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beam ion
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  束离子
     The interaction process and mechanism between the spacecraft and major component in plume of ion thruster, such as beam ion, neutral propellant atom, change electronic (CEX) ion and electron were also presented.
     阐述了离子火箭发动机羽流内束离子、中性推进剂原子、交换电荷(CEX)离子和电子等主要成分与航天器相互作用的过程及机理。
短句来源
  “beam ion”译为未确定词的双语例句
     Vacuum control system for the Shanghai Electron Beam Ion Trap Facility
     上海电子束离子阱装置真空控制系统
短句来源
     Based on the RS485 general bus structure and the operation LabVIEW software environment, the vacuum control system for the Shanghai Electron Beam Ion Trap (EBIT) Facility was developed.
     本文介绍了基于RS485总线结构和LabVIEW图形化软件环境的上海电子束离子阱(EBIT)装置真空控制系统,详细分析了对真空设备远程操作和数据采集以及真空联锁的实现方法。
短句来源
     16 cm diameter low energy broad beam ion source
     16厘米低能强流宽束离子源
短句来源
     A Study of the Energy Contamination of Large Beam Ion Implanter
     大束流离子注入机能量污染的研究
短句来源
     The structure of a low energy and broad beam ion source,KLY-1,is described. The main design formulae are given as well as results of adjustment and measurement.
     本文简介了KLY-1低能宽束离子源的结构,给出了物理设计的主要公式和调试实验的结果。
短句来源
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  相似匹配句对
     Ion Beam Bioengineering
     低能离子生物学
短句来源
     Ion Beam Etching
     离子束刻蚀
短句来源
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  beam ion
Passivation layers were removed from copper interconnect lines using a broad beam ion source in preparation for electron backscatter diffraction (EBSD) and orientation imaging microscopy (OIM) analysis.
      
An experimental confirmation was obtained of the anode potential fall effect in pulsed broad-beam ion and plasma sources utilizing the evaporation of metal by a vacuum arc.
      
Characteristic features of the emission properties of pulsed broad-beam ion and plasma sources utilizing the evaporation of meta
      
For this reason, charge breeding with an electron beam ion trap (EBIT) is employed at TRIUMF's Ion Trap for Atomic and Nuclear science (TITAN) on-line facility in Vancouver, Canada.
      
A high-current electron beam ion trap as an on-line charge breeder for the high precision mass measurement TITAN experiment
      
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A new measuring apparatus for energy distribution of axial beam ions is described in this paper. Because this apparatus is combined with the ion gun extraction aperture the assembly error has been decreased. Hence, it is possible to measure an energy spread as low as 0.36ve. In addition, the total and axial energy distribution of ions from the ion source and lenses of kornerson gun are measured.The variation of ion beam current, ion beam density and miuimum beam...

A new measuring apparatus for energy distribution of axial beam ions is described in this paper. Because this apparatus is combined with the ion gun extraction aperture the assembly error has been decreased. Hence, it is possible to measure an energy spread as low as 0.36ve. In addition, the total and axial energy distribution of ions from the ion source and lenses of kornerson gun are measured.The variation of ion beam current, ion beam density and miuimum beam diameter upon the change of pressure in the ion source and ion energy have also been deseribed. Resides, semi-empirical formula for the relation of ion beam diameter d with ion energy E and ion source pressure P is given as d=(E~(1/2))/(K(P))+f(P)

本文研究了Kornelsen型离子枪的离子束束流,束流密度和最小束斑随源压强P,离子能量E的变化规律,并给出了斑点大小随离子能量、源压强变化的半经验公式:d=k(p)/E~1/2+f(p)。同时还给出了一种和离子枪口连成一体的能量分散量测装置,这种装置至少能测出0.36ev的能量分散。利用它测定了Kornelsen型离子枪的离子源,各级电透镜所形成的离子束的轴向能量分散和总能量分散。

This paper introduces a broad beam ion source which is suitable to ion-assisted deposition; describes how the ion beam affects the properties of two medium films(TiO-2/SiO_2 and ZnS/MgF_2) and two metalic reflect ion films (Al-SiO_2 and single layer Cu); studies the improvement of adhesion, stability, wear and corrosion resistence of films by IAD. The result shows that IAD is significant in improving the properties of the metal films as well as the medium films.

本文介绍了一适用于离子辅助淀积薄膜的宽束离子源。描述了离子束轰击对TiO_2/SiO_2、ZnS/MgF_2两种介质滤光膜以及Al-SiO_2、单层Cu两种反射膜的性能的变化。研究了离子辅助淀积对薄膜的牢固度、附着性、抗蚀性和稳定性等性能的改善和提高。结果表明,离子辅助淀积对金属膜性能的改善与对介质膜性能的改善一样显著。

The structure of a low energy and broad beam ion source,KLY-1,is described.The main design formulae are given as well as results of adjustment and measurement.For an argon beam with an energy of 4 keV the maximum ion current is 45 mA and the beam uniformity is better than 75%,which were measured on a target of 5 cm in diameter at a distance of 24 cm from the extraction electrode

本文简介了KLY-1低能宽束离子源的结构,给出了物理设计的主要公式和调试实验的结果。对于氩离子束,在离子能量为4keV,距引出电极24cm处的5cm直径的靶上,测得最大氩离子流为45mA,束流不均匀性优于±25%。

 
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