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sputtering alloy
相关语句
  溅射合金
     The optical and magneto-optical constants of Pt 1- x Co x (x=0.2~0.4) alloy films with perpendicular magnetic anisotropy prepared by sputtering alloy target were measured at photon energy 1.5~4.8eV. The optical constants of the alloy films were extremely insensitive to its component.
     在光子能量为1.5eV~4.8eV的范围内,测量了用溅射合金靶方法制备的易磁化方向垂直于膜面的Pt1-xCox(x=0.2~0.4)合金膜的光学常数和磁光常数。 该合金膜的光学常数对成份极不敏感。
短句来源
  “sputtering alloy”译为未确定词的双语例句
     OPTICAL AND MAGNETO OPTICAL CONSTANTS OF Pt 1- x Co x (x=0.2~0.4) ALLOY FILMS PREPARED BY SPUTTERING ALLOY TARGET
     溅射制备Pt_(1-x)Co_x(x=0.2~0.4)合金膜的基本光学和磁光常数
短句来源
     FAAS DETERMINATION OF HIGH CONTENT OF TIN IN ZYSP SPUTTERING ALLOY
     FAAS法测定ZYSP喷金料中高含量锡
短句来源
     A method for the determination of high content of tin in a sputtering alloy by FAAS is reported in this paper. The sample is dissolved in an acid mixture of HCI(1 + 1) and HNO_3(1 + 1). Tin is then determined by FAAS at the wavelength of 286. 3nm using fuel-rich flame.
     用盐酸(1+1)和硝酸(1+1)混合液溶解ZYSP喷金料,并采用富火焰原子吸收法在锡的次灵敏线286.3nm处对样液中高含量的锡进行直接测试。
短句来源
  相似匹配句对
     The alloy ?
     所制备的聚乙烯原位合金颗粒形貌好、粒径大且均匀、孔隙率高。
短句来源
     Aluminum Alloy Films and Sputtering Targets
     铝合金功能薄膜与溅射靶材
短句来源
     PREFERENTIAL SPUTTERING ON THE SURFACE OF Ag-Pd ALLOY
     Ag-Pd合金表面的择优溅射
短句来源
     POLYCARBONATE ALLOY
     聚碳酸酯合金
短句来源
     the sputtering power is 130W;
     溅射功率最佳值为130W;
短句来源
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The optical and magneto-optical constants of Pt 1- x Co x (x=0.2~0.4) alloy films with perpendicular magnetic anisotropy prepared by sputtering alloy target were measured at photon energy 1.5~4.8eV. The optical constants of the alloy films were extremely insensitive to its component. Their magneto-optical constants increased with the Co content. The increase of the Kerr rotation peak at 4.2eV with the content of Co can be attributed to the increases of the d band state density of Co...

The optical and magneto-optical constants of Pt 1- x Co x (x=0.2~0.4) alloy films with perpendicular magnetic anisotropy prepared by sputtering alloy target were measured at photon energy 1.5~4.8eV. The optical constants of the alloy films were extremely insensitive to its component. Their magneto-optical constants increased with the Co content. The increase of the Kerr rotation peak at 4.2eV with the content of Co can be attributed to the increases of the d band state density of Co near Fermi level and the polarization of Pt 5d electrons. The potential figure of merit of the alloy films was also discussed.

在光子能量为1.5eV~4.8eV的范围内,测量了用溅射合金靶方法制备的易磁化方向垂直于膜面的Pt1-xCox(x=0.2~0.4)合金膜的光学常数和磁光常数。该合金膜的光学常数对成份极不敏感。磁光常数随Co成份的增加而增加。克尔转角在光子能量为4.2eV附近的峰值随Co成份的增大可用费米面附近d电子轨道态密度和Pt5d电子极化的增大来解释。本文还讨论了Pt1-xCox合金膜的本征和潜在品质因子。

A method for the determination of high content of tin in a sputtering alloy by FAAS is reported in this paper. The sample is dissolved in an acid mixture of HCI(1 + 1) and HNO_3(1 + 1). Tin is then determined by FAAS at the wavelength of 286. 3nm using fuel-rich flame. The linear relationship between tin concentrations and absorbances holds over the range 0 to 250mg of tin per liter. The sensitivity of the method is found to be 3. l0mg per liter for an absorbance of 1%. A recovery of 100. 1 %~103. 7% is...

A method for the determination of high content of tin in a sputtering alloy by FAAS is reported in this paper. The sample is dissolved in an acid mixture of HCI(1 + 1) and HNO_3(1 + 1). Tin is then determined by FAAS at the wavelength of 286. 3nm using fuel-rich flame. The linear relationship between tin concentrations and absorbances holds over the range 0 to 250mg of tin per liter. The sensitivity of the method is found to be 3. l0mg per liter for an absorbance of 1%. A recovery of 100. 1 %~103. 7% is found by the standart addition method and the RSD found in smaller than 3. 5%.

用盐酸(1+1)和硝酸(1+1)混合液溶解ZYSP喷金料,并采用富火焰原子吸收法在锡的次灵敏线286.3nm处对样液中高含量的锡进行直接测试。线性范围0~250mg·L~(-1),其灵敏度为3.10mg·L~(-1)/1%吸收,回收率为100.1%~103.7%,相对标准偏差不大于3.5%,并用标准加入法进行对照。

In this paper the influence of RF magnetron sputtering processes on the morphology of TiNi(1-x)Cux alloy films was studied by using X - ray diffraction (XRD) and scanning electron microscopy ( SEM) . The experimental results show that the microstructure of the magnetron sputtering alloy films has a columnar grain texture, the as-sputtered films deposition onto a non-artificial heated substrate using the targets of Ti -50.64at. %Ni and Ti -46.80at. %Ni -3.65at. %Cu alloy, are amorphous. The...

In this paper the influence of RF magnetron sputtering processes on the morphology of TiNi(1-x)Cux alloy films was studied by using X - ray diffraction (XRD) and scanning electron microscopy ( SEM) . The experimental results show that the microstructure of the magnetron sputtering alloy films has a columnar grain texture, the as-sputtered films deposition onto a non-artificial heated substrate using the targets of Ti -50.64at. %Ni and Ti -46.80at. %Ni -3.65at. %Cu alloy, are amorphous. The grain size, thickness and deposition rate of the thin films increased linearly with sputtering power and decreased with sputtering pressure. The activity and deposition rate of sputtered atoms were main reasons for influencing film morphologies.

采用RF磁控溅射技术制备了TiNi(1-x)Cux合金薄膜,利用扫描电镜、电子能谱仪和XRD技术分析研究了RF磁控溅射工艺对TiNi(1-x)Cux合金薄膜组织形貌的影响规律.结果表明:在基片不加热的条件下溅射薄膜组织结构为非晶,并呈柱状形貌垂直于基片生长;经650~720℃,3 min退火处理后,薄膜均发生晶化转变;在他它条件相同的情况下,溅射功率和工作气压对薄膜组织形貌有很大影响;薄膜的柱状单胞直径、薄膜厚度和生长速度均随溅射功率的增长而增长,但当溅射功率一定时,工作气压增加使柱状单胞直径、薄膜厚度和薄膜的生长速率显著减小;RF磁控溅射过程中,沉积原子的活性及其沉积速率是影响薄膜组织形貌的主要原因.

 
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