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   exposure data 在 无线电电子学 分类中 的翻译结果: 查询用时:0.185秒
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exposure data
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  exposure data
Better correlation was obtained between the EIS and field exposure data for the solvent-based coating at both sites but this correlation was unsatisfactory for the water-based coating at the two sites.
      
Chemical exposure data are also presented, comparing this functional fluoropolymer powder coating with uncoated stainless steel.
      
The comparison is made using supermarket scanner panel data and household advertising exposure data.
      
Bayes methods for combining disease and exposure data in assessing environmental justice
      
Risk for mutated AHAS protein in imidazolinone-tolerant wheat most likely would be low, but there are not sufficient effect and exposure data to adequately characterize risk.
      
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This paper discusses in detail how to realize data format conversion of JBX 6AⅡ variable shaped e beam lithography machine on microcomputer. It illustrates how to convert graphic data from CIF format to JEOL51 format on the basis of being familiar with these two formats, and the program charts are given. In addition, two methods of verifying exposure data are rendered, and the problems which we should pay attention to during exposure experiment are also presented.

详细介绍了如何在微机上实现 J B X6 A I I型可变矩形电子束曝光机的数据格式转换工作。在熟悉通用图形数据 C I F格式和专用图形数据 J E O L51 格式的基础上,对如何实现 C I F格式到 J E O L51 格式的转换作了论述,并给出了程序流程图。此外,提出了两种曝光数据检验的方法,并对曝光实验中应注意的问题作了说明。

The high speed Patten Generator is designed for nanometer E-beam lithography system. The Patten Generator is composed of both hardware and software. The Digital Signal Processor (DSP) is embedded in the hardware, so coordinates of exposure points inside the primitive shapes can be calculated with high speed. The beam scanning of SEM is controlled by two set of 16-bit digital to analog converters (DAC), namely X and Y DACs. The gain, rotation, and orthogo-nality of writing field can be corrected by users...

The high speed Patten Generator is designed for nanometer E-beam lithography system. The Patten Generator is composed of both hardware and software. The Digital Signal Processor (DSP) is embedded in the hardware, so coordinates of exposure points inside the primitive shapes can be calculated with high speed. The beam scanning of SEM is controlled by two set of 16-bit digital to analog converters (DAC), namely X and Y DACs. The gain, rotation, and orthogo-nality of writing field can be corrected by users through image acquisition module. The Patten Generator can also control laser stage, and provide feedback to the deflection DACs, allowing field stitching better than 0.1 μm. Exposure data can be inputted in common E-beam formats, and new patterns can be created by users using host operational software. The Patten Generator has been successfully used in E-beam lithography system, and nano writing patterns are obtained.

为满足纳米级电子束曝光系统的要求,设计了高速图形发生器。该图形发生器包括硬件和软件两部分。硬件方面主要是利用高性能数字信号处理器(DSP)将要曝光的单元图形拆分成线条和点,然后通过优化设计的数模转换电路,将数字量转化成高精度的模拟量,驱动扫描电镜的偏转器,实现电子束的扫描。通过图形发生器还可以对标准样片进行图像采集以及扫描场的校正。配合精密定位的工件台和激光干涉仪,还可以实现曝光场的拼接和套刻。利用配套软件可以新建或导入通用格式的曝光图形,进行曝光参数设置、图形修正、图形分割、临近效应修正等工作,完成曝光图形的准备。结果表明,该图形发生器能够与整个纳米级电子束曝光系统协调工作,刻画出纳米级的图形。

 
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