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cavum target
相关语句
  空腔靶
     Process of non-cyanide gold pulse electroplating and its application to cavum target
     无氰脉冲电镀金工艺及其在空腔靶中的应用
短句来源
     Gold deposit was prepared with a process of non-cyanide gold pulse electroplating in sulfite system,which is applicable to cavum target.
     提出采用脉冲电镀在无氰亚硫酸盐体系中制备镀金层并应用在空腔靶上。
短句来源
  空腔靶上
     Gold deposit was prepared with a process of non-cyanide gold pulse electroplating in sulfite system,which is applicable to cavum target.
     提出采用脉冲电镀在无氰亚硫酸盐体系中制备镀金层并应用在空腔靶上
短句来源
  相似匹配句对
     N TARGET
     命中目标
短句来源
     Target Compounds:
     目标化合物:
短句来源
     Process of non-cyanide gold pulse electroplating and its application to cavum target
     无氰脉冲电镀金工艺及其在空腔靶中的应用
短句来源
     Gold deposit was prepared with a process of non-cyanide gold pulse electroplating in sulfite system,which is applicable to cavum target.
     提出采用脉冲电镀在无氰亚硫酸盐体系中制备镀金层并应用在空腔靶上。
短句来源
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Gold deposit was prepared with a process of non-cyanide gold pulse electroplating in sulfite system,which is applicable to cavum target.The influences of current density,pH,temperature and pulse duty ratio on electroplating process and deposit performance were discussed.The results show that the gold deposit has the finest and smoothest surface and 30 nm of roughness as pulse duty ratio is 1∶(9~18).The morphology of cavum target treated with the process was observed with AFM,which reveals that the...

Gold deposit was prepared with a process of non-cyanide gold pulse electroplating in sulfite system,which is applicable to cavum target.The influences of current density,pH,temperature and pulse duty ratio on electroplating process and deposit performance were discussed.The results show that the gold deposit has the finest and smoothest surface and 30 nm of roughness as pulse duty ratio is 1∶(9~18).The morphology of cavum target treated with the process was observed with AFM,which reveals that the gold cavity obtained by the process is stable,uniform,dense,bright and has good precision.

提出采用脉冲电镀在无氰亚硫酸盐体系中制备镀金层并应用在空腔靶上。讨论了电流密度、pH、温度及脉冲占空比对电镀过程及镀层性能的影响。结果发现,当占空比在1∶(9~18)时,镀层最细致、光滑,粗糙度在30 nm左右。采用原子力显微镜观测了该工艺处理后的空腔的形貌。由此工艺获得的金腔结构稳定,均匀致密,精度良好且外观光亮。

 
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