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sputtering parameter
相关语句
  溅射参数
     Effects of Sputtering Parameter on Optical Constants of Ge_2Sb_2Te_5 Thin Films
     溅射参数对Ge_2Sb_2Te_5薄膜光学常数的影响
短句来源
     The effects of sputtering parameter on the optical constants( n,k ) of Ge 2Sb 2Te 5 thin films in the wavelength range of 300—830nm were studied. The results show:(1)When the sputtering power is constant,the refractive index( n ) first increases and then decreases with the increasing of Ar gas pressure,whereas the extinction coefficient( k ) changes with Ar gas pressure in a contrary way to that of n .
     研究了溅射参数对 Ge2 Sb2 Te5 薄膜的光学常数随波长变化关系的影响 ,结果表明 :(1)当溅射功率一定时 ,随溅射氩气气压的增加 Ge2 Sb2 Te5 薄膜的折射率先增大后减小 ,而消光系数先减小后增大 .
短句来源
  溅射工艺参数
     Lead zirconate titanate(PZT) ferroelectric film was prepared by RF-magnetron sputtering route. The phase composition and the effect of sputtering parameter on the texture of the films were analyzed by X-ray diffraction(XRD) technique.
     利用RF磁控溅射法制备了Pb(Zr,Ti)O3(PZT)铁电薄膜,利用X射线衍射(XRD)法研究了薄膜的相组成及溅射工艺参数对薄膜织构的影响。
短句来源
  “sputtering parameter”译为未确定词的双语例句
     EFFECTS OF SPUTTERING PARAMETER ON THE MICROSTRUCTURE OF Ti-6Al-4V COATING ON SiC FIBRE
     溅射参量对SiC涂层Ti-6Al-4V显微组织的影响
短句来源
     The mechanism by which the optical constants of the Ge 2Sb 2Te 5 thin films are affected by sputtering parameter has been discussed based on the variation of the density and microstructure of the films.
     探讨了影响 Ge2 Sb2 Te5 薄膜光学常数的机理
短句来源
     In the mean time, the relationships between intensity of line spectrum of aluminium, nitrogen, argon, oxygen and sputtering parameter were discussed from emission spectrum of the plasma ambience.
     通过对射频反应磁控溅射制各AlN薄膜的等离子体气氛进行了原子发光光谱分析,提出一种新的光谱谱线标定的方法,建立了光谱半定量分析的模型,系统地研究了等离子体气氛中元素谱线强度随放电条件的变化趋势。
短句来源
     The influence of sputtering parameter on their microstructure and magnetic properties were studied, respectively.
     采用X射线衍射仪、振动样品磁强计和扫描探针显微镜测量了上述样品的微结构、磁特性和表面形貌。
短句来源
     (3)The extent of the influence of sputtering parameter on n and k also changes with the wavelength,which is greater in the long wavelength region than that in the short wavelength region.
     (3)薄膜样品的光学常数都随波长的变化而变化 ,在长波长范围变化较大 ,短波长范围变化较小 .
短句来源
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  相似匹配句对
     Effect of DC Magnetic Sputtering Process Parameter for SmCo Film
     直流磁控溅射工艺对SmCo薄膜的影响
短句来源
     Influence of growing parameter on the performance of ZnO film in MC sputtering
     磁控溅射中生长参数对氧化锌薄膜性能的影响
短句来源
     and b was empirical parameter.
     b为经验常数。
短句来源
     n—Parameter CAPM
     n个参数的资本性资产定价模型
短句来源
     MAGNETRON SPUTTERING AND ITS APPLICATIONS
     磁控溅射和它的应用
短句来源
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The PbO2/MnO2 semiconducting thin film is deposited by RF bias sputtering, doping PbO2 with MnO2. This film, on account of its good properties at high and low temperatures, can be used to fabricate large capacity film capacitor TLMM. The MnO2 thin film, which can be employed to manufacture the multiplier phototube, is sputter-deposited directly from powder MnO2, its composition and chemical aspect approaching standard MnO2. ESCA and AES techniques are used to monitor the ratio of PbO2/MnO2 and the...

The PbO2/MnO2 semiconducting thin film is deposited by RF bias sputtering, doping PbO2 with MnO2. This film, on account of its good properties at high and low temperatures, can be used to fabricate large capacity film capacitor TLMM. The MnO2 thin film, which can be employed to manufacture the multiplier phototube, is sputter-deposited directly from powder MnO2, its composition and chemical aspect approaching standard MnO2. ESCA and AES techniques are used to monitor the ratio of PbO2/MnO2 and the composition of manganese oxide of the semiconducting thin film. In this way, the sputtering parameters are determined.

在PbO_2中掺MnO_2,用射频偏压溅射技术制成PbO_2/MnO_2半导体薄膜,有较好的高低温特性,用它首次制成了TLMM薄膜大容量电容器.用粉末溅射法制备了纯正化学状态的MnO_2膜,已用于光电倍增管的制造.用ESCA和AES技术监测工艺过程中薄膜组分含量及化学状态,从而调整了工艺参数与靶材比率.

The phase composition of Co-30Cr-6Al-0.5Y coating deposited by plan-ar magnetron sputtering as well as the effect of sputtering parameters on it havebeen investigated. The sputtered coating is composed of hcp ε-phase or fcc α-phaseof Co solid solution with a minority β-CoAl intermetallic phase. The hcp ε-Cophase and the fcc α-Co phase assumed a <100> and <110> preferred orientationrespectively. Both phase type and orientation extent depend on the sputtering para-meters. If the substrate...

The phase composition of Co-30Cr-6Al-0.5Y coating deposited by plan-ar magnetron sputtering as well as the effect of sputtering parameters on it havebeen investigated. The sputtered coating is composed of hcp ε-phase or fcc α-phaseof Co solid solution with a minority β-CoAl intermetallic phase. The hcp ε-Cophase and the fcc α-Co phase assumed a <100> and <110> preferred orientationrespectively. Both phase type and orientation extent depend on the sputtering para-meters. If the substrate surface is paralleled to the target face during sputtering, thecoating will be of fine crystal with compact structure and smooth surface; if it isrotated, the coating will be to the contrary.

研究了平面磁控溅射Co-30Cr-6Al-0.5Y涂层的结晶组织及溅射参数对它的影响。结果表明,溅射层由hcp ε-Co或fcc α-Co钴固溶体与极少量βCoAl相组成。ε-Co在〈100〉,fcc α-Co在〈110〉方向有择优取向,晶体类型和择优取向程度与溅射条件有关。溅射时样品在靶前固定,则溅射层晶粒细,结构致密,表面光洁度好;样品在靶前旋转,则结果相反。

Superconducting Nb Films with β>2.2 have been successfully deposited with planar magnetron sputtering technique using cryo-pump vaccum system by strictly controlling the sputtering parameters and procedure. With wet etching technique, Nb/Al-AlOx/Nb Josephson junctions in an area of 4×4μm2 have been prepared, and Josephson effect was observed with the aid of 4.4K closed cycle cryostat fabrication by our institue

使用低温泵真空系统的平面磁控溅射设备,通过严格控制溅射条件和溅射过程,成功地淀积了室温—液氮电阻比β优于2.2的超导Nb膜。沿用湿法刻蚀技术,制备了面积为4×4μm~2的Nb/Al-AlO_x/Nb Josephson结;并在本所自行研制的4.4K闭循环制冷机上观察到了较为理想的Josephson效应。

 
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