助手标题  
全文文献 工具书 数字 学术定义 翻译助手 学术趋势 更多
查询帮助
意见反馈
   plasma ash 的翻译结果: 查询用时:0.18秒
图标索引 在分类学科中查询
所有学科
更多类别查询

图标索引 历史查询
 

plasma ash
相关语句
  等离子灰化
     Photo resist removal following dry etching or high dose ion implantation conventionally employs solvents and acid, sometimes was preceded by a dry oxygen based plasma ash before.
     除去干刻或高剂量等离子注入后的光刻胶 ,一般是采用化学溶剂和酸类等湿刻法 ,以前有时采用干燥氧的等离子灰化法。
短句来源
  相似匹配句对
     plasma;
     血浆游离DNA ;
短句来源
     Plasma Etching
     等离子体刻蚀
短句来源
     DW of ash.
     DW ;
短句来源
     DW of ash;
     DW ;
短句来源
     Results show that stable plasma burning and ash removing can be realized.
     数值结果表明,通过控制完全可以实现堆芯等离子体的稳定燃烧和排灰要求。
短句来源
查询“plasma ash”译词为用户自定义的双语例句

    我想查看译文中含有:的双语例句
例句
为了更好的帮助您理解掌握查询词或其译词在地道英语中的实际用法,我们为您准备了出自英文原文的大量英语例句,供您参考。
  plasma ash
Processing conditions affected the adhesion with plasma ash and annealing steps improving the adhesion.
      
Experience has shown that plasma ash patterns are the final stage of surface etching patterns.
      


Photo resist removal following dry etching or high dose ion implantation conventionally employs solvents and acid, sometimes was preceded by a dry oxygen based plasma ash before. These costly, hazardous, and pullutive wet chemicals are then disposed of through unfriendly environmental waste disposal processes, which results in global warming, substantial energy consumption, ground water contamination, etc. A new cleaning process (ENVIRO) that dry ashes etchs resist and remaining material 100% simultaneously...

Photo resist removal following dry etching or high dose ion implantation conventionally employs solvents and acid, sometimes was preceded by a dry oxygen based plasma ash before. These costly, hazardous, and pullutive wet chemicals are then disposed of through unfriendly environmental waste disposal processes, which results in global warming, substantial energy consumption, ground water contamination, etc. A new cleaning process (ENVIRO) that dry ashes etchs resist and remaining material 100% simultaneously is removered by DI water soluble has been qualified in manufacturing and successfully used for more than 12 months. For a 10,000 wafer start/week factory, this process can save more than $5 million/year in solvent costs alone.

除去干刻或高剂量等离子注入后的光刻胶 ,一般是采用化学溶剂和酸类等湿刻法 ,以前有时采用干燥氧的等离子灰化法。然而成本高 ,具有危险性和污染性的化学湿刻法直接造成了环境污染 ,使得全球气候变暖 ,能源的大量消耗 ,地下水受到污染等等。一种新的干式去胶并且处理后可用去离子水 DI清洗残留物的工艺方法 (ENVIRO)已经在半导体芯片厂被成功地使用了 12个多月。对于产量 10 0 0 0片 /周的芯片厂 ,相对于化学湿刻法一年可以节省 5百万美元溶剂消耗

 
图标索引 相关查询

 


 
CNKI小工具
在英文学术搜索中查有关plasma ash的内容
在知识搜索中查有关plasma ash的内容
在数字搜索中查有关plasma ash的内容
在概念知识元中查有关plasma ash的内容
在学术趋势中查有关plasma ash的内容
 
 

CNKI主页设CNKI翻译助手为主页 | 收藏CNKI翻译助手 | 广告服务 | 英文学术搜索
版权图标  2008 CNKI-中国知网
京ICP证040431号 互联网出版许可证 新出网证(京)字008号
北京市公安局海淀分局 备案号:110 1081725
版权图标 2008中国知网(cnki) 中国学术期刊(光盘版)电子杂志社