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束流     
相关语句
  beam
     A POSSIBLE OBSERVATIONAL TEST OF THE BEAM MODELS
     束流模型的可能的观测检验
短句来源
     A NEW METHOD OF THE ION BEAM EMITTANCE MEASUREMENT
     一种测量束流发射度的新方法
短句来源
     A COMPUTATIONAL METHOD FOR THE DESIGN ENERGY HIGH INTENSITY BEAM TRANSPORT SYSTEMS
     设计低能强束流输运系统的一种计算方法
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     THE BEAM ENVELOP ANALYSIS FOR NONPERIODIC SYSTEMS
     非周期系统束流包络分析
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     THE APPLICATION OF BEAM TRANSPORT THEORY OF CYCLIC SYSTEM IN QUADRUPOLE MASS FILTER
     周期系统束流传输理论在四极滤质器中的应用
短句来源
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  beam current
     The spot size is in submicrometer range at 12keV, the beam current is 1×10~(-9)A.
     在束能12keV时,束流1×10~(-9)A,束径达亚微米。
短句来源
     A beam diameter of 0. 1μm is attained while the beam energy and beam current are 15 keV and 30 pA, respectively.
     在束能15keV、束流30pA时,束径达到0.1μm。
短句来源
     When proton beam current were between 5μA and 35 μA, the yields of [18F]fluorine anion and 13N-NOX- were increased with the increment of the proton beam current.
     束流强度在5-35μA时,18F负离子和13N-NO的产额随束流增大而增加;
短句来源
     An ion beam of (31)p~+ withan iondose of 3×10~(15) ions/cm~2,kinetic energy>120 keV,and a beam current from 35 to50 μA.
     将剂量为 3 ×10~(15)离子/cm~2的~(31)P~+,用高于 120kV的能量,35-50μA/cm~2的束流密度,注入到涂在玻璃衬底上的 AZ1350光刻胶层中.
短句来源
     High voltage 60 kV, beam current 6. 5 mA, heating time 37. 5 s, mass of the filler metal 25 mg, focusing current 654 mA and the fit-up gap 0. 027 mm.
     电子束钎焊的优化工艺参数为:加速电压60kV,束流6.5mA,加热时间37s,钎料质量25mg,聚焦电流654mA,装配间隙0.027mm。
短句来源
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  beam flow
     This paper introduces a method of the electronic beam flow controlling of the electron beam welding machine by using V/F and F/V converter. It realizes the quick controlling of the welding beam flow and improves the stability and reliability of the electron beam.
     介绍把V/F及F/V转换器作为电子束焊机束流控制方式的研究 ,实现了焊接束流的快速控制 ,提高了电子束流的稳定性及可靠性。
短句来源
     Brazing of Ti Beam Flow Window for Accelerator
     加速器束流钛窗钎焊
短句来源
     The relation between the beam flow and the structural parameters of LEG as well as the relation between the magnetic density and the magnet iron structure was analyzed.
     通过计算,分析了电子枪结构参数与束流特性的关系及磁靴结构与磁场强度的关系。
短句来源
     Research on a new method of EB welding machine beam flow control
     一种新型的电子束焊机束流控制方式的研究
短句来源
     Based on the single-element beam flow theory and with given circulating circle the inlet and outlet angles of the blades are optimized to meet various performance requirements.
     本文以一元束流理论为计算基础,采用在已知循环圆条件下,优化设计叶片进、出口角度,从而满足不同的性能要求。
短句来源
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  ion beam current
     The working pa-rameters of the neutron tube are ion source anode voltage 3.3 kV, the ion source discharges current 1.8 mA, the accelerating voltage 134 kV, and the ion beam current is 740μA.
     中子管的工作参数为离子源阳极电压3.3 kV,离子源放电电流1.8 mA,加速高压134 kV,束流740 μA。
短句来源
     In a pulsed mode, a time-average ion beam current in excess of 10 mA has been extracted for a range of elements such as Al, Ti, Cr, Nl,Cu,Nb etc. The ion beam current depends on cathode material, arc current, extractor voltage etc.
     在脉冲工作方式下,引出了Al、Ti、Cr、Ni、Cu和Nb等元素的离子,平均束流达10mA以上,引出束流与阴极材料、弧流、引出电压等有关。
短句来源
     Modulation and Computation of Ion Beam Current Transmission for the 200 keV Continuation/Pulse Neutron Generator
     200keV直流/脉冲中子发生器束流输运模拟计算
短句来源
     The experiment results suggest that the reactive ion beam etching using CHF3 will get high etching selectivity(2.5∶1 of silicon oxide film and 1∶1 of hafnium oxide film) under low ion energy and ion beam current and low accelerate voltage.
     实验结果表明:以三氟甲烷为工作气体的反应离子束刻蚀,在较低离子能量、束流和加速电压的条件下,就可对氧化硅薄膜和氧化铪薄膜实现较高的刻蚀选择比(分别为2.5∶1和1∶1).
短句来源
     The extracting voltage of the ion source can be changed between 0—4.0 kV continuously. The maximum extractable ion beam current is 100 mA and the maximum deposition rate is 0.45 nm/s using Ti as the sputtering material. The ion source can be operated continuously for 160 h.
     离子源的引出电压在0—4.0kV之间连续可调,最大引出束流为100mA,束斑面积为φ6.0cm,以Ti为溅射靶时的最大溅射沉积率为0.45nm/s,离子源可连续工作160h。
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  beam
Microlocal Analysis of an FBP Algorithm for Truncated Spiral Cone Beam Data
      
