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reactive pulsed laser deposition
相关语句
  反应脉冲激光沉积
     Carbon Nitride Films Synthesized Using ECR Plasma Assisted Reactive Pulsed Laser Deposition
     ECR等离子体辅助反应脉冲激光沉积氮化碳薄膜
  反应脉冲激光淀积
     The Study of SEM and XPS of PbS Films by Reactive Pulsed Laser Deposition
     反应脉冲激光淀积硫化铅膜的SEM和XPS研究
短句来源
  “reactive pulsed laser deposition”译为未确定词的双语例句
     Using Li_(6.16)V_(0.61)Si_(0.39)O_(5.36) as target,Li_2O-V_2O_5-SiO_2 film were deposited by 355nm reactive pulsed laser deposition(PLD).
     采用355nm脉冲激光沉积(PLD)法以Li6.16V0.61Si0.39O5.36为靶制备了Li2O-V2O5-SiO2薄膜。
短句来源
     The new results in this thesis are summarized as follows:(1). Reactive pulsed laser deposition was employed to prepare the lithiumelectrolyte LiPON films under 355-nm laser irradiation for the first time.
     本文主要包括以下新结果:1、首次利用紫外(355 nm)脉冲激光沉积技术制备LiPON电解质薄膜。
短句来源
     Reactive pulsed laser deposition was employed to prepare the lithium electrolyte LiPON films under 355nm laser irradiation for the first time. A dense,smooth and uniform LiPON thin film without pinholes and cracks was obtained by pulsed laser ablating a Li_3PO_4 target at the ambient N_2 gas pressure of 26.6Pa,a laser fluence of 15J/cm~2,a target-substrate distance of 5cm and substrate temperature of 25℃.
     首次采用355nm脉冲激光沉积(PLD)法在N2压强26.6Pa、激光能量密度15J/cm2、靶-基片距离5cm、基片温度为室温条件下制备了室温离子电导率为1.6×10-6S/cm、厚度均匀、无针孔、无裂缝的非晶态LiPON电解质薄膜。
短句来源
     A new thin film composed of transition metal nitride of Mn4N has been fabricated successfully by using reactive pulsed laser deposition and DC discharge methods in a nitrogen ambient.
     采用脉冲激光沉积辅助高压电离的方法在不锈钢基片上制备了Mn4N薄膜.
短句来源
  相似匹配句对
     the reactive speed;
     反应速率的快慢 ;
短句来源
     ON REACTIVE POWER
     论无功功率
短句来源
     Hysteresis in Aluminum Oxides Films Growth with Pulsed Reactive Sputtering
     铝靶脉冲反应溅射沉积氧化铝薄膜中的迟滞回线的研究
短句来源
     The Study of SEM and XPS of PbS Films by Reactive Pulsed Laser Deposition
     反应脉冲激光淀积硫化铅膜的SEM和XPS研究
短句来源
     Production of Metastable Nanocrystals at Solid-Liquid Interface by Pulsed-laser-induced Reactive Method
     脉冲激光诱导固-液界面反应法合成亚稳相纳米晶
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  reactive pulsed laser deposition
Transparent and conducting ZnO films prepared by reactive pulsed laser deposition
      
High transmittance-low resistivity cadmium oxide films grown by reactive pulsed laser deposition
      
LiMn2O4 thin films were deposited by reactive pulsed laser deposition technique and studied the microstructural and electrical properties of the films.
      
Transparent nickel oxide thin films were grown by reactive pulsed laser deposition.
      
Nickel oxide thin films synthesized by reactive pulsed laser deposition: characterization and application to hydrogen sensing
      
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Reactive pulsed laser deposition was employed to prepare the lithium electrolyte LiPON films under 355nm laser irradiation for the first time.A dense,smooth and uniform LiPON thin film without pinholes and cracks was obtained by pulsed laser ablating a Li_3PO_4 target at the ambient N_2 gas pressure of 26.6Pa,a laser fluence of 15J/cm~2,a target-substrate distance of 5cm and substrate temperature of 25℃.The influence of the N_2 gas pressure and laser fluence to LiPON electrochemical...

Reactive pulsed laser deposition was employed to prepare the lithium electrolyte LiPON films under 355nm laser irradiation for the first time.A dense,smooth and uniform LiPON thin film without pinholes and cracks was obtained by pulsed laser ablating a Li_3PO_4 target at the ambient N_2 gas pressure of 26.6Pa,a laser fluence of 15J/cm~2,a target-substrate distance of 5cm and substrate temperature of 25℃.The influence of the N_2 gas pressure and laser fluence to LiPON electrochemical properties was detailedly examined and the thin film characteristics were measured by profilemeter,XPS,EDX and SEM.

