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ultrapure hydrogen
相关语句
  超纯氢气
     Design Technique for a High Flux Ultrapure Hydrogen Purification System for Silicon Epitaxy
     硅外延用大流量超纯氢气纯化系统的设计技术
短句来源
     Ultra pure hydrogen (>6N) is a process gas necessary for silicon epitaxy in semiconductor industry.
     超纯氢气 (大于 6N)是半导体硅外延等工艺必备的工艺气体。
短句来源
     In the manufacture of semiconductor IC's, the ultra pure hydrogen is an essential process gas, which is especially critical to the quality of epitaxy process In silicon epitaxy, the hydrogen should be 99 9999% pure, and it is required to be provided uninterruptedly in high flux With respect to hydromechanics and heat transfer, techniques critical to the design of a high flux hydrogen purification system for silicon epitaxy are dealt with
     因此 ,对氢气的指标要求比较苛刻 ,其纯度应大于99.9999% ,而且必须是大流量连续供应。 文章主要从流体学和传热学两方面 ,系统地介绍了利用超低温吸附方法提纯大流量超纯氢气设备的关键设计技术。
短句来源
  超纯氢气
     Design Technique for a High Flux Ultrapure Hydrogen Purification System for Silicon Epitaxy
     硅外延用大流量超纯氢气纯化系统的设计技术
短句来源
     Ultra pure hydrogen (>6N) is a process gas necessary for silicon epitaxy in semiconductor industry.
     超纯氢气 (大于 6N)是半导体硅外延等工艺必备的工艺气体。
短句来源
     In the manufacture of semiconductor IC's, the ultra pure hydrogen is an essential process gas, which is especially critical to the quality of epitaxy process In silicon epitaxy, the hydrogen should be 99 9999% pure, and it is required to be provided uninterruptedly in high flux With respect to hydromechanics and heat transfer, techniques critical to the design of a high flux hydrogen purification system for silicon epitaxy are dealt with
     因此 ,对氢气的指标要求比较苛刻 ,其纯度应大于99.9999% ,而且必须是大流量连续供应。 文章主要从流体学和传热学两方面 ,系统地介绍了利用超低温吸附方法提纯大流量超纯氢气设备的关键设计技术。
短句来源
  “ultrapure hydrogen”译为未确定词的双语例句
     The generation ultra pure hydrogen with metal hydride is proven to be feasible both technologically and economically in our years of industrial practice.
     用金属氢化物来提取超纯氢,经过多年来实践证明在技术经济上都是可行的。
     400 nm~3/h Ultra Pure Hydrogen Generation Equipment Using Metal Hydride
     400 nm~3/h用金属氢化物提取超纯氢装置
     A HP-5880A gas chromatograph equipped with TCD and FID is used to determine trace amounts of O_2 plus Ar, N_2, CO, CH_4 and CO_2 in pure and ultra pure hydrogen with an efficient Preconcentration technique.
     用气相色谱法测定了超纯氢中痕量杂质O_2+Ar、N_2、CO、CH_4和CO_2。
短句来源
     An ultrapure hydrogen was produced from H_2-N_2 gas mixture by the Pd/Ag(23) membrane.
     分离H_2/N_2混和气可获得高纯氢气。
短句来源
     DETERMINATION OF TRACE AMOUNTS OF OXYGEN PLUS ARGON,NITROGEN,CARBON MONOXIDE,METHANE AND CARBON DIOXIDE IN ULTRA PURE HYDROGEN BY GAS CHROMATOGRAPHY
     用气相色谱法测定超纯氢中痕量O_2+Ar、N_2、CO、CH_4和CO_2
短句来源
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A palladium-silver membrane with 23% of silver content and 50 μm of thickness was employed for the study of the measurement of hydrogen permeability and the separation of H_2-N_2 gas mixture.The effects of temperature, pressure, membrane thickness, feed flow rate, pre-treatment and re-activation of membrane and poisoning of memorane on hydrogen permeation were described. An ultrapure hydrogen was produced from H_2-N_2 gas mixture by the Pd/Ag(23) membrane.

采用厚为50μm的Pd/Ag(23)合金膜进行了氢气渗透系数的测定和H_2/N_2混和气分离的研究,得出温度、压力、膜厚、进料气流量、膜的预处理和再活化及膜表面中毒等因素对氢气渗透的影响。分离H_2/N_2混和气可获得高纯氢气。

 
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