Derivation and analysis of a new reconstruction formula from cone-beam projections
      
A new method to compute the first derivative of 3-D Radon transform is given for cone-beam data taken from any orbit.
      
Smith [11] and Grangeat [5] even derived cone-beam inversion formulas which are the basic work in fully 3-D image reconstruction algorithm and are used extensively now.
      
Boundary stabilization of nonuniform Timoshenko beam
      
更多          
  beam current
The influence of proton irradiation (energy, 18 MeV; beam current, 300 nA) with doses of 5 × 1014, 1015, and 5 × 1015 cm-2 on samples of SiO2-BaO-based glass coatings is investigated.
      
It was shown that significant steady-state currents (1 to 10% of the electron beam current) were observed only if the thickness of blocking (unirradiated) layer did not exceed 5 μm.
      
It was found that depending on deposition conditions, the resistivity ρ of applied lines varied from 4 × 10-2 to 103 Ω cm, decreasing rapidly with an increase in the electron beam current.
      
The Simulation of a Beam-Plasma Discharge with the Beam Current Exceeding the Limiting Vacuum Current
      
Results are given of simulation of the space-time dynamics of a beam-plasma discharge with the beam current exceeding the limiting vacuum current.
      
更多          
  beam flow
Chinese hamster chromosomes were also stained with both 33258 Hoechst (HO) and chromomycin A3 (CA3); the two dye contents were measured by selective excitation in the UV and at 458 nm in a dual beam flow cytometer.
      
Human chromosomes stained with both HO and CA3 and measured in the dual beam flow cytometer produced two parameter fluorescence distributions which showed 20 groups.
      
The HO/CA3-stained chromosomes were measured in a dual beam flow cytometer, and bivariate HO/CA3 flow karyotypes and univariate HO and CA3 flow karyotypes were established.
      
Cloning of genomic sequences from the human Y chromosome after purification by dual beam flow sorting
      
Human Y chromosomes were purified by dual beam flow sorting from a human x Chinese hamster cell line retaining the Y as the only free human chromosome.
      
更多          
  ion beam current
The source ensures an argon ion beam current of up to 80 mA at a discharge current and voltage of 1 A and 115 V, respectively, and a pressure of 1.5 × 10-2 Pa in the chamber.
      
Depending on the geometric parameter la (the anode length to diameter ratio) and pressure, maxima are observed in the discharge current and in the ion beam current extracted from an aperture at the center of the cathode.
      
Composite layers made in sapphire by implantation of 40-keV Cu+ ions at a dose of 1 × 1017 cm-2 and an ion beam current density varying from 2.5 to 10 μA/cm2 are studied.
      
Metal-nanoparticle-containing composite layers were synthesized by implantation of 60 keV Ag+ ions into a soda-lime silicate glass to a dose of 3×1016 ion/cm2 at an ion beam current density of 3 μA/cm2 and a substrate temperature of 35°C.
      
Sapphire-based composite layers implanted with 40-keV Cu+ ions to a total dose of 1.0×1017 cm-2 at an ion beam current density varied from 2.5 to 10 μA/cm2 were studied using Rutherford backscattering and optical reflectance methods.
      
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