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boron-carbon-nitrogen
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  相似匹配句对
     Carbon and Nitrogen in Martensite
     马氏体中的碳和氮
短句来源
     -carbon.
     ω为ω碳原子上的取代基数.
短句来源
     SIMULTANEOUS DETERMINATION OF BORON, CARBON AND NITROGEN IN SILICON BY DEUTERON ACTIVATION ANALYSIS
     氘子活化分析同时测定硅中硼、碳和氮
短句来源
     The Study of Log Chipper Knives and the Test on Gaseous Carbon-Nitrogen-Boron Penetration
     原木削片刀的剖析及气相碳-氮-硼共渗试验
短句来源
     Structural properties of synthesized compound functional films consisting of boron, carbon and nitrogen
     合成硼、碳、氮体系化合物功能薄膜的结构性质
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Compound functional films consisting of boron, carbon and nitrogen have drawn wide interest in the world. Structural properties of the boron nitride, carbon nitride and boron carbon nitrogen films and their experimental results obtained by using X ray diffraction, electron diffraction, high resolution transmission electron microscopy, infrared spectroscopy, Raman spectroscopy, and Auger electron spectroscopy and X ray photoelectron spectroscopy are reviewed. The complementary information from various measurement...

Compound functional films consisting of boron, carbon and nitrogen have drawn wide interest in the world. Structural properties of the boron nitride, carbon nitride and boron carbon nitrogen films and their experimental results obtained by using X ray diffraction, electron diffraction, high resolution transmission electron microscopy, infrared spectroscopy, Raman spectroscopy, and Auger electron spectroscopy and X ray photoelectron spectroscopy are reviewed. The complementary information from various measurement methods has contributed to a better understanding of the structural properties of compound functional films.

为探讨合成硼、碳、氮体系化合物功能薄膜结构性质,综合评述了X射线、电子衍射、高分辨电镜分析、红外光谱、拉曼光谱,以及俄歇电子谱和X射线光电子谱等方法对氮化硼、氮化碳和硼碳氮薄膜材料的结构性质的检测结果.指出以采用多种方法复合测定为宜;相互补充的成分、结构、特性等信息,会有助于薄膜结构研究的深化.

An amorphous boron-carbon-nitrogen film was syathesized by plasma source ion nitriding,that is nitrogen ion implantation at low energy (1-3 keV) and superhigh dose (1019-1020ions. cm(-2)) and simultaneously indiffusion. Auger electron spectroscopy and diffuse reflectanceFourier transform infrared spectra showed that the films are mainly composed of sp2 and sp3 plain(graphite- and Pyridine-like) microdomains with a fixed B/C ratio and a controllable nitrogencontent at a nitriding temperature of 500℃ for...

An amorphous boron-carbon-nitrogen film was syathesized by plasma source ion nitriding,that is nitrogen ion implantation at low energy (1-3 keV) and superhigh dose (1019-1020ions. cm(-2)) and simultaneously indiffusion. Auger electron spectroscopy and diffuse reflectanceFourier transform infrared spectra showed that the films are mainly composed of sp2 and sp3 plain(graphite- and Pyridine-like) microdomains with a fixed B/C ratio and a controllable nitrogencontent at a nitriding temperature of 500℃ for a nitriding time from 2 to 6 h. The formation ofsp3 plain microdomains strongly depends on the nitriding temperature and softly on the nitridingtime.

采用等离子体源离子渗氮,即低能(1-3keV)、超大剂量(10~(19)~10~(20)ions.cm~(-2))氮离子注入-同步热扩散技术,在300~500℃处理碳化硼薄膜,合成了硼碳氮三元薄膜.俄歇电子能谱和漫反射富氏变换红外光谱分析表明,合成的硼碳氮薄膜是碳硼比固定,氮含量可控的非晶态薄膜.300℃渗氮的薄膜由sp~2型的硼、碳、氮微区构成,而500℃渗氮的薄膜则由sp~3和sP~2型复合的微区组成.较高的渗氮工艺温度促进sP~3型结构的形成,渗氮工艺时间对薄膜结构的影响不显著.

The synthesized boron nitride and boron carbon nitrogen films by plasma source ion nitriding were analyzed by X ray photoelectron spectroscopy(XPS) The effects of boron, carbon and nitrogen elements in the films on the XPS results were studied making use of the film characteristics with the controllable composition The XPS revealed that the formation of boron nitride films was confirmed but the sp 2 and sp 3 plain microdomain structures were difficult distinguished, and the formation and bonding...

The synthesized boron nitride and boron carbon nitrogen films by plasma source ion nitriding were analyzed by X ray photoelectron spectroscopy(XPS) The effects of boron, carbon and nitrogen elements in the films on the XPS results were studied making use of the film characteristics with the controllable composition The XPS revealed that the formation of boron nitride films was confirmed but the sp 2 and sp 3 plain microdomain structures were difficult distinguished, and the formation and bonding structures of boron carbon nitrogen films could be determined The synthesized boron carbon nitrogen films possessed a mixing structure of sp 2 and sp 3 plain microdomains in the processes

采用 X 射线光电子谱( X P S) 分析300 ~500‘ C 等离子体源离子渗氮硼和碳化硼薄膜合成的氮化硼和硼碳氮薄膜利用合成薄膜成分可控的特点, 研究 B、 C、 N 对薄膜的 X P S影响结果表明, X P S分析合成氮化硼薄膜能够确定其化学组成, 但不能确定sp2 和sp3 型键合结构特性; X P S 分析硼碳氮薄膜能够确定其成分和结构特性在较高的工艺温度下, 等离子体源离子渗氮合成的硼碳氮薄膜具有sp2 和sp3 型复合的键合结构

 
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