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deposited coatings density
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     RESEARCH OF COATINGS PROPERTIES DEPOSITED WITH HVOF
     超音速火焰喷涂涂层特性的研究
     RESEARCH OF COATINGS PROPERTIES DEPOSITED WITH HVOF
     超音速火焰喷涂涂层特性研究
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     The effects of cathodic current density and pH value on the wear resistance of deposited composite coatings were studied.
     并考察了阴极电流密度、镀液 pH 值等主要工艺参数对纳米复合镀层耐磨性的影响。
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     and the crystallinity and density of the coatings have been improved correspondingly.
     随前驱液pH值增加,涂层开裂趋势减弱,结晶趋势增强,致密度有所提高。
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     Influence of Deposited Pressure on Refractive Index and Packing Density of ZrO_2 Coatings by Electron Beam Evaporation
     工作气压对电子束沉积ZrO_2薄膜折射率和聚集密度的影响
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The effects of deposition temperatures and diluent gas flow rates on the microstructures and crystal structures of the chemical vapor deposited (CVD) SiC coatings were studied. The results showed that dense SiC coatings can be deposited at 1100℃ and Ar flow rates less than 400 mL/min. The as-deposited coatings density was 3.204 g/cm~3, its micro-hardness and elastic modulus were HV4459.2 and 471GPa respectively. The CVD SiC coatings showed that superior polishiability and its surface roughness was...

The effects of deposition temperatures and diluent gas flow rates on the microstructures and crystal structures of the chemical vapor deposited (CVD) SiC coatings were studied. The results showed that dense SiC coatings can be deposited at 1100℃ and Ar flow rates less than 400 mL/min. The as-deposited coatings density was 3.204 g/cm~3, its micro-hardness and elastic modulus were HV4459.2 and 471GPa respectively. The CVD SiC coatings showed that superior polishiability and its surface roughness was 0.429nm after optically polishing.

考察了沉积温度、稀释气体流量对化学气相沉积(CVD)SiC涂层的显微结构及晶体结构的影响,分析得出:沉积温度为1100℃,稀释气体Ar流量<400mL/min时,制备的SiC涂层晶体结构完整、致密。在该制备工艺条件下沉积的SiC涂层密度为3.204g/cm3,显微硬度为HV4459.2,弹性模量为471GPa,涂层具有优异的光学加工性能,光学加工后表面粗糙度为0.429nm,能满足光学应用的要求。

 
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