首次采用355nm脉冲激光沉积(PLD)法在N2压强26.6Pa、激光能量密度15J/cm2、靶-基片距离5cm、基片温度为室温条件下制备了室温离子电导率为1.6×10-6S/cm、厚度均匀、无针孔、无裂缝的非晶态LiPON电解质薄膜。考察了反应气氛压强、激光能量密度对LiPON薄膜电化学性能的影响,并利用台阶仪、XPS、EDX、SEM等分析方法对薄膜进行表征。

A new thin film composed of transition metal nitride of Mn4N has been fabricated successfully by using reactive pulsed laser deposition and DC discharge methods in a nitrogen ambient. The electrochemical reaction of the Mn4N thin film electrode with Li was firstly investigated by the discharge/charge, cyclic voltammetry, and AC impedance spectroscopy measurements. Mn4N thin film exhibited 420 mAh·g-1 in the first discharge process, and a nearly 50% irreversible capacity loss occurred in the first cycle....

A new thin film composed of transition metal nitride of Mn4N has been fabricated successfully by using reactive pulsed laser deposition and DC discharge methods in a nitrogen ambient. The electrochemical reaction of the Mn4N thin film electrode with Li was firstly investigated by the discharge/charge, cyclic voltammetry, and AC impedance spectroscopy measurements. Mn4N thin film exhibited 420 mAh·g-1 in the first discharge process, and a nearly 50% irreversible capacity loss occurred in the first cycle. X-ray diffraction(XRD), scanning electron microscopy(SEM), and X-ray photoelectron spectroscopy(XPS) were used to characterize the structure, morphology, and composition of the as-deposited, lithiated, and delithiated Mn4N thin films. The reversible reaction of the Mn4N thin film with lithium may involve partial conversion of metal Mn and Li3N into Mn4N. It should be responsible for the large capacity loss between the first and the second discharges.

采用脉冲激光沉积辅助高压电离的方法在不锈钢基片上制备了Mn4N薄膜.用充放电和循环伏安测试对该薄膜电极的电化学性能进行了表征.该薄膜电极的首次放电容量为420mAh·g-1,第一次充放电不可逆容量约为50%.采用XRD,XPS,SEM对薄膜的化学组成和表面形貌进行了表征,并对反应机理进行了研究,结果表明Mn4N在反应过程中转化为金属Mn和Li3N,只有部分的Mn与Li3N参与了可逆的电化学反应.

Using Li_(6.16)V_(0.61)Si_(0.39)O_(5.36) as target,Li_2O-V_2O_5-SiO_2 film were deposited by 355nm reactive pulsed laser deposition(PLD).The morphology,structure and electrochemical properties of Li_2O-V_2O_5-SiO_2 film were characterized by X-ray diffraction(XRD),scanning electron microscope(SEM),profile meter,AC impendence(ACI) and DC polarization(DCP) methods.The dependence of film's performances on structures was discussed.Results show that Li_2O-V_2O_5-SiO_2 film possesses a denser non-crystal structure...

Using Li_(6.16)V_(0.61)Si_(0.39)O_(5.36) as target,Li_2O-V_2O_5-SiO_2 film were deposited by 355nm reactive pulsed laser deposition(PLD).The morphology,structure and electrochemical properties of Li_2O-V_2O_5-SiO_2 film were characterized by X-ray diffraction(XRD),scanning electron microscope(SEM),profile meter,AC impendence(ACI) and DC polarization(DCP) methods.The dependence of film's performances on structures was discussed.Results show that Li_2O-V_2O_5-SiO_2 film possesses a denser non-crystal structure with 4×10~(-7)S/cm ionic conductivity,10~(-11)~10~(-12)S/cm electronic conductivity,ion transference number close to 1.0,uniform thickness and without any pinhole or crack on it's surface.The dependence of Li_2O-V_2O_5-SiO_2 film ionic conductivity on measured temperature is true of Arrhenius relation showing film excellent ionic conductivity and could be used as electrolyte material for all-sold-state thin film lithium battery.

采用355nm脉冲激光沉积(PLD)法以Li6.16V0.61Si0.39O5.36为靶制备了Li2O-V2O5-SiO2薄膜。由X射线衍射(XRD)、扫描电子显微镜(SEM)、表面轮廓、交流阻抗(ACI)、直流极化(DCP)等方法对薄膜的形貌、结构及电化学性能进行表征,讨论了Li2O-V2O5-SiO2薄膜电化学性能与其结构的关系。结果表明,该薄膜是一种无针孔和裂缝、厚度均匀、组成致密的非晶态结构;Li2O-V2O5-SiO2薄膜离子电导率与温度符合Arrhenius关系,离子迁移数接近1.0(tion>99.999%),是一种性能良好的离子导体材料;Li2O-V2O5-SiO2薄膜室温时离子电导率达4.0×10-7S/cm,而电子电导率仅为10-11~10-12S/cm,可作为电解质材料用于全固态薄膜锂电池。

 
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