applications, it is highly desirable to be able to deposit smooth adherent diamond films on various complex-shaped substrates using the hot filament chemical vapor deposition technique (HFCVD).
      
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In the present paper, the relation between diamond nucleation density and synthesis conditions is studied for the diamond thin film synthesized by hot filament chemical vapour deposition method. The experimental results show that the state of substrate surface has the most evident effects on diamond nucleation density. The substrate temperature, filament temperature and distance from filament to substrate surface also have evident effects on diamond nucleation density.

本文研究了用热灯丝化学气相沉积方法在单晶硅衬底上制备金刚石薄膜时其成核密度与制备条件的关系。结果表明,衬底表面状态、衬底温度、灯丝温度、灯丝与衬底表面间距离等对金刚石成核密度有明显的影响,且表面状态的影响最大。

The present paper reports the photoluminecence feature of diamond thin film synthesized on Mo, Si and WC substrates by hot filament Chemical Vapour Deposition method.

本文研究了用热灯丝化学气相沉积方法在硅、钼和碳化钨衬底上制备的金刚石膜的光致发光特性。

In this paper,diamond film had been synthesized on Si_3N_4+SiC composite ce-ramics and sialon ceramics by HFCVD(hot filament chemical vapor deposition).The obtaindfilms were analysized by X-ray diffraction,Raman spectrometer,scanning electron microscopy,profilograph and scratch tester.The adhesion of the film was measured and the effective actor ofthe adhesion between the film and substrate was tentativly studied.

本文用热丝 CVD 法在氮化硅复合陶瓷及 Sialon 陶瓷上沉积了金刚石薄膜,用 X 射线衍射、拉曼光谱、扫描电子显微镜、表面形貌仪、划痕实验仪对所形成的膜及基体进行了分析。初步探讨了膜与基材的附着性影响因素。

 
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