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      rf sputter
相关语句
  射频溅射
     SiO_2 and SiO_2 / Al / SiO_2 films have been made by means of RF Sputter in our study.
     用射频溅射(RF Sputtering)法制成了SiO_2和SiO_2/Al/SiO_2薄膜。
短句来源
     Investigating property of Ni-SiO_2 films prepared RF sputter
     射频溅射制备Ni-SiO_2薄膜特性研究
短句来源
     Study of preparation of MgTiO3-CaTiO3 thin films by RF Sputter
     高密度等离子体射频溅射制备MgTiO_3-CaTiO_3薄膜的研究
短句来源
     Study on Growth and Semicoducting Properties of Cubic Boron Nitride Films by RF Sputter
     立方氮化硼薄膜的射频溅射制备和半导体特性研究
短句来源
     The Ohmic contact and photoresponse of a ZnO single crystal film produced by MOCVD are investigated. The electrical and photoresponsive changes in the ZnO film due to the RF sputter deposition of SiO_2 (antireflective coating) are also discussed.
     对采用MOCVD方法沉积的ZnO单晶薄膜的欧姆接触特性、光电特性进行了研究,并对比研究了射频溅射沉积Si O2抗反射膜对ZnO薄膜I-V、光电特性的影响.
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  “rf sputter”译为未确定词的双语例句
     Influence on MgTiO_3-CaTiO_3 thin films preparation by RF Sputter with difference underlay
     不同基片对溅射制备MgTiO_3-CaTiO_3薄膜的影响
短句来源
     Al2O3 thin films used for LCD barrier layers were prepared by RF sputter ing with Al target.
     用金属铝靶射频反应溅射制备了Al2O3薄膜,用作LCD基片玻璃的钠离子阻挡层。
短句来源
     In this paper, it is concluded that the Ba2TiSi2O8 thin films were obtained by magnetron rf sputter, PLD and Sol-Gel techniques.
     Ba2TiSi2O8(BTS)晶体,属四方晶系,空间点群C4v-4mm,晶格常数a=b=8.52? ,c =5.21 ?
短句来源
     Particularly, the mechanism of low pc obtained by RF sputter cleaning on semicoductor surface is analyzed theoretically.
     并从理论上分析了利用RF溅射清洗半导体表面可使ρ_c降低的机理。
短句来源
     Abstract Crystalline SiC film on Si(111 ) substrate was prepared by RF sputter and hightemperature vacuum annealing method. The film shows a considerably ordered orientation and a blue emission.
     本文采用高频溅射方法,在抛光Si(111)衬底上制备出碳化硅薄膜,研究了薄膜的高温真空退火效应.实验表明,退火后的薄膜具有较为理想的结晶取向和发光性质.
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  相似匹配句对
     Study the flow of RF magnetron sputter.
     研究了磁控溅射镀膜的原理和工艺流程;
短句来源
     The Monolithic RF
     射频电路的单片集成
短句来源
     Deposit ITO coatings on PMMA substrate by RF magnetic sputter
     在有机玻璃上射频溅射ITO组合薄膜
短句来源
     RF CMOS Amplifier
     RF CMOS功率放大电路
短句来源
     Research and control on erosion and sputter
     侵蚀与溅蚀的研究及防治
短句来源
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  rf sputter
The defects detected after etching are compared to those introduced by 5.4 MeV alpha-particle (α-) irradiation and, also, radio frequency (rf) sputter-deposition of Au SBDs on material from the same wafer.
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The tunnel barriers were produced by rf sputter oxidation.
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Microstructure and preferred orientation in rf sputter deposited AlN thin film
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The growth of oriented films of one particular magnesium vanadate phase, the orthovanadate (Mg3(VO4)2), has been achieved by rf sputter deposition of the orthovanadate onto Au(111) surfaces.
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OR is found to increase by ~0.2-0.3 with enhanced PO and Hc for samples with slightly rf sputter etched substrates.
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         In this paper, a new theoretical model is introduced which explains the properties of specific contact resistance Pc of ohmic contact in HI-V group compound semiconductors. Particularly, the mechanism of low pc obtained by RF sputter cleaning on semicoductor surface is analyzed theoretically.
            本文介绍一种解释欧姆接触的比接触电阻ρ_c的新模型。并从理论上分析了利用RF溅射清洗半导体表面可使ρ_c降低的机理。
文摘来源
         In our work a thin film of Si02 was coated on the surface of CVD SnO2 film by RF-Sputter. This layer could work as sieve, and the multilayer gas sensor showed a high selectivity to H2 gas. Also, we studied the increasing temperature curves of sensor at different heating rate. From these, the surface oxygen adsorption activation energy was calculated. The sensor sensitivity related with the activation energy. By the aid of structure analyses, the working mechanism of thin film Sn02 sensor was dis...
            在SnO_2气敏薄膜层上覆盖一层或多层钝化材料(SiO_2,Al_2O_3)薄膜,制成的多层膜气敏元件,可很好地排除大分子气体如乙醇等对小分子H_2检测的干扰,使其具有单独检测H_2的功能。本文还通过测量元件的升温曲线,推导出敏感体表面的氧吸附活化能;找出活化能与灵敏度、选择性的关系。根据实验现象和物性分析结果,试着探讨了元件的敏感机理。
文摘来源
         SiO_2 and SiO_2 / Al / SiO_2 films have been made by means of RF Sputter in our study. Raman scattering has been used to study these films. It has been found that the Raman spectra of RF sputtering SiO_2 films possess the general features of the spectrum of vitreous SiO_2(V-SiO_2), however, with a lot of ring defects in the RF sputtering SiO_2 films. The Raman spectra of RF sputtering SiO_2/ Al/ SiO_2 films have a vibrational band of the amorphous Al_2O_3 whic...
            用射频溅射(RF Sputtering)法制成了SiO_2和SiO_2/Al/SiO_2薄膜。应用喇曼光谱研究了薄膜结构。结果表明:RF溅射制成的SiO_2薄膜是含有大量环结构缺陷的玻璃态;SiO_2/Al/SiO_2层状薄膜的喇曼光谱中观察到Al_2O_3的特征峰,证实了Al/SiO_2薄膜界面确有氧化还原反应发生;从喇曼光谱中Al_2O_3的特性峰的位置和相对强度可推断出,SiO_2/Al/SiO_2薄膜界面处的Al_2O_3是非晶γ-Al_2O_3。
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