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liquid precursor
相关语句
  液态先驱液
     A machinable Y TZP/LaPO 4 composite ceramic was prepared by infiltrating LaPO 4 liquid precursor into Y TZP porous ceramic.
     通过往ZrO2 多孔陶瓷浸渗LaPO4液态先驱液制备了具有可加工性的Y TZP/LaPO4复相陶瓷。
短句来源
  “liquid precursor”译为未确定词的双语例句
     Preparation of Machinable Y-TZP/LaPO_4 Composite Ceramics by Liquid Precursor Infiltration
     液相浸渗法制备Y-TZP/LaPO_4可加工复相陶瓷
短句来源
     The preparation of nano-sized Mn-Zn ferrite powders by liquid phase circumfluence with the activator of Fe~(2+) at normal pressure was studied. Based on the liquid precursor of ZnSO_4·7H_2O,FeCl_3·6H_2O and MnSO_4,the powders were synthesized for about 6h.
     以ZnSO4.7H2O,FeCl3.6H2O和MnSO4为原料,在常压下,采用液相催化回流法(100℃),回流6h,制备了纳米Mn-Zn铁氧体。
短句来源
     Review of studies on preparation of porous preforms for liquid precursor infiltration
     液相浸渗用多孔预制体制备的研究现状
短句来源
     Preparation of TaC Anti-ablation Materials by Liquid Precursor
     液相先驱体转化法制备TaC抗烧蚀材料
短句来源
     By comparison of supercritical casting and liquid precursor casting method, the advantages of supercritical casting have been confirmed.
     通过对超临界涂层和液相涂层两种方法进行比较,验证了超临界涂层的优越性。
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  相似匹配句对
     Preparation of TaC Anti-ablation Materials by Liquid Precursor
     液相先驱体转化法制备TaC抗烧蚀材料
短句来源
     Liquid Light
     液体光阀
短句来源
     Job liquid .
     工作液。
短句来源
     THE PHENOMENON OF WETTING PRECURSOR FILM FOR LIQUID METAL SPREADING ON CERAMICS
     液态金属在陶瓷上铺展时的前驱膜现象
短句来源
     PRECURSOR-DERIVED CERAMICS
     先驱体陶瓷
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  liquid precursor
This liquid precursor was passed through an ultrasonic aerosol generator and transported into a CVD reactor where solvent and precursor evaporation and deposition occurred on heated substrate.
      
Liquid Precursor Plasma Spraying of Functional Materials: A Case Study for Yttrium Aluminum Garnet (YAG)
      
Fluid Mechanics and Heat Transfer of Liquid Precursor Droplets Injected into High-Temperature Plasmas
      
Liquid Precursor Plasma Spraying: Modeling the Interactions Between the Transient Plasma Jet and the Droplets
      
Erbium doped GaAs has been grown by metalorganic chemical vapor deposition using a novel liquid precursor: Tris (n-butylcyclopentadienyl) erbium, Er(C4H9C5H4)3.
      
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The processing of chemical vapour deposition (CVD) and recent development are briefly reviewed , including metallic organic compounds chemical vapour deposition, plasma aided chemical vapour deposition, laser chemical vapour deposition. Meanwhile, 3 rapid densification chemical vapour infiltration technologies for fabrication of engineering materials, such as forced flow thermal gradient chemical vapour infiltration, densifacation by liquid precursor,...

The processing of chemical vapour deposition (CVD) and recent development are briefly reviewed , including metallic organic compounds chemical vapour deposition, plasma aided chemical vapour deposition, laser chemical vapour deposition. Meanwhile, 3 rapid densification chemical vapour infiltration technologies for fabrication of engineering materials, such as forced flow thermal gradient chemical vapour infiltration, densifacation by liquid precursor, induction heating thermal gradient rapid densification are presented.

综述了化学气相沉积(CVD)技术的最新发展,包括金属有机化合物化学气相沉积、等离子辅助化学气相沉积、激光化学气相沉积;同时介绍了三种用于制备工程材料的快速致密化化学气相渗透(CVI)技术,包括强迫流动热梯度化学气相渗透、化学液相沉积、感应加热热梯度快速致密化技术。

Carbon carbon comosites with density as high as 1.74 g/cm 3 were obtained within 3 hours by a novel method called chemical liquid vapor infiltration densification (CLVD).The preforms adapted were carbon felt disks (160 mm od×80 mm id×10 mm thick of each),which have been densified in a liquid carbon source.The liquid precursor used in the present work was composed of CYH and KEE.The disks were heated by radiation which could create an inside out thermal gradient and immersed in liquid precursor...

Carbon carbon comosites with density as high as 1.74 g/cm 3 were obtained within 3 hours by a novel method called chemical liquid vapor infiltration densification (CLVD).The preforms adapted were carbon felt disks (160 mm od×80 mm id×10 mm thick of each),which have been densified in a liquid carbon source.The liquid precursor used in the present work was composed of CYH and KEE.The disks were heated by radiation which could create an inside out thermal gradient and immersed in liquid precursor in a water cooled chamber.Rough laminar and smooth laminar deposited carbon microstructure was observed under crossed polarizers.The highest deposition rate obtained in this study was 64 μm/h which was over two order of magnitude faster than the typical value of 0.1 μm/h~0.25 μm/h for the ICVI process in the temperature range from 900℃~1 100℃.Also the reasons for rapid densification by this method were discussed considering a large thermal gradient within the preforms and chemical reaction occurred in liquid vapor medium.

探索了一种的炭/炭制备方法快速化学液气相渗透致密( C L V D),沉积时间3 h 内可获得密度达1.74 g/cm 3 的炭/炭材料。预制体为环形炭毡制件(160 m m ×80 m m ×10 m m ),以液态低分子有机物( C Y H 和 K E E)作炭源前躯体,将预制体浸泡在液体炭源前驱体中,利用辐射加热,在预制体范围内造成由内而外的温度梯度。研究表明,在900℃~1 100℃沉积温度范围内,炭纤维表面最大沉积速率为 64 μm /h ,比等温 C V I的沉积速率 (0.1 μm /h~0.25 μm /h)快2 个数量级以上。同时,分析并提出了该方法快速致密多孔预制体的机理。

A novel method called chemical liquid-vapor infiltration densification(CLVD) is studied which is used for the preparation of C/C composites.C/C composites with density as high as 1.74 g/cm 3 were obtained within 3 hours by the new process.Carbon felt disk preforms have been densified in a liquid carbon source. The liquid precursors studied in the present work include CYH and KEE. The disks were heated by radiation to temperatures from 800℃ to 980℃ with certain inside out thermal gradient...

A novel method called chemical liquid-vapor infiltration densification(CLVD) is studied which is used for the preparation of C/C composites.C/C composites with density as high as 1.74 g/cm 3 were obtained within 3 hours by the new process.Carbon felt disk preforms have been densified in a liquid carbon source. The liquid precursors studied in the present work include CYH and KEE. The disks were heated by radiation to temperatures from 800℃ to 980℃ with certain inside out thermal gradient and were then immersed in liquid precursor in a water cooled chamber. The highest deposition rate obtained in this study was 64 μm/h which was over 200 times of typical value of 0.1 μm/h~0.25 μm/h for the ICVI process in the temperature range from 900℃ to 1 100℃.The mechanism for rapid densification of the method is also discussed in this paper.

介绍了一种新的C/C材料制备方法快速化学液气相渗透致密法。利用该技术 ,采用碳毡作预制体 ,以两种液态低分子有机物作碳源前驱体 ,沉积时间在 3h内 ,沉积温度在 90 0℃~ 110 0℃范围内可获得密度达 1.74g/cm3的C/C材料。碳纤维表面最大沉积速率可达 6 4 μm/h ,比传统的等温CVI沉积速率(0 .1μm/h~ 0 .2 5μm/h)提高了 2 0 0倍以上 ,并初步分析了该技术快速致密多孔预制体的机理。

 
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