助手标题  
全文文献 工具书 数字 学术定义 翻译助手 学术趋势 更多
查询帮助
意见反馈
   hot filament chemical 在 工业通用技术及设备 分类中 的翻译结果: 查询用时:0.474秒
图标索引 在分类学科中查询
所有学科
工业通用技术及设备
无线电电子学
金属学及金属工艺
材料科学
化学
物理学
更多类别查询

图标索引 历史查询
 

hot filament chemical
相关语句
  热丝cvd
    In the present work, diamond thin films were deposited on the cobalt-cemented tungsten carbide (WC-6%Co and WC-3%Co) by Hot Filament Chemical Vapor Deposition (HFCVD).
    本研究采用热丝CVD法在YG3硬质合金(WC-3%Co)和YG6硬质合金(WC-6%Co)基体上沉积了金刚石薄膜。
短句来源
    Diamond films have been synthesized by hot filament chemical vapordeposition(CVD)method on the WC Co substrate.
    在硬质合金WC—Co基体上,用热丝CVD法,人工合成出金刚石薄膜。
短句来源
    In this paper,diamond film had been synthesized on Si_3N_4+SiC composite ce-ramics and sialon ceramics by HFCVD(hot filament chemical vapor deposition). The obtaindfilms were analysized by X-ray diffraction,Raman spectrometer,scanning electron microscopy,profilograph and scratch tester.
    本文用热丝 CVD 法在氮化硅复合陶瓷及 Sialon 陶瓷上沉积了金刚石薄膜,用 X 射线衍射、拉曼光谱、扫描电子显微镜、表面形貌仪、划痕实验仪对所形成的膜及基体进行了分析。
短句来源
    The procedure and technology of Re as interlayer for depositing diamond film on the ferrous alloys substrate were studied by using hot filament chemical vapor deposition(CVD).
    本文采用热丝 C V D 法在以 Cu/ Re 镀膜为过渡层的铁衬底上沉积金刚石薄膜,研究了以 Re 作为铁衬底上沉积金刚石膜的过渡层的制备工艺及其对沉积金刚石膜的影响。
短句来源
    The effects of the pretreatment of cutting tools substrate on the growth rate of diamond film were studied by using electron assisted hot filament chemical vapor deposition.
    在电子辅助热丝CVD中,研究刀具预处理对金刚石薄膜生长速度的影响。
短句来源
  “hot filament chemical”译为未确定词的双语例句
    MgB_2 superconducting films were in situ grown onsapphire substrates by hot filament chemical vapor deposition.
    用HFCVD法在蓝宝石基片上原位生长了MgB_2超导薄膜。
短句来源
    Diamond film was deposited on the ceramic substrates of Si_3N_4, AIN, and sialon by hot filament chemical vapor deposition (HFCVD).
    用热丝法在Si_3N_4,AlN,sialon陶瓷基材上沉积了金刚石薄膜。
短句来源
    In this paper,the microstructure and film-substrate interface of diamond film deposited on Si_3N_4-SiC_w,AlN ceramics by hot filament chemical vapor deposition(HFCVD)were investigated by using transition electron microscopy.
    用透射电子显微镜研究了用热丝法在Si_3N_4-SiC_w,AlN陶瓷基材上生长的金刚石薄膜的显微结构和金刚石膜-基片界面。
短句来源
    Abstract  The nucleation and initial growth of diamond on Si(100) by biased hot filament chemical vapor deposition have been studied by scanning electron microscopy,Raman spectra,infrared absorption spectra and X ray photoelectron spectra. After bias pretreated for 15min at -300V and 100mA,the nucleation density was found to be over 10 10 cm -2 on mirror polished Si and was inhomogeneous,which can be divided into three regions on Si surface:A,cones at the edges;
    利用扫描电子显微镜、Raman谱和X射线光电子能谱,研究了Si衬底上热灯丝CVD金刚石膜的核化和早期生长.在-300V和100mA条件下预处理15min,镜面抛光的Si(100)表面上金刚石核密度超过了109cm-2,但是核的分布极不均匀且可分为三个区域:A区,边缘处以锥体为主;
短句来源
    Using hot filament chemical vapor deposition (HFCVD) method, a diamond near infrared antireflective filter window (model DIFW 1, working wavelength was 1 3~1 8 μm) was successfully fabricated.
    采用热灯丝化学气相沉积方法成功地制备出金刚石近红外增透滤光保护窗口 ,其工作波长为 1.3~ 1.8μm,具有良好的光学透过性和优良的物理化学性质。
短句来源
更多       
查询“hot filament chemical”译词为用户自定义的双语例句

    我想查看译文中含有:的双语例句
例句
为了更好的帮助您理解掌握查询词或其译词在地道英语中的实际用法,我们为您准备了出自英文原文的大量英语例句,供您参考。
  hot filament chemical
We studied the use of carbon nanotubes as a seeding layer for the nucleation of diamond on Si (100) substrate by using a hot filament chemical vapor deposition (HFCVD) system.
      
Nucleation of diamond over nanotube coated Si substrate using hot filament chemical vapor deposition (CVD) system
      
A study of diamond synthesis by hot filament chemical vapor deposition on Nc coatings
      
Depositions of hot filament chemical vapor-deposited diamond on cobalt-cemented tungsten carbide (WC-Co) rotary cutting dental burs are presented.
      
For biomedical applications, it is highly desirable to be able to deposit smooth adherent diamond films on various complex-shaped substrates using the hot filament chemical vapor deposition technique (HFCVD).
      
更多          


In this paper,diamond film had been synthesized on Si_3N_4+SiC composite ce-ramics and sialon ceramics by HFCVD(hot filament chemical vapor deposition).The obtaindfilms were analysized by X-ray diffraction,Raman spectrometer,scanning electron microscopy,profilograph and scratch tester.The adhesion of the film was measured and the effective actor ofthe adhesion between the film and substrate was tentativly studied.

本文用热丝 CVD 法在氮化硅复合陶瓷及 Sialon 陶瓷上沉积了金刚石薄膜,用 X 射线衍射、拉曼光谱、扫描电子显微镜、表面形貌仪、划痕实验仪对所形成的膜及基体进行了分析。初步探讨了膜与基材的附着性影响因素。

Diamond film was deposited on the ceramic substrates of Si_3N_4, AIN, and sialon by hot filament chemical vapor deposition (HFCVD). The process parameters were similar to those in the deposition of diamond film on single crystalline silicon wafer and the growth rate of diamond was 1 μm/h, which is slightly lower than that for silicon wafer. Formation of diamond was identified by using Raman spectroscopy and X-ray diffraction analysis and scanning electron microscopy. To evaluate the adhesion between the...

Diamond film was deposited on the ceramic substrates of Si_3N_4, AIN, and sialon by hot filament chemical vapor deposition (HFCVD). The process parameters were similar to those in the deposition of diamond film on single crystalline silicon wafer and the growth rate of diamond was 1 μm/h, which is slightly lower than that for silicon wafer. Formation of diamond was identified by using Raman spectroscopy and X-ray diffraction analysis and scanning electron microscopy. To evaluate the adhesion between the diamond film and the substrate, scratch testing has been used to measure the critical loading. The highest adhesion was obtained for Si_3N_4 and sialon substrates. It is shown also experimentally that the adhesion between the diamond film and the substrate decreases with the increase of thickness of the diamond film.

用热丝法在Si_3N_4,AlN,sialon陶瓷基材上沉积了金刚石薄膜。沉积参数与在单晶硅上沉积金刚石基本一致.沉积速率为1μm/h。用X射线衍射和Raman光谱检测了所形成的膜。用划痕实验估测膜基附着力。结果表明:在Si_3N_4和sialon陶瓷基材上附着力较好;随金刚石膜厚增长,膜基附着力下降。

In this paper,the microstructure and film-substrate interface of diamond film deposited on Si_3N_4-SiC_w,AlN ceramics by hot filament chemical vapor deposition(HFCVD)were investigated by using transition electron microscopy. The results show that there are a quantity of {111} twins, stacking faults and dislocations in the diamond films : the grain size of diamond on Si_3N_4- SiC_w, substrate is fine, and there are some strip crystal grains growing along the substrate surface. Interface study results manifest...

In this paper,the microstructure and film-substrate interface of diamond film deposited on Si_3N_4-SiC_w,AlN ceramics by hot filament chemical vapor deposition(HFCVD)were investigated by using transition electron microscopy. The results show that there are a quantity of {111} twins, stacking faults and dislocations in the diamond films : the grain size of diamond on Si_3N_4- SiC_w, substrate is fine, and there are some strip crystal grains growing along the substrate surface. Interface study results manifest that there are two kinds of nucleation styles on the film-substrate interface : the one no obvious interface layer, the diamond crystal grows as the cone shaped, some holes leaves between the crystal grains , the another there are obvious interface layer, they grows as the column shaped. Finally,it is pointed out that the increasing of the nucleation density is a method to increase the film to substrate adhesion.

用透射电子显微镜研究了用热丝法在Si_3N_4-SiC_w,AlN陶瓷基材上生长的金刚石薄膜的显微结构和金刚石膜-基片界面。结果表明,金刚石膜内有大量的(111)孪晶,堆垛层错和位错。Si_3N_4-SiC_w基材上的金刚石膜的晶粒细小,有沿基材表面的条纹状的晶粒生长。界面研究表明AlN基材上膜-基界面处有两种形核方式:无明显过渡层时,金刚石晶粒呈锥状生长,晶粒间留有孔洞;有界面过渡层时呈柱状生长。

 
<< 更多相关文摘    
图标索引 相关查询

 


 
CNKI小工具
在英文学术搜索中查有关hot filament chemical的内容
在知识搜索中查有关hot filament chemical的内容
在数字搜索中查有关hot filament chemical的内容
在概念知识元中查有关hot filament chemical的内容
在学术趋势中查有关hot filament chemical的内容
 
 

CNKI主页设CNKI翻译助手为主页 | 收藏CNKI翻译助手 | 广告服务 | 英文学术搜索
版权图标  2008 CNKI-中国知网
京ICP证040431号 互联网出版许可证 新出网证(京)字008号
北京市公安局海淀分局 备案号:110 1081725
版权图标 2008中国知网(cnki) 中国学术期刊(光盘版)电子杂